Patents by Inventor Mark J. Sundahl

Mark J. Sundahl has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Integrated circuit fabrication method
    Patent number: 5441616
    Abstract: A method for forming an anti-reflective coating useful in the fabrication of integrated circuits is discussed. Applicants have found that preheating semiconductor wafers prior to the application of amorphous silicon anti-reflective coatings tends to reduce undesirable particulates which may attach to the wafer. The process is illustratively performed in a Varian 3180 machine having four stations. Illustratively, the wafer may be preheated between 70.degree. C. and 175.degree. C. prior to and during the sputter deposition of an amorphous silicon anti-reflective coating.
    Type: Grant
    Filed: December 21, 1993
    Date of Patent: August 15, 1995
    Assignee: AT&T Corp.
    Inventors: Arun K. Nanda, Mark J. Sundahl, Edward J. Vajda
  • Integrated circuit fabrication method
    Patent number: 5312780
    Abstract: A method for forming an anti-reflective coating useful in the fabrication of integrated circuits is discussed. Applicants have found that preheating semiconductor wafers prior to the application of amorphous silicon anti-reflective coatings tends to reduce undesirable particulates which may attach to the wafer. The process is illustratively performed in a Varian 3180 machine having four stations. Illustratively, the wafer may be preheated between 70.degree. C. and 175.degree. C. prior to and during the sputter deposition of an amorphous silicon anti-reflective coating.
    Type: Grant
    Filed: December 16, 1992
    Date of Patent: May 17, 1994
    Assignee: AT&T Bell Laboratories
    Inventors: Arun K. Nanda, Mark J. Sundahl, Edward J. Vajda