Patents by Inventor Mark Henricus Wilhelmus VAN GERVEN

Mark Henricus Wilhelmus VAN GERVEN has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • STAGE ANTI-FRETTING MECHANISM FOR ROLLER BEARING LIFETIME IMPROVEMENT
    Publication number: 20220084781
    Abstract: Systems directed to a stage apparatus in an electron beam inspection tool to inspect a sample are disclosed. The stage apparatus comprises a short stroke stage; a long stroke stage; a first sensor configured to measure a position of the short stroke stage with respect to a measurement reference; one or more roller bearings configured to support the long stroke stage; and a controller having circuitry and configured to control a motion of the long stroke stage and a motion of the short stroke stage for following movement of the reference at least partly based on measurement from the first sensor, wherein the controller is operable such that control of the long stroke stage is decoupled from the movement of the reference in at least a part of operation of the stage apparatus for reducing debris generation of the one or more roller bearings.
    Type: Application
    Filed: November 24, 2021
    Publication date: March 17, 2022
    Applicant: ASML Netherlands B.V.
    Inventors: Mark Henricus Wilhelmus VAN GERVEN, Johannes Hubertus Antonius VAN DE RIJDT, Michaël Johannes Christiaan RONDE, Niels Johannes Maria BOSCH
  • Lithographic apparatuses and methods for compensating for eigenmode coupling
    Patent number: 9329502
    Abstract: A lithographic apparatus can include a component and a positioning system operatively coupled and configured to move the component along a first axis. The positioning system can be configured to measure a position of the component along a second axis or a third axis. The positioning system can also be configured to control movement of the component so as to compensate for an effect of eigenmode coupling between the movement of the component along the first axis and the measured position of the component along the second axis or the third axis. In some embodiments, the component is a reticle stage or a wafer stage.
    Type: Grant
    Filed: April 11, 2013
    Date of Patent: May 3, 2016
    Assignees: ASML Holding N.V., ASML Netherlands B.V.
    Inventors: Christopher Charles Ward, Mark Henricus Wilhelmus Van Gerven, Bram Paul Theodoor Van Goch
  • Lithographic Apparatuses and Methods for Compensating For Eigenmode Coupling
    Publication number: 20130278915
    Abstract: A lithographic apparatus can include a component and a positioning system operatively coupled and configured to move the component along a first axis. The positioning system can be configured to measure a position of the component along a second axis or a third axis. The positioning system can also be configured to control movement of the component so as to compensate for an effect of eigenmode coupling between the movement of the component along the first axis and the measured position of the component along the second axis or the third axis. In some embodiments, the component is a reticle stage or a wafer stage.
    Type: Application
    Filed: April 11, 2013
    Publication date: October 24, 2013
    Applicants: ASML Netherlands B.V., ASML Holding N.V.
    Inventors: Christopher Charles WARD, Mark Henricus Wilhelmus VAN GERVEN, Bram Paul Theodor VAN GOCH