Abstract: A substrate may be disposed on a substrate support in a flood exposure treatment system. A flood exposure dose profile may be selected. The substrate may be exposed to flood irradiation from a source, and the flood irradiation may be terminated when the selected flood exposure dose profile is achieved. Exposing the substrate to flood irradiation may comprise controlling at least one of a substrate rotation rate, a source scanning rate, a substrate scanning rate, a source power setting, a distance from the source to the substrate, a source aperture setting, an angle of incidence of flood irradiation on the substrate, and a source focus position to achieve the selected flood exposure dose profile.

Abstract: A substrate may be disposed on a substrate support in a flood exposure treatment system. A flood exposure dose profile may be selected. The substrate may be exposed to flood irradiation from a source, and the flood irradiation may be terminated when the selected flood exposure dose profile is achieved. Exposing the substrate to flood irradiation may comprise controlling at least one of a substrate rotation rate, a source scanning rate, a substrate scanning rate, a source power setting, a distance from the source to the substrate, a source aperture setting, an angle of incidence of flood irradiation on the substrate, and a source focus position to achieve the selected flood exposure dose profile.

Abstract: Processes and apparati for shaping sheet glass or thermoplastic materials use force from a layer of a flowing fluid, such as air, between the sheet and a mandrel at close to the softening temperature of the thermoplastic. The shape is preserved by cooling. The shape of the air bearing mandrel and the pressure distribution of the fluid contribute to the final shape. A process can be conducted on one or two surfaces such that the force from the air layer is on one or two surfaces of the sheet. The gap size between the sheet and mandrel determines the pressure profile in the gap, which also determines the final sheet shape. In general, smaller gaps lead to larger viscous forces. The pressure profile depends on the shape of the mandrel, the size of the fluid gap and the sheet and the fluid supply pressure.

Abstract: Processes and apparati for shaping sheet glass or thermoplastic materials use force from a layer of a flowing fluid, such as air, between the sheet and a mandrel at close to the softening temperature of the thermoplastic. The shape is preserved by colling. The shape of the air bearing mandrel and the pressure distribution of the fluid contribute to the final shape. A process can be conducted on one or two surfaces such that the force from the air layer is on one or two surfaces of the sheet. The gap size between the sheet and mandrel determines the pressure profile in the gap, which also determines the final sheet shape. In general, smaller gaps lead to larger viscous forces. The pressure profile depends on the shape of the mandrel, the size of the fluid gap and the sheet and the fluid supply pressure.

Abstract: Fine positioning of a shaped or patterned charged particle beam without use of intrusive fiducial marks is achieved by providing a dithered shadow pattern, preferably in the form of a grid, within the shaped or patterned charged particle beam. Light output from fiducial marks preferably formed of a scintillating material is reduced when the dithered shadow pattern is incident on some or all of the fiducial marks. The timing of the incidence of the shadow pattern on fiducial marks indicates the position of the shaped or patterned charged particle beam such that correction of the beam position on the target can be corrected to a small fraction of system resolution. The dither pattern and repetition period is chosen to avoid interference with uniformity of beam illumination of the target. Feedback of position error thus provides phase locked position correction in real time and is suitable for mask making since the fiducial marks are not intrusive.

Abstract: Fine positioning of a shaped or patterned charged particle beam without use of intrusive fiducial marks is achieved by providing a dithered shadow pattern, preferably in the form of a grid, within the shaped or patterned charged particle beam. Light output from fiducial marks preferably formed of a scintillating material is reduced when the dithered shadow pattern is incident on some or all of the fiducial marks. The timing of the incidence of the shadow pattern on fiducial marks indicates the position of the shaped or patterned charged particle beam such that correction of the beam position on the target can be corrected to a small fraction of system resolution. The dither pattern and repetition period is chosen to avoid interference with uniformity of beam illumination of the target. Feedback of position error thus provides phase locked position correction in real time and is suitable for mask making since the fiducial marks are not intrusive.

Abstract: First and second coherent beams illuminate a common area on an exposure station. A phase detector senses the relative phase between the first and second beams to provide a control signal. There is at least one phase shifter in the path of at least one of the coherent beams. The control signal is coupled to the phase shifter to adjust the phase imparted thereby so that the relative phase between the first and second coherent beams is substantially constant.

Abstract: A method of monitoring the travel of a beam of energy on a substrate having a fiducial pattern rigidly fixed relative to the substrate, the pattern embracing an area where the beam can create a useful image with submicron precision. The method includes: adjusting the beam such that the dose delivered by the beam is sufficiently high to generate a signal produced by the interaction of the beam and the fiducial pattern, the signal being representative of the relative position of the fiducial pattern and the travel, the dose being sufficiently low so that the area of the substrate over which the beam passes remains receptive to subsequent creation, with submicron precision, of a useful image; moving the beam across the substrate; detecting the signal produced by the interaction of the beam with the fiducial pattern; and comparing the detected signal with a predetermined signal to provide a position signal representative of the beam travel with submicron precision.

Abstract: The mask includes an attenuator which passes a fraction of the incident electromagnetic radiation and phase shifts the radiation relative to the radiation passing through open features of the mask by approximately an odd multiple of .pi. radians. This phase shifting of light passing through the attenuator by .pi. radians reduces the edge blurring that results from diffraction effects. The present invention steepens the slope of the intensity profile at the edges of features in x-ray lithographic replication relative to the slope obtained with a conventional x-ray mask. The steeper slope is a highly significant advantage because it permits improved linewidth control.