Patents by Inventor Mark Louwrens BEKS

Mark Louwrens BEKS has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Lithographic method and apparatus
    Patent number: 10948832
    Abstract: A method of reducing an aberration arising during operation of a lithographic apparatus, the method comprising measuring the aberration to obtain an aberration signal, the aberration signal comprising a first component and a second component, wherein the first component of the aberration signal comprises a first frequency band and the second component of the aberration signal comprises a second frequency band, wherein the first frequency band comprises frequencies that are higher than frequencies comprised in the second frequency band, calculating a correction, wherein a first part of the correction is calculated based on the first component of the aberration signal, and applying the correction to the lithographic apparatus.
    Type: Grant
    Filed: March 6, 2018
    Date of Patent: March 16, 2021
    Assignee: ASML Netherlands B.V.
    Inventors: Nick Kant, Robertus Martinus Alphonsus Van Herpen, Mark Louwrens Beks, Lense Hendrik-Jan Maria Swaenen, Nico Vanroose, James Robert Downes
  • Lithographic Method and Apparatus
    Publication number: 20200117092
    Abstract: A method of reducing an aberration arising during operation of a lithographic apparatus, the method comprising measuring the aberration to obtain an aberration signal, the aberration signal comprising a first component and a second component, wherein the first component of the aberration signal comprises a first frequency band and the second component of the aberration signal comprises a second frequency band, wherein the first frequency band comprises frequencies that are higher than frequencies comprised in the second frequency band, calculating a correction, wherein a first part of the correction is calculated based on the first component of the aberration signal, and applying the correction to the lithographic apparatus.
    Type: Application
    Filed: March 6, 2018
    Publication date: April 16, 2020
    Applicant: ASML Netherlands B.V.
    Inventors: Nick KANT, Robertus VAN HERPEN, Mark Louwrens BEKS, Lense Hendrik-Jan Maria SWAENEN, Nico VANROOSE, James Robert DOWNES