Abstract: Inductively-coupled plasma reactors for anisotropic and isotropic etching of a substrate, as well as chemical vapor deposition of a material onto a substrate. The reactor system comprises a processing chamber with a plasma shaping member contained therein. In one embodiment, the plasma shaping member extends from a portion of the top wall of the processing chamber, downward into the chamber, and it is generally positioned above the center of the substrate. The shaping member may be a separate piece of hardware attached to the top wall of the chamber, or it may be an integral part of the wall itself. Preferably, the plasma shaping member has a recessed portion in the middle and an extended portion located at a distance outside that of the recessed region. The plasma shaping member may be fabricated from virtually any material since it is at an electrically floating potential during processing of the substrate.

Abstract: Inductively-coupled plasma reactors for anisotropic and isotropic etching of a substrate, as well as chemical vapor deposition of a material onto a substrate. The reactor system comprises a processing chamber with a plasma shaping member contained therein. In one embodiment, the plasma shaping member extends from a portion of the top wall of the processing chamber, downward into the chamber, and it is generally positioned above the center of the substrate. The shaping member may be a separate piece of hardware attached to the top wall of the chamber, or it may be an integral part the wall itself. Preferably, the plasma shaping member has a recessed portion in the middle and an extended portion located at a distance outside that of the recessed region. The plasma shaping member may be fabricated from virtually any material since it is at an electrically floating potential during processing of the substrate.

Abstract: A miniature solid state laser is optically pumped by ultraviolet radiation produced by a surface or corona discharge. The device is monolithic in that both the optical pump and the active medium are contiguous to a base material which is optically transparent in the ultraviolet range. The disclosed device consists of a substrate, a thin metal halide or crystalline or amorphous film deposited on the bottom of the substrate and a pair of spaced electrodes on the top of the substrate. When a high voltage pulse is applied across the spaced electrodes, discharge occurs between the electrodes and produces strong ultraviolet emissions which propagate through the substrate and dissociates the metal halide molecules in the film. This causes laser emission to occur on an atomic transition of the metal atom. The active laser medium may also be a crystalline platelet or amorphous thin film containing an impurity atom or molecule (an example would be YAG doped with Nd or LiYF.sub.4 (YLF) doped with cerium).

Abstract: A high voltage linear switch assembly is disclosed that uses a hollow quartz tube as the insulator, and houses the anode, cathode and switch within the insulator tube. The anode and cathode are fixed within the tube on opposite sides so that they do not make physical contact with each other. A chamber filled with either hydrogen or helium and a metal electrode screen act as the switch as follows. By separating the anode from the cathode the gas filled chamber normally acts as an open circuit. When a charge is conducted by the metal electrode screen, the gas in the chamber is ionized and provides a medium to provide electrical contact between the anode and the cathode.