Patents by Inventor Mark L. O'Neill

Mark L. O'Neill has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 8703625
    Abstract: Described herein are methods of forming dielectric films comprising silicon, oxide, and optionally nitrogen, carbon, hydrogen, and boron. Also disclosed herein are the methods to form dielectric films or coatings on an object to be processed, such as, for example, a semiconductor wafer.
    Type: Grant
    Filed: January 28, 2011
    Date of Patent: April 22, 2014
    Assignee: Air Products and Chemicals, Inc.
    Inventors: Liu Yang, Manchao Xiao, Bing Han, Kirk S. Cuthill, Mark L. O'Neill
  • Publication number: 20110215445
    Abstract: Described herein are methods of forming dielectric films comprising silicon, oxide, and optionally nitrogen, carbon, hydrogen, and boron. Also disclosed herein are the methods to form dielectric films or coatings on an object to be processed, such as, for example, a semiconductor wafer.
    Type: Application
    Filed: January 28, 2011
    Publication date: September 8, 2011
    Applicant: AIR PRODUCTS AND CHEMICALS, INC.
    Inventors: Liu Yang, Manchao Xiao, Bing Han, Kirk S. Cuthill, Mark L. O'Neill