Patents by Inventor Mark Joseph Bennahmias

Mark Joseph Bennahmias has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20240112882
    Abstract: A charged particle buncher includes a series of spaced apart electrodes arranged to generate a shaped electric field. The series includes a first electrode, a last electrode and one- or more intermediate electrodes. The charged particle buncher includes a waveform device attached to the electrodes and configured to apply a periodic potential waveform to each electrode independently in a manner so as to form a quasi-electrostatic time varying potential gradient between adjacent electrodes and to cause spatial distribution of charged particles that form a plurality of nodes and antinodes. The nodes have a charged particle density and the antinodes have substantially no charged particle density, and the nodes and the antinodes are formed from a charged particle beam configured to hit the target.
    Type: Application
    Filed: June 12, 2023
    Publication date: April 4, 2024
    Inventors: Mark Joseph Bennahmias, Michael John Zani, Jeffrey Winfield Scott
  • Patent number: 11699568
    Abstract: A charged particle buncher includes a series of spaced apart electrodes arranged to generate a shaped electric field. The series includes a first electrode, a last electrode and one or more intermediate electrodes. The charged particle buncher includes a waveform device attached to the electrodes and configured to apply a periodic potential waveform to each electrode independently in a manner so as to form a quasi-electrostatic time varying potential gradient between adjacent electrodes and to cause spatial distribution of charged particles that form a plurality of nodes and antinodes. The nodes have a charged particle density and the antinodes have substantially no charged particle density, and the nodes and the antinodes are formed from a charged particle beam configured to hit the target.
    Type: Grant
    Filed: April 19, 2022
    Date of Patent: July 11, 2023
    Assignee: NextGen Semi Holding, Inc.
    Inventors: Mark Joseph Bennahmias, Michael John Zani, Jeffrey Winfield Scott
  • Patent number: 11605522
    Abstract: A charged particle buncher includes a series of spaced apart electrodes arranged to generate a shaped electric field. The series includes a first electrode, a last electrode and one or more intermediate electrodes. The charged particle buncher includes a waveform device attached to the electrodes and configured to apply a periodic potential waveform to each electrode independently in a manner so as to form a quasi-electrostatic time varying potential gradient between adjacent electrodes and to cause spatial distribution of charged particles that form a plurality of nodes and antinodes. The nodes have a charged particle density and the antinodes have substantially no charged particle density, and the nodes and the antinodes are formed from a charged particle beam with an energy less than or equal to 500 keV.
    Type: Grant
    Filed: February 14, 2020
    Date of Patent: March 14, 2023
    Assignee: NexGen Semi Holding, Inc.
    Inventors: Mark Joseph Bennahmias, Michael John Zani, Jeffrey Winfield Scott
  • Publication number: 20220254603
    Abstract: A charged particle buncher includes a series of spaced apart electrodes arranged to generate a shaped electric field. The series includes a first electrode, a last electrode and one or more intermediate electrodes. The charged particle buncher includes a waveform device attached to the electrodes and configured to apply a periodic potential waveform to each electrode independently in a manner so as to form a quasi-electrostatic time varying potential gradient between adjacent electrodes and to cause spatial distribution of charged particles that form a plurality of nodes and antinodes. The nodes have a charged particle density and the antinodes have substantially no charged particle density, and the nodes and the antinodes are formed from a charged particle beam configured to hit the target.
    Type: Application
    Filed: April 19, 2022
    Publication date: August 11, 2022
    Inventors: Mark Joseph Bennahmias, Michael John Zani, Jeffrey Winfield Scott
  • Patent number: 11335537
    Abstract: A charged particle buncher includes a series of spaced apart electrodes arranged to generate a shaped electric-field. The series includes a first electrode, a last electrode and one or more intermediate electrodes. The charged particle buncher includes a waveform device attached to the electrodes and configured to apply a periodic potential waveform to each electrode independently in a manner so as to form a quasi-electrostatic time varying potential gradient between adjacent electrodes and to cause spatial distribution of charged particles that form a plurality of nodes and antinodes. The nodes have a charged particle density and the antinodes have substantially no charged particle density, and the nodes and the antinodes are formed from a charged particle beam with an energy greater than 500 keV.
    Type: Grant
    Filed: April 5, 2021
    Date of Patent: May 17, 2022
    Assignee: NexGen Semi Holding, Inc.
    Inventors: Mark Joseph Bennahmias, Michael John Zani, Jeffrey Winfield Scott
  • Publication number: 20220059319
    Abstract: A charged particle buncher includes a series of spaced apart electrodes arranged to generate a shaped electric-field. The series includes a first electrode, a last electrode and one or more intermediate electrodes. The charged particle buncher includes a waveform device attached to the electrodes and configured to apply a periodic potential waveform to each electrode independently in a manner so as to form a quasi-electrostatic time varying potential gradient between adjacent electrodes and to cause spatial distribution of charged particles that form a plurality of nodes and antinodes. The nodes have a charged particle density and the antinodes have substantially no charged particle density, and the nodes and the antinodes are formed from a charged particle beam with an energy greater than 500 keV.
    Type: Application
    Filed: April 5, 2021
    Publication date: February 24, 2022
    Inventors: Mark Joseph Bennahmias, Michael John Zani, Jeffrey Winfield Scott
  • Patent number: 10991545
    Abstract: A charged particle buncher includes a series of spaced apart electrodes arranged to generate a shaped electric field. The series includes a first electrode, a last electrode and one or more intermediate electrodes. The charged particle buncher includes a waveform device attached to the electrodes and configured to apply a periodic potential waveform to each electrode independently in a manner so as to form a quasi-electrostatic time varying potential gradient between adjacent electrodes and to cause spatial distribution of charged particles that form a plurality of nodes and antinodes. The nodes have a charged particle density and the antinodes have substantially no charged particle density, and the nodes and the antinodes are formed from a charged particle beam with an energy greater than 500 keV.
    Type: Grant
    Filed: August 5, 2019
    Date of Patent: April 27, 2021
    Assignee: NexGen Semi Holding, Inc.
    Inventors: Mark Joseph Bennahmias, Michael John Zani, Jeffrey Winfield Scott
  • Patent number: 10566169
    Abstract: A charged particle buncher includes a series of spaced apart electrodes arranged to generate a shaped electric field. The series includes a first electrode, a last electrode and one or more intermediate electrodes. The charged particle buncher includes a waveform device attached to the electrodes and configured to apply a periodic potential waveform to each electrode independently in a manner so as to form a quasi-electrostatic time varying potential gradient between adjacent electrodes and to cause spatial distribution of charged particles that form a plurality of nodes and antinodes. The nodes have a charged particle density and the antinodes have substantially no charged particle density, and the nodes and the antinodes are formed from a charged particle beam with an energy less than or equal to 500 keV.
    Type: Grant
    Filed: June 30, 2009
    Date of Patent: February 18, 2020
    Assignee: NexGen Semi Holding, Inc.
    Inventors: Mark Joseph Bennahmias, Michael John Zani, Jeffrey Winfield Scott
  • Publication number: 20200035452
    Abstract: A charged particle buncher includes a series of spaced apart electrodes arranged to generate a shaped electric field. The series includes a first electrode, a last electrode and one or more intermediate electrodes. The charged particle buncher includes a waveform device attached to the electrodes and configured to apply a periodic potential waveform to each electrode independently in a manner so as to form a quasi-electrostatic time varying potential gradient between adjacent electrodes and to cause spatial distribution of charged particles that form a plurality of nodes and antinodes. The nodes have a charged particle density and the antinodes have substantially no charged particle density, and the nodes and the antinodes are formed from a charged particle beam with an energy greater than 500 keV.
    Type: Application
    Filed: August 5, 2019
    Publication date: January 30, 2020
    Inventors: Mark Joseph Bennahmias, Michael John Zani, Jeffrey Winfield Scott
  • Patent number: 8658994
    Abstract: A chamber for exposing a workpiece to charged particles includes a charged particle source for generating a stream of charged particles, a collimator configured to collimate and direct the stream of charged particles from the charged particle source along an axis, a beam digitizer downstream of the collimator configured to create a digital beam including groups of at least one charged particle by adjusting longitudinal spacing between the charged particles along the axis, a deflector downstream of the beam digitizer including a series of deflection stages disposed longitudinally along the axis to deflect the digital beams, and a workpiece stage downstream of the deflector configured to hold the workpiece.
    Type: Grant
    Filed: January 20, 2012
    Date of Patent: February 25, 2014
    Assignee: Nexgen Semi Holding, Inc.
    Inventors: Michael John Zani, Mark Joseph Bennahmias, Jeffrey Winfield Scott
  • Patent number: 8409984
    Abstract: Certain embodiments disclosed herein relate to the formation of multi-component oxide heterostructures (MCOH) using surface nucleation to pattern the atomic layer deposition (ALD) of perovskite material followed by patterned etch and metallization to produce ultra-high density MCOH nano-electronic devices. Applications include ultra-high density MCOH memory and logic, as well as electronic functionality based on single electrons, for example a novel flash memory cell Floating-Gate (FG) transistor with LaAlO3 as a gate tunneling dielectric. Other types of memory devices (DIMMS, DRAM, and DDR) made with patterned ALD of LaAlO3 as a gate dielectric are also possible.
    Type: Grant
    Filed: June 10, 2010
    Date of Patent: April 2, 2013
    Assignee: NexGen Semi Holding, Inc.
    Inventors: Mark Joseph Bennahmias, Michael John Zani, Jeffrey Winfield Scott
  • Publication number: 20120275189
    Abstract: A backlight apparatus comprised of a light pipe with one or more light input ends, a top surface, a bottom surface, opposing side, a non imaging optic collimator and scatter inducing elements. The non imaging optic collimator causes the light rays entering into the light pipe to be directed towards the far end relative to the light input end in a specified angular distribution. Pluralities of scatter induced elements (SIE) are introduced in the body of the light pipe between the applicable light input end and the corresponding far end. Individual scatter induced elements may be formed in any geometry, and may be grouped or separated such that there exists a variation of SIE each individually or as grouped, possessing discrete geometries.
    Type: Application
    Filed: April 26, 2011
    Publication date: November 1, 2012
    Inventors: Jeffrey A. Laine, Mark Joseph Bennahmias
  • Publication number: 20120112323
    Abstract: A chamber for exposing a workpiece to charged particles includes a charged particle source for generating a stream of charged particles, a collimator configured to collimate and direct the stream of charged particles from the charged particle source along an axis, a beam digitizer downstream of the collimator configured to create a digital beam including groups of at least one charged particle by adjusting longitudinal spacing between the charged particles along the axis, a deflector downstream of the beam digitizer including a series of deflection stages disposed longitudinally along the axis to deflect the digital beams, and a workpiece stage downstream of the deflector configured to hold the workpiece.
    Type: Application
    Filed: January 20, 2012
    Publication date: May 10, 2012
    Applicant: NEXGEN SEMI HOLDING, INC.
    Inventors: Michael John Zani, Mark Joseph Bennahmias, Mark Anthony Mayse, Jeffrey Winfield Scott
  • Publication number: 20110167913
    Abstract: Imaging devices for measuring a structure of a surface and methods of use are provided. In certain embodiments, an imaging device includes at least one nano-mechanical resonator pair. The pair includes a reference resonator having a reference resonant frequency, and a sense resonator having a first sense resonant frequency. The device is configured to expose the sense resonator to the surface such that the sense resonator has a second sense resonant frequency. The device is also configured to measure the structure of the surface based on a difference between the second sense resonant frequency and the reference resonant frequency. In certain embodiments, an imaging device for measuring the structure of a surface includes an array of sense nano-electromechanical resonators. In certain embodiments, the array of single nano-electromechanical resonators is advantageously arranged in a staggered configuration.
    Type: Application
    Filed: October 15, 2010
    Publication date: July 14, 2011
    Applicant: NEXGEN SEMI HOLDING, INC.
    Inventors: Mark Joseph Bennahmias, Michael John Zani
  • Publication number: 20110065237
    Abstract: Certain embodiments disclosed herein relate to the formation of multi-component oxide heterostructures (MCOH) using surface nucleation to pattern the atomic layer deposition (ALD) of perovskite material followed by patterned etch and metallization to produce ultra-high density MCOH nano-electronic devices. Applications include ultra-high density MCOH memory and logic, as well as electronic functionality based on single electrons, for example a novel flash memory cell Floating-Gate (FG) transistor with LaAlO3 as a gate tunneling dielectric. Other types of memory devices (DIMMS, DRAM, and DDR) made with patterned ALD of LaAlO3 as a gate dielectric are also possible.
    Type: Application
    Filed: June 10, 2010
    Publication date: March 17, 2011
    Applicant: NEXGEN SEMI HOLDING, INC.
    Inventors: Mark Joseph Bennahmias, Michael John Zani, Jeffrey Winfield Scott
  • Publication number: 20100098922
    Abstract: A chamber for exposing a workpiece to charged particles includes a charged particle source for generating a stream of charged particles, a collimator configured to collimate and direct the stream of charged particles from the charged particle source along an axis, a beam digitizer downstream of the collimator configured to create a digital beam including groups of at least one charged particle by adjusting longitudinal spacing between the charged particles along the axis, a deflector downstream of the beam digitizer including a series of deflection stages disposed longitudinally along the axis to deflect the digital beams, and a workpiece stage downstream of the deflector configured to hold the workpiece.
    Type: Application
    Filed: December 18, 2009
    Publication date: April 22, 2010
    Applicant: NEXGEN SEMI HOLDING, INC.
    Inventors: Michael John Zani, Mark Joseph Bennahmias, Mark Anthony Mayse, Jeffrey Winfield Scott
  • Patent number: 7659526
    Abstract: A chamber for exposing a workpiece to charged particles includes a charged particle source for generating a stream of charged particles, a collimator configured to collimate and direct the stream of charged particles from the charged particle source along an axis, a beam digitizer downstream of the collimator configured to create a digital beam including groups of at least one charged particle by adjusting longitudinal spacing between the charged particles along the axis, a deflector downstream of the beam digitizer including a series of deflection stages disposed longitudinally along the axis to deflect the digital beams, and a workpiece stage downstream of the deflector configured to hold the workpiece.
    Type: Grant
    Filed: August 20, 2007
    Date of Patent: February 9, 2010
    Assignee: NexGen Semi Holding, Inc.
    Inventors: Michael John Zani, Mark Joseph Bennahmias, Mark Anthony Mayse, Jeffrey Winfield Scott
  • Patent number: 7507960
    Abstract: A chamber for exposing a workpiece to charged particles includes a charged particle source for generating a stream of charged particles, a collimator configured to collimate and direct the stream of charged particles from the charged particle source along an axis, a beam digitizer downstream of the collimator configured to create a digital beam including groups of at least one charged particle by adjusting longitudinal spacing between the charged particles along the axis, a deflector downstream of the beam digitizer including a series of deflection stages disposed longitudinally along the axis to deflect the digital beams, and a workpiece stage downstream of the deflector configured to hold the workpiece.
    Type: Grant
    Filed: August 17, 2007
    Date of Patent: March 24, 2009
    Assignee: NexGen Semi Holding, Inc.
    Inventors: Michael John Zani, Mark Joseph Bennahmias, Mark Anthony Mayse, Jeffrey Winfield Scott
  • Patent number: 7501644
    Abstract: A chamber for exposing a workpiece to charged particles includes a charged particle source for generating a stream of charged particles, a collimator configured to collimate and direct the stream of charged particles from the charged particle source along an axis, a beam digitizer downstream of the collimator configured to create a digital beam including groups of at least one charged particle by adjusting longitudinal spacing between the charged particles along the axis, a deflector downstream of the beam digitizer including a series of deflection stages disposed longitudinally along the axis to deflect the digital beams, and a workpiece stage downstream of the deflector configured to hold the workpiece.
    Type: Grant
    Filed: August 20, 2007
    Date of Patent: March 10, 2009
    Assignee: NexGen Semi Holding, Inc.
    Inventors: Michael John Zani, Mark Joseph Bennahmias, Mark Anthony Mayse, Jeffrey Winfield Scott
  • Patent number: 7495244
    Abstract: A chamber for exposing a workpiece to charged particles includes a charged particle source for generating a stream of charged particles, a collimator configured to collimate and direct the stream of charged particles from the charged particle source along an axis, a beam digitizer downstream of the collimator configured to create a digital beam including groups of at least one charged particle by adjusting longitudinal spacing between the charged particles along the axis, a deflector downstream of the beam digitizer including a series of deflection stages disposed longitudinally along the axis to deflect the digital beams, and a workpiece stage downstream of the deflector configured to hold the workpiece.
    Type: Grant
    Filed: August 20, 2007
    Date of Patent: February 24, 2009
    Assignee: NexGen Semi Holding, Inc.
    Inventors: Michael John Zani, Mark Joseph Bennahmias, Mark Anthony Mayse, Jeffrey Winfield Scott