Patents by Inventor Mark Meuwese

Mark Meuwese has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20220042165
    Abstract: A deposition nozzle is provided that includes offset deposition apertures disposed between exhaust apertures on either side of the deposition apertures. The provided nozzle arrangements allow for deposition of material with a deposition profile suitable for use in devices such as OLEDs.
    Type: Application
    Filed: October 26, 2021
    Publication date: February 10, 2022
    Inventors: Edwin van den Tillaart, Sven Pekelder, Mark Meuwese, William E. Quinn, Gregory McGraw, Gregg Kottas
  • Patent number: 11168391
    Abstract: A deposition nozzle is provided that includes offset deposition apertures disposed between exhaust apertures on either side of the deposition apertures. The provided nozzle arrangements allow for deposition of material with a deposition profile suitable for use in devices such as OLEDs.
    Type: Grant
    Filed: March 31, 2017
    Date of Patent: November 9, 2021
    Assignee: Universal Display Corporation
    Inventors: Edwin van den Tillaart, Sven Pekelder, Mark Meuwese, William E. Quinn, Gregory McGraw, Gregg Kottas
  • Publication number: 20210245533
    Abstract: A device for use in organic vapor jet printing (OVJP) and similar arrangements includes a print head moveable in more than one degree of freedom with sufficient thermal insulation that there is little to no movement in the Z direction. One or more sensors may be used to monitor and adjust the distance between the substrate and the print head.
    Type: Application
    Filed: April 28, 2021
    Publication date: August 12, 2021
    Inventors: Peter van Putten, Sven Pekelder, Mark Meuwese, Maurits Willenbroek, Piet van Rens
  • Patent number: 11014386
    Abstract: A device for use in organic vapor jet printing (OVJP) and similar arrangements includes a print head movable in more than one degree of freedom with sufficient thermal insulation that there is little to no movement in the Z direction. One or more sensors may be used to monitor and adjust the distance between the substrate and the print head.
    Type: Grant
    Filed: April 10, 2017
    Date of Patent: May 25, 2021
    Assignee: Universal Display Corporation
    Inventors: Peter van Putten, Sven Pekelder, Mark Meuwese, Maurits Willenbroek, Piet van Rens
  • Publication number: 20170291187
    Abstract: A device for use in OVJP and similar arrangements includes a print head movable in more than one degree of freedom with sufficient thermal insulation that there is little to no movement in the Z direction. One or more sensors may be used to monitor and adjust the distance between the substrate and the print head.
    Type: Application
    Filed: April 10, 2017
    Publication date: October 12, 2017
    Inventors: Peter van Putten, Sven Pekelder, Mark Meuwese, Maurits Willenbroek, Piet van Rens
  • Publication number: 20170294615
    Abstract: A deposition nozzle is provided that includes offset deposition apertures disposed between exhaust apertures on either side of the deposition apertures. The provided nozzle arrangements allow for deposition of material with a deposition profile suitable for use in devices such as OLEDs.
    Type: Application
    Filed: March 31, 2017
    Publication date: October 12, 2017
    Inventors: Edwin van den Tillaart, Sven Pekelder, Mark Meuwese, William E. Quinn, Gregory McGraw, Gregg Kottas
  • Publication number: 20080055359
    Abstract: A print head has a face (6) presenting an array of nozzle orifices (7) and is configured for mounting a number of associated ejection arrangements, each ejecting droplets of printing fluid through the associated nozzle (8) when activated. The print head includes at least parts of a plurality of reservoir arrangements (27,28) for holding printing fluids to be ejected and a channel arrangement (9,14,15) for supplying a printing fluid from a reservoir arrangement (27,28) to an individual nozzle (8). The print head includes at least one adapter structure (11,13) for releasable connection to a cartridge (4; 16) including a container (5;22) for holding a printing fluid. The adapter structure (11,13) is configured to co-operate with the cartridge (4; 16) to provide a passage between the container (5;22) and channel arrangement upon connection.
    Type: Application
    Filed: September 14, 2005
    Publication date: March 6, 2008
    Applicant: KONINKLIJKE PHILIPS ELECTRONICS, N.V.
    Inventors: Mark Meuwese, Maria Van Wely-Dieleman, Paulus Duineveld, Johan Dijksman, Marinus Dona, Hendrik Stapert
  • Publication number: 20070080291
    Abstract: A cluster tool includes multiple tools for microscopic processing of a sample positioned around a rotatable base. A sample holder on the base rotates the sample between the working areas of the tools. A slidable vacuum seal maintains a vacuum in a sample chamber for tools that require a vacuum.
    Type: Application
    Filed: September 28, 2005
    Publication date: April 12, 2007
    Applicant: FEI Company
    Inventors: Bart Buijsse, Mark Meuwese, Bernardus Marie Bormans, Hendrik Slingerland
  • Publication number: 20060284108
    Abstract: The invention relates to an apparatus for evacuating samples. A sample 4 is hereby placed in a cavity 3 of a sheet 1 with a smooth surface 2. A sole plate 5 Is placed upon this smooth surface 2, whereby the smooth surface 2 and the sole plate 5 placed thereupon together form a vacuum seal. The sole plate 5, upon which a vacuum column 6 is mounted, can be slid across the smooth surface 2. By sliding the sole plate 5 over the cavity 4, the cavity 4 is evacuated in several steps. In an embodiment of the invention, the vacuum column 6 takes the form of an ESEM (Environmental Scanning Electron Microscope). In this way, it is possible to inspect the evacuated sample 4 with the ESEM.
    Type: Application
    Filed: June 28, 2005
    Publication date: December 21, 2006
    Applicant: FEI Company
    Inventors: Bart Buijsse, Mark Meuwese, Maria Van Wely-Dieleman, Sjoerd Mentink, Theodorus Bisschops
  • Publication number: 20060197030
    Abstract: The invention describes a particle-optical apparatus arranged to focus a beam (1) of electrically charged particles with the aid of two particle-optical lens systems (10, 20). The lens action is achieved by magnetic fields, which fields are generated by permanent-magnetic materials (13, 23). In contrast to magnetic lenses equipped with a coil, it is not easy in the case of lenses equipped with permanent-magnetic material to alter the focusing magnetic field with the aim of altering the optical power. In an apparatus according to the invention, the optical power of the lens systems is altered by altering the energy with which the beam (1) traverses the lens systems (10, 20). This can easily happen by altering the voltage of electrical power supplies (14, 24).
    Type: Application
    Filed: May 3, 2006
    Publication date: September 7, 2006
    Applicant: FEI Company
    Inventors: Bart Buijsse, Theodorus Bisschops, Mark Meuwese
  • Publication number: 20050236568
    Abstract: The invention describes a particle-optical apparatus arranged to focus a beam (1) of electrically charged particles with the aid of two particle-optical lens systems (10, 20). The lens action is achieved by magnetic fields, which fields are generated by permanent-magnetic materials (13, 23). In contrast to magnetic lenses equipped with a coil, it is not easy in the case of lenses equipped with permanent-magnetic material to alter the focusing magnetic field with the aim of altering the optical power. In an apparatus according to the invention, the optical power of the lens systems is altered by altering the energy with which the beam (1) traverses the lens systems (10, 20). This can easily happen by altering the voltage of electrical power supplies (14, 24).
    Type: Application
    Filed: April 21, 2005
    Publication date: October 27, 2005
    Applicant: FEI Company
    Inventors: Bart Buijsse, Theodorus Bisschops, Mark Meuwese