Patents by Inventor Mark Kroon

Mark Kroon has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Lithographic apparatus and device manufacturing method
    Patent number: 11003096
    Abstract: A lithographic apparatus is provided that has a sensor at substrate level, the sensor including a radiation receiver, a transmissive plate supporting the radiation receiver, and a radiation detector, wherein the sensor is arranged to avoid loss of radiation between the radiation receiver and a final element of the radiation detector.
    Type: Grant
    Filed: December 18, 2019
    Date of Patent: May 11, 2021
    Assignee: ASML NETHERLANDS B.V.
    Inventors: Timotheus Franciscus Sengers, Marcus Adrianus Van De Kerkhof, Mark Kroon, Kees Van Weert
  • Lithographic apparatus and device manufacturing method
    Patent number: 10678139
    Abstract: A lithographic projection apparatus is disclosed in which a space between the projection system and a sensor is filled with a liquid.
    Type: Grant
    Filed: January 11, 2019
    Date of Patent: June 9, 2020
    Assignee: ASML Netherlands B.V.
    Inventors: Joeri Lof, Hans Butler, Sjoerd Nicolaas Lambertus Donders, Aleksey Yurievich Kolesnychenko, Erik Roelof Loopstra, Hendricus Johannes Maria Meijer, Johannes Catherinus Hubertus Mulkens, Roelof Aeilko Siebrand Ritsema, Frank Van Schaik, Timotheus Franciscus Sengers, Klaus Simon, Joannes Theodoor De Smit, Alexander Straaijer, Bob Streefkerk, Erik Theodorus Maria Bijlaart, Christiaan Alexander Hoogendam, Helmar Van Santen, Marcus Adrianus Van De Kerkhof, Mark Kroon, Arie Jeffrey Den Boef, Joost Jeroen Ottens, Jeroen Johannes Sophia Maria Mertens
  • LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD
    Publication number: 20200124990
    Abstract: A lithographic apparatus is provided that has a sensor at substrate level, the sensor including a radiation receiver, a transmissive plate supporting the radiation receiver, and a radiation detector, wherein the sensor is arranged to avoid loss of radiation between the radiation receiver and a final element of the radiation detector.
    Type: Application
    Filed: December 18, 2019
    Publication date: April 23, 2020
    Applicant: ASLM Netherlands B.V.
    Inventors: Timotheus Franciscus SENGERS, Marcus Adrianus VAN DE KERKHOF, Mark KROON, Kees VAN WEERT
  • Lithographic apparatus and device manufacturing method
    Patent number: 10514618
    Abstract: A lithographic apparatus is provided that has a sensor at substrate level, the sensor including a radiation receiver, a transmissive plate supporting the radiation receiver, and a radiation detector, wherein the sensor is arranged to avoid loss of radiation between the radiation receiver and a final element of the radiation detector.
    Type: Grant
    Filed: July 3, 2018
    Date of Patent: December 24, 2019
    Assignee: ASML NETHERLANDS B.V.
    Inventors: Timotheus Franciscus Sengers, Marcus Adrianus Van De Kerkhof, Mark Kroon, Kees Van Weert
  • LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD
    Publication number: 20190250518
    Abstract: A lithographic projection apparatus is disclosed in which a space between the projection system and a sensor is filled with a liquid.
    Type: Application
    Filed: January 11, 2019
    Publication date: August 15, 2019
    Applicant: ASML NETHERLANDS B.V.
    Inventors: Joeri LOF, Hans BUTLER, Sjoerd Nicolaas Lambertus DONDERS, Aleksey Yurievich KOLESNYCHENKO, Erik Roelof LOOPSTRA, Hendricus Johannes Maria MEIJER, Johannes Catherinus Hubertus MULKENS, Roelof Aeilko Siebrand RITSEMA, Frank VAN SCHAIK, Timotheus Franciscus SENGERS, Klaus SIMON, Joannes Theodoor DE SMIT, Alexander STRAAIJER, Bob STREEFKERK, Erik Theodorus Maria BIJLAART, Christiaan Alexander HOOGENDAM, Helmar VAN SANTEN, Marcus Adrianus VAN DE KERKHOF, Mark KROON, Arie Jeffrey DEN BOEF, Joost Jeroen OTTENS, Jeroen Johannes Sophia Maria MERTENS
  • Lithographic apparatus and device manufacturing method
    Patent number: 10180629
    Abstract: A lithographic projection apparatus is disclosed in which a space between the projection system and a sensor is filled with a liquid.
    Type: Grant
    Filed: December 20, 2016
    Date of Patent: January 15, 2019
    Assignee: ASML Netherlands B.V.
    Inventors: Joeri Lof, Hans Butler, Sjoerd Nicolaas Lambertus Donders, Aleksey Yurievich Kolesnychenko, Erik Roelof Loopstra, Hendricus Johannes Maria Meijer, Johannes Catherinus Hubertus Mulkens, Roelof Aeilko Siebranc Ritsema, Frank Van Schaik, Timotheus Franciscus Sengers, Klaus Simon, Joannes Theodoor De Smit, Alexander Straaijer, Bob Streefkerk, Erik Theodorus Maria Bijlaart, Christian Alexander Hoogendam, Helmar Van Santen, Marcus Adrianus Van De Kerkhof, Mark Kroon, Arie Jeffrey Den Boef, Joost Jeroen Ottens, Jeroen Johannes Sophia Maria Mertens
  • LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD
    Publication number: 20180314169
    Abstract: A lithographic apparatus is provided that has a sensor at substrate level, the sensor including a radiation receiver, a transmissive plate supporting the radiation receiver, and a radiation detector, wherein the sensor is arranged to avoid loss of radiation between the radiation receiver and a final element of the radiation detector.
    Type: Application
    Filed: July 3, 2018
    Publication date: November 1, 2018
    Applicant: ASML Netherlands B. V.
    Inventors: Timotheus Franciscus SENGERS, Marcus Adrianus Van De Kerkhof, Mark Kroon, Kees Van Weert
  • Lithographic apparatus and device manufacturing method
    Patent number: 10025204
    Abstract: A lithographic apparatus is provided that has a sensor at substrate level, the sensor including a radiation receiver, a transmissive plate supporting the radiation receiver, and a radiation detector, wherein the sensor is arranged to avoid loss of radiation between the radiation receiver and a final element of the radiation detector.
    Type: Grant
    Filed: February 9, 2017
    Date of Patent: July 17, 2018
    Assignee: ASML Netherlands B.V.
    Inventors: Timotheus Franciscus Sengers, Marcus Adrianus Van De Kerkhof, Mark Kroon, Kees Van Weert
  • LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD
    Publication number: 20170153556
    Abstract: A lithographic apparatus is provided that has a sensor at substrate level, the sensor including a radiation receiver, a transmissive plate supporting the radiation receiver, and a radiation detector, wherein the sensor is arranged to avoid loss of radiation between the radiation receiver and a final element of the radiation detector.
    Type: Application
    Filed: February 9, 2017
    Publication date: June 1, 2017
    Applicant: ASML NETHERLANDS B.V.
    Inventors: Timotheus Franciscus SENGERS, Marcus Adrianus VAN DE KERKHOF, Mark Kroon, Kees VAN WEERT
  • LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD
    Publication number: 20170102621
    Abstract: A lithographic projection apparatus is disclosed in which a space between the projection system and a sensor is filled with a liquid.
    Type: Application
    Filed: December 20, 2016
    Publication date: April 13, 2017
    Applicant: ASML NETHERLANDS B.V.
    Inventors: Joeri LOF, Hans BUTLER, Sjoerd Nicolaas Lambertus DONDERS, Aleksey Yurievich KOLESNYCHENKO, Erik Roelof LOOPSTRA, Hendricus Johannes Maria MEIJER, Johannes Catherinus Hubertus MULKENS, Roelof Aeilko Siebranc RITSEMA, Frank VAN SCHAIK, Timotheus Franciscus SENGERS, Klaus SIMON, Joannes Theodoor DE SMIT, Alexander STRAAIJER, Bob STREEFKERK, Erik Theodorus Maria BIJLAART, Christiaan Alexander HOOGENDAM, Helmar VAN SANTEN, Marcus Adrianus VAN DE KERKHOF, Mark KROON, Arie Jeffrey DEN BOEF, Joost Jeroen OTTENS, Jeroen Johannes Sophia Maria MERTENS
  • Lithographic apparatus and device manufacturing method
    Patent number: 9568841
    Abstract: A lithographic apparatus is provided that has a sensor at substrate level, the sensor including a radiation receiver, a transmissive plate supporting the radiation receiver, and a radiation detector, wherein the sensor is arranged to avoid loss of radiation between the radiation receiver and a final element of the radiation detector.
    Type: Grant
    Filed: March 24, 2016
    Date of Patent: February 14, 2017
    Assignee: ASML NETHERLANDS B.V.
    Inventors: Timotheus Franciscus Sengers, Marcus Adrianus Van De Kerkhof, Mark Kroon, Kees Van Weert
  • Lithographic apparatus and device manufacturing method involving a sensor detecting a radiation beam through liquid
    Patent number: 9541843
    Abstract: A lithographic projection apparatus and device manufacturing method is disclosed in which a space between a projection system and an object on a substrate table, is at least partly filled with a liquid. A sensor is positioned to be illuminated by a beam of radiation once it has passed through the liquid. An edge seal member may be provided to at least partly surround an edge of the sensor and to provide a primary surface facing the projection system substantially co-planar with a primary surface of the sensor.
    Type: Grant
    Filed: November 29, 2011
    Date of Patent: January 10, 2017
    Assignee: ASML NETHERLANDS B.V.
    Inventors: Joeri Lof, Erik Theodorus Maria Bijlaart, Roelof Aeilko Siebrand Ritsema, Frank Van Schaik, Timotheus Franciscus Sengers, Klaus Simon, Joannes Theodoor De Smit, Arie Jeffrey Maria Den Boef, Hans Butler, Sjoerd Nicolaas Lambertus Donders, Christiaan Alexander Hoogendam, Marcus Adrianus Van De Kerkhof, Aleksey Yurievich Kolesnychenko, Mark Kroon, Joost Jeroen Ottens, Erik Roelof Loopstra, Hendricus Johannes Maria Meijer, Jeroen Johannes Sophia Maria Mertens, Johannes Catharinus Hubertus Mulkens, Alexander Straaijer, Bob Streefkerk, Helmar Van Santen
  • LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD
    Publication number: 20160209761
    Abstract: A lithographic apparatus is provided that has a sensor at substrate level, the sensor including a radiation receiver, a transmissive plate supporting the radiation receiver, and a radiation detector, wherein the sensor is arranged to avoid loss of radiation between the radiation receiver and a final element of the radiation detector.
    Type: Application
    Filed: March 24, 2016
    Publication date: July 21, 2016
    Applicant: ASML NETHERLANDS B.V.
    Inventors: Timotheus Franciscus SENGERS, Marcus Adrianus VAN DE KERKHOF, Mark KROON, Kees VAN WEERT
  • Lithographic apparatus and device manufacturing method
    Patent number: 9316919
    Abstract: A lithographic apparatus is provided that has a sensor at substrate level, the sensor including a radiation receiver, a transmissive plate supporting the radiation receiver, and a radiation detector, wherein the sensor is arranged to avoid loss of radiation between the radiation receiver and a final element of the radiation detector.
    Type: Grant
    Filed: December 29, 2014
    Date of Patent: April 19, 2016
    Assignee: ASML NETHERLANDS B.V.
    Inventors: Timotheus Franciscus Sengers, Marcus Adrianus Van De Kerkhof, Mark Kroon, Kees Van Weert
  • Lithographic apparatus and device manufacturing method involving a member and a fluid opening
    Patent number: 9152058
    Abstract: An exposure apparatus including a movable table, a member, movably separate from the table and located on a top surface of the table, to provide a surface substantially co-planar with a top surface of an object in or on the table, a projection system configured to project a radiation beam onto a radiation-sensitive target portion of a substrate, and a liquid supply system configured to provide a liquid to a space between the projection system and the object.
    Type: Grant
    Filed: July 29, 2011
    Date of Patent: October 6, 2015
    Assignee: ASML NETHERLANDS B.V.
    Inventors: Joeri Lof, Erik Theodorus Maria Bijlaart, Roelof Aeilko Siebrand Ritsema, Frank Van Schaik, Timotheus Franciscus Sengers, Klaus Simon, Joannes Theodoor De Smit, Arie Jeffrey Maria Den Boef, Hans Butler, Sjoerd Nicolaas Lambertus Donders, Christiaan Alexander Hoogendam, Marcus Adrianus Van De Kerkhof, Aleksey Yurievich Kolensnychenko, Mark Kroon, Erik Roelof Loopstra, Hendricus Johannes Maria Meijer, Jeroen Johannes Sophia Maria Mertens, Johannes Catharinus Hubertus Mulkens, Joost Jeroen Ottens, Alexander Straaijer, Bob Streefkerk, Helmar Van Santen
  • Lithographic apparatus and device manufacturing method involving removal of liquid entering a gap
    Patent number: 9081299
    Abstract: An exposure apparatus including a liquid supply system configured to provide a liquid to a space between the projection system and an object, and a movable table having a recess, the recess including therein the object or a surface to hold and support the object, wherein a gap opening into which the liquid can enter is defined between a peripheral wall of the recess and the object, and the recess further including a fluid opening, below the gap opening, to remove the liquid entering the gap opening.
    Type: Grant
    Filed: August 1, 2011
    Date of Patent: July 14, 2015
    Assignee: ASML NETHERLANDS B.V.
    Inventors: Joeri Lof, Erik Theodorus Maria Bijlaart, Roelof Aeilko Siebrand Ritsema, Frank Van Schaik, Timotheus Franciscus Sengers, Klaus Simon, Joannes Theodoor De Smit, Arie Jeffrey Maria Den Boef, Hans Butler, Sjoerd Nicolaas Lambertus Donders, Christiaan Alexander Hoogendam, Marcus Adrianus Van De Kerkhof, Aleksey Yurievich Kolesnychenko, Mark Kroon, Erik Roelof Loopstra, Hendricus Johannes Maria Meijer, Jeroen Johannes Sophia Maria Mertens, Johannes Catharinus Hubertus Mulkens, Joost Jeroen Ottens, Alexander Straaijer, Bob Streefkerk, Helmar Van Santen
  • LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD
    Publication number: 20150116683
    Abstract: A lithographic apparatus is provided that has a sensor at substrate level, the sensor including a radiation receiver, a transmissive plate supporting the radiation receiver, and a radiation detector, wherein the sensor is arranged to avoid loss of radiation between the radiation receiver and a final element of the radiation detector.
    Type: Application
    Filed: December 29, 2014
    Publication date: April 30, 2015
    Applicant: ASML NETHERLANDS B.V.
    Inventors: Timotheus Franciscus SENGERS, Marcus Adrianus VAN DE KERKHOF, Mark KROON, Kees VAN WEERT
  • Lithographic apparatus and device manufacturing method
    Patent number: 8947637
    Abstract: A lithographic apparatus is provided that has a sensor at substrate level, the sensor including a radiation receiver, a transmissive plate supporting the radiation receiver, and a radiation detector, wherein the sensor is arranged to avoid loss of radiation between the radiation receiver and a final element of the radiation detector.
    Type: Grant
    Filed: September 6, 2011
    Date of Patent: February 3, 2015
    Assignee: ASML Netherlands B.V.
    Inventors: Timotheus Franciscus Sengers, Marcus Adrianus Van De Kerkhof, Mark Kroon, Kees Van Weert
  • Lithographic apparatus and device manufacturing method
    Patent number: 8482845
    Abstract: A lithographic projection apparatus is disclosed in which a space between the projection system and a sensor is filled with a liquid.
    Type: Grant
    Filed: February 2, 2010
    Date of Patent: July 9, 2013
    Assignee: ASML Netherlands B.V.
    Inventors: Joeri Lof, Erik Theodorus Maria Bijlaart, Roelof Aeilko Siebrand Ritsema, Frank Van Schaik, Timotheus Franciscus Sengers, Klaus Simon, Joannes Theodoor De Smit, Arie Jeffrey Maria Den Boef, Hans Butler, Sjoerd Nicolaas Lambertus Donders, Christiaan Alexander Hoogendam, Marcus Adrianus Van De Kerkhof, Aleksey Yurievich Kolesnychenko, Mark Kroon, Erik Roelof Loopstra, Hendricus Johannes Maria Meijer, Jeroen Johannes Sophia Maria Mertens, Johannes Catharinus Hubertus Mulkens, Joost Jeroen Ottens, Alexander Straaijer, Bob Streefkerk, Helmar Van Santen
  • LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD
    Publication number: 20120274911
    Abstract: A lithographic projection apparatus is disclosed in which a space between the projection system and a sensor is filled with a liquid.
    Type: Application
    Filed: November 29, 2011
    Publication date: November 1, 2012
    Applicant: ASML NETHERLANDS B.V.
    Inventors: Joeri LOF, Erik Theodorus Maria Bijlaart, Roelof Aeilko Siebrand Ritsema, Frank Van Schaik, Timotheus Franciscus Sengers, Klaus Simon, Arie Jeffrey Maria Den Boef, Hans Butler, Sjoerd Nicolaas Lambertus Donders, Christiaan Alexander Hoogendam, Marcus Adrianus Van De Kerkhof, Aleksey Yurievich Kolesnychenko, Mark Kroon, Erik Roelof Loopstra, Hendricus Johannes Maria Meijer, Jeroen Johannes Sophia Maria Mertens, Joannes Theodoor De Smit, Johannes Catherinus Hubertus Mulkens, Joost Jeroen Ottens, Alexander Straaijer, Bob Streefkerk, Helmar Van Santen