Patents by Inventor Mark Jan Hendrik LUTTIKHOF

Mark Jan Hendrik LUTTIKHOF has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Method of reducing effects of reticle heating and/or cooling in a lithographic process
    Patent number: 10564555
    Abstract: A method of reducing effects of reticle heating and/or cooling in a lithographic process, the method including calibrating a linear time invariant reticle heating model using a system identification method; predicting distortions of the reticle using the reticle heating model and inputs in the lithographic process; and calculating and applying a correction in the lithographic process on the basis of the predicted distortions of the reticle.
    Type: Grant
    Filed: July 1, 2019
    Date of Patent: February 18, 2020
    Assignee: ASML Netherlands B.V.
    Inventors: Nick Kant, Mark Jan Hendrik Luttikhof
  • METHOD OF REDUCING EFFECTS OF RETICLE HEATING AND/OR COOLING IN A LITHOGRAPHIC PROCESS
    Publication number: 20190324376
    Abstract: A method of reducing effects of reticle heating and/or cooling in a lithographic process, the method including calibrating a linear time invariant reticle heating model using a system identification method; predicting distortions of the reticle using the reticle heating model and inputs in the lithographic process; and calculating and applying a correction in the lithographic process on the basis of the predicted distortions of the reticle.
    Type: Application
    Filed: July 1, 2019
    Publication date: October 24, 2019
    Applicant: ASML NETHERLANDS B.V.
    Inventors: Nick KANT, Mark Jan Hendrik LUTTIKHOF
  • Method of reducing effects of reticle heating and/or cooling in a lithographic process
    Patent number: 10429749
    Abstract: A method of reducing effects of reticle heating and/or cooling in a lithographic process, the method including calibrating a linear time invariant reticle heating model using a system identification method; predicting distortions of the reticle using the reticle heating model and inputs in the lithographic process; and calculating and applying a correction in the lithographic process on the basis of the predicted distortions of the reticle.
    Type: Grant
    Filed: August 26, 2016
    Date of Patent: October 1, 2019
    Assignee: ASML Netherlands B.V.
    Inventors: Nick Kant, Mark Jan Hendrik Luttikhof
  • Method of reducing effects of reticle heating and/or cooling in a lithographic process
    Patent number: 10386734
    Abstract: A method of reducing effects of reticle heating and/or cooling in a lithographic process, the method including calibrating a linear time invariant reticle heating model using a system identification method; predicting distortions of the reticle using the reticle heating model and inputs in the lithographic process; and calculating and applying a correction in the lithographic process on the basis of the predicted distortions of the reticle.
    Type: Grant
    Filed: August 26, 2016
    Date of Patent: August 20, 2019
    Assignee: ASML Netherlands B.V.
    Inventors: Nick Kant, Mark Jan Hendrik Luttikhof
  • METHOD OF REDUCING EFFECTS OF RETICLE HEATING AND/OR COOLING IN A LITHOGRAPHIC PROCESS
    Publication number: 20180259859
    Abstract: A method of reducing effects of reticle heating and/or cooling in a lithographic process, the method including calibrating a linear time invariant reticle heating model using a system identification method; predicting distortions of the reticle using the reticle heating model and inputs in the lithographic process; and calculating and applying a correction in the lithographic process on the basis of the predicted distortions of the reticle.
    Type: Application
    Filed: August 26, 2016
    Publication date: September 13, 2018
    Applicant: ASML NETHERLANDS B.V
    Inventors: Nick KANT, Mark Jan Hendrik LUTTIKHOF