Patents by Inventor Mark L. Armstrong

Mark L. Armstrong has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Apparatus for thermal development with a conformable support
    Patent number: 9057958
    Abstract: The present invention provides a method and apparatus for forming a printing form from a photosensitive element to form a relief pattern. The method and apparatus thermally develop the photosensitive element by heating a composition layer of the element to cause a portion of the layer to liquefy and providing a development medium to the element to remove the liquefied composition. A conformable layer is disposed between the photosensitive element and a base support, which improves the compressibility and the contact between the photosensitive element and the development medium. The method and apparatus improve the efficiency of the removal of liquefied portions from the photosensitive element and the uniformity of the relief pattern formed.
    Type: Grant
    Filed: July 3, 2013
    Date of Patent: June 16, 2015
    Assignee: E I DU PONT DE NEMOURS AND COMPANY
    Inventors: Mark L. Armstrong, Hao Chang
  • APPARATUS FOR THERMAL DEVELOPMENT WITH A CONFORMABLE SUPPORT
    Publication number: 20130295508
    Abstract: The present invention provides a method and apparatus for forming a printing form from a photosensitive element to form a relief pattern. The method and apparatus thermally develop the photosensitive element by heating a composition layer of the element to cause a portion of the layer to liquefy and providing a development medium to the element to remove the liquefied composition. A conformable layer is disposed between the photosensitive element and a base support, which improves the compressibility and the contact between the photosensitive element and the development medium. The method and apparatus improve the efficiency of the removal of liquefied portions from the photosensitive element and the uniformity of the relief pattern formed.
    Type: Application
    Filed: July 3, 2013
    Publication date: November 7, 2013
    Inventors: MARK L. ARMSTRONG, HAO CHANG
  • Method for thermal development with a conformable support
    Patent number: 8492073
    Abstract: The present invention provides a method and apparatus for forming a printing form from a photosensitive element to form a relief pattern. The method and apparatus thermally develop the photosensitive element by heating a composition layer of the element to cause a portion of the layer to liquefy and providing a development medium to the element to remove the liquefied composition. A conformable layer is disposed between the photosensitive element and a base support, which improves the compressibility and the contact between the photosensitive element and the development medium. The method and apparatus improve the efficiency of the removal of liquefied portions from the photosensitive element and the uniformity of the relief pattern formed.
    Type: Grant
    Filed: September 11, 2008
    Date of Patent: July 23, 2013
    Assignee: E I Du Pont de Nemours and Company
    Inventors: Mark L. Armstrong, Hao Chang
  • Method and apparatus for thermal development with a conformable support
    Publication number: 20100062376
    Abstract: The present invention provides a method and apparatus for forming a printing form from a photosensitive element to form a relief pattern. The method and apparatus thermally develop the photosensitive element by heating a composition layer of the element to cause a portion of the layer to liquefy and providing a development medium to the element to remove the liquefied composition. A conformable layer is disposed between the photosensitive element and a base support, which improves the compressibility and the contact between the photosensitive element and the development medium. The method and apparatus improve the efficiency of the removal of liquefied portions from the photosensitive element and the uniformity of the relief pattern formed.
    Type: Application
    Filed: September 11, 2008
    Publication date: March 11, 2010
    Applicant: E. I. du Pont de Nemours and Company
    Inventors: Mark L. Armstrong, Hao Chang
  • Dry film process for altering wavelength response of holograms
    Patent number: 5024909
    Abstract: Wavelength response of volume holograms is altered by contact with a dry film diffusion element.
    Type: Grant
    Filed: June 12, 1990
    Date of Patent: June 18, 1991
    Assignee: E. I. Du Pont de Nemours and Company
    Inventors: William K. Smothers, Krishna C. Doraiswamy, Mark L. Armstrong
  • Method and system for making a reflection hologram
    Patent number: 4995685
    Abstract: The invention relates to a method and system for making reflection holograms and, more specifically, for making reflection holograms from a cylindrical surface of a master. Means are provided to direct substantially monochromatic actinic radiation through a recording medium sensitive to such radiation coupled to the cylindrical surface of the master such that the angle of incidence of the radiation on the master is substantially constant.
    Type: Grant
    Filed: May 16, 1989
    Date of Patent: February 26, 1991
    Assignee: E. I. Du Pont de Nemours and Company
    Inventors: Mark L. Armstrong, Daniel J. Mickish
  • Dry film process for altering wavelength response of holograms
    Patent number: 4959283
    Abstract: Wavelength response of volume holograms is altered by contact with a dry film diffusion element.
    Type: Grant
    Filed: July 14, 1989
    Date of Patent: September 25, 1990
    Assignee: E. I. du Pont de Nemours and Company
    Inventors: William K. Smothers, Krishna C. Doraiswamy, Mark L. Armstrong, Torence J. Trout