Patents by Inventor Mark K. Fletcher

Mark K. Fletcher has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • DMD pixel with small-rotated-moved via2 to reduce beam-electrode shorts
    Patent number: 6897991
    Abstract: A digital micromirror device with an optimized beam dimple formed over the via2 to provide process margin by increasing the clearance between the beam and the address electrode, thus reducing shorting between the two. This approach assures that when the beam tilts, it will land on its tips prior to making contact between the beam and address electrode, which are at different potentials. Beam dimple optimization is controlled by the characteristics of the via2 located on the lower metal-3 layer of the device.
    Type: Grant
    Filed: February 3, 2003
    Date of Patent: May 24, 2005
    Assignee: Texas Instruments Incorporated
    Inventors: James D. Huffman, Brian K. Dodge, Mark K. Fletcher
  • DMD pixel with small-rotated-moved via2 to reduce beam-electrode shorts
    Publication number: 20030156261
    Abstract: A digital micromirror device with an optimized beam dimple formed over the via2 to provide process margin by increasing the clearance between the beam and the address electrode, thus reducing shorting between the two. This approach assures that when the beam tilts, it will land on its tips prior to making contact between the beam and address electrode, which are at different potentials. Beam dimple optimization is controlled by the characteristics of the via2 located on the lower metal-3 layer of the device.
    Type: Application
    Filed: February 3, 2003
    Publication date: August 21, 2003
    Inventors: James D. Huffman, Brian K. Dodge, Mark K. Fletcher