Patents by Inventor Mark J. Shaw

Mark J. Shaw has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Poly-hydroxy aromatic dissolution modifiers for lift-off resists
    Patent number: 6395449
    Abstract: Compositions useful for a lift-off resist in a bilayer metal lift-off process which comprise a mixture of at least one solvent, at least one polyglutarimide resin and an effective amount of at least one dissolution rate modifier selected from a group consisting of 2,3,4,2′,3′,4′-hexahydroxybenzophenone; hexahydroxyspirobiindane; 2,4,2′,4′-tetrahydroxybenzophenone; 1,1,1-tris-hydroxyphenylethane; 1,7-bis-(hydroxy-3-methoxyphenyl)-1,6-heptadiene-3,5-dione and at least one arylsulfonate ester of these poly-hydroxy aromatic compounds.
    Type: Grant
    Filed: March 31, 2000
    Date of Patent: May 28, 2002
    Assignee: MicroChem Corp.
    Inventors: Rodney J. Hurditch, Daniel J. Nawrocki, Mark J. Shaw