Abstract: Provided is a multifunctional group metal corrosion inhibitor, as shown in one or more of formula (I-a) to formula (I-c). The metal corrosion inhibitor disclosure is a multifunctional group metal corrosion inhibitor comprising Schiff base or a derivative structure thereof, a catechol group and a mercapto group. A plurality of active functional groups are introduced, so that the active adsorption site of the inhibitor can be increased, and the synergetic effect of the three functional groups can enhance the adsorption effect of the inhibitor and a metal, And thus, the inhibitor is suitable for applicable for adsorptions of plurality of metals. Therefore, the inhibitor can exert a high anti-corrosion efficiency under the condition of a low addition amount, and provides a protection effect for the plurality of the metals.

Abstract: A fluorine-free cleaning agent is a water-based cleaning agent. The fluorine-free cleaning agent comprises of water, organic solvent and amine compound, wherein the mass of the organic solvent is 15-85% of the mass of the fluorine-free cleaning agent; and the mass of the amine compound is 5-50% of the mass of the fluorine-free cleaning agent. The fluorine-free cleaning agent further comprises of one or more of corrosion inhibitor, acid compound and alcohol compound. By means of a synergistic effect of the specific amine compound and one or more of corrosion inhibitor, acid and alcohol, the fluorine-free cleaning agent provided in the present disclosure showed good cleaning capability even without fluoride by comparing with the prior art.

Abstract: An anti-reflective coating composition comprises an organic polymer. The organic polymer comprises a crosslinkable polymer. The crosslinkable polymer comprises a monomer unit formed by a monomer represented by formula (I): wherein R1 is selected from substituted or unsubstituted C2-C10 alkenyl, and R2 and R3 are each independently selected from H, substituted or unsubstituted C1-C6 alkyl, and substituted or unsubstituted C6-C20 aryl. Compared with the prior art, the subject crosslinkable polymer comprises the monomer unit that can be self-crosslinked with functional groups such as hydroxyl, amino, and sulfhydryl, such that a crosslinking agent does not need to be added to a coating. The generation of gas during baking process of the composition can be effectively reduced or eliminated, and some unnecessary cleaning process is avoided by doing so. The pattern damage due to solid particle caused by gas condensation can also be avoided.

Abstract: The present invention relates to a method for treating a block copolymer solution, wherein the method comprises: providing a solution comprising a block copolymer in a non aqueous solvent; and, treating the solution to remove metals using an ion exchange resin. The invention also relates to a method of forming patterns using the treated block copolymer.

Abstract: The present invention relates to a novel polymeric composition comprising a novel polymer having two or more repeat units and a terminus having the structure (1): wherein R1 represents a C1-C20 substituted or unsubstituted alkyl group, w is a number from 1-8, X is oxygen (O) or nitrogen (N), and Rd is a reactive group. The invention also relates to a process for forming a pattern using the novel polymeric composition. The invention further relates to a process of making the novel polymer.

Abstract: The present invention relates to a method for treating a block copolymer solution, wherein the method comprises: providing a solution comprising a block copolymer in a non aqueous solvent; and, treating the solution to remove metals using an ion exchange resin. The invention also relates to a method of forming patterns using the treated block copolymer.

Abstract: The present invention relates to a method for treating a block copolymer solution, wherein the method comprises: providing a solution comprising a block copolymer in a non aqueous solvent; and, treating the solution to remove metals using an ion exchange resin. The invention also relates to a method of forming patterns using the treated block copolymer.

Abstract: The present invention relates to a novel polymeric composition comprising a novel polymer having two or more repeat units and a terminus having the structure (1): wherein R1 represents a C1-C20 substituted or unsubstituted alkyl group, w is a number from 1-8, X is oxygen (O) or nitrogen (N), and Rd is a reactive group. The invention also relates to a process for forming a pattern using the novel polymeric composition. The invention further relates to a process of making the novel polymer.

Abstract: The present invention relates to an underlayer composition comprising a polymer, an organic titanate compound and optionally a thermal acid generator, where the polymer comprises at least one fluoroalcohol group and at least one epoxy group. The invention also relates to a process for using this underlayer material as an antireflective coating composition and/or a hard mask for pattern transfer.

Abstract: The present invention relates to a method for treating a block copolymer solution, wherein the method comprises: providing a solution comprising a block copolymer in a non aqueous solvent; and, treating the solution to remove metals using an ion exchange resin. The invention also relates to a method of forming patterns using the treated block copolymer.

Abstract: The invention relates to an underlayer coating composition comprising a polymer, where the polymer comprises at least one hydroxyaromatic unit in the backbone of the polymer phenol which has a pendant group comprising a fluoro or iodo moiety, and at least one unit comprising an aminoplast. The invention further relates to a process for forming an image using the composition, especially for EUV.

Abstract: The invention related to an antireflective coating comprising a mixture of a first polymer and a second polymer, and a thermal acid generator, where the first polymer comprises at least one fluoroalcohol moiety, at least one aliphatic hydroxyl moiety, and at least one acid moiety other than fluoroalcohol with a pKa in the range of about 8 to about 11; where the second polymer is a reaction product of an aminoplast compound with a compound comprising at least one hydroxyl and/or at least one acid group. The invention further relates to a process for using the novel composition to form an image.

Abstract: The present invention relates to an underlayer composition comprising a polymer, an organic titanate compound and optionally a thermal acid generator, where the polymer comprises at least one fluoroalcohol group and at least one epoxy group. The invention also relates to a process for using this underlayer material as an antireflective coating composition and/or a hard mask for pattern transfer.

Abstract: The present invention relates to an antireflective coating composition comprising a novel polymer without an aromatic chromophore, where the polymer comprises a structural unit derived from an aminoplast and a structural unit derived from a diol, triol, dithiol, trithiol, other polyols, diacid, triacid, other polyacids, diimide or mixture thereof, where the diol, dithiol, triol, trithiol, diacid, triacid, diimide, diamide or imide-amide optionally contain one or more nitrogen and/or sulfur atoms or contain one or more alkene groups. The invention also relates to the novel polymer and a process for using the novel antireflective coating composition in a lithographic process.

Abstract: The invention relates to an underlayer coating composition comprising a polymer, where the polymer comprises at least one hydroxyaromatic unit in the backbone of the polymer phenol which has a pendant group comprising a fluoro or iodo moiety, and at least one unit comprising an aminoplast. The invention further relates to a process for forming an image using the composition, especially for EUV.

Abstract: The present invention discloses novel bottom anti-reflective coating compositions where a coating from the composition has an etch rate that can be regulated by the etch plate temperature.

Abstract: The invention related to an antireflective coating comprising a mixture of a first polymer and a second polymer, and a thermal acid generator, where the first polymer comprises at least one fluoroalcohol moiety, at least one aliphatic hydroxyl moiety, and at least one acid moiety other than fluoroalcohol with a pKa in the range of about 8 to about 11; where the second polymer is a reaction product of an aminoplast compound with a compound comprising at least one hydroxyl and/or at least one acid group. The invention further relates to a process for using the novel composition to form an image.

Abstract: Antireflective coating compositions are discussed.

Abstract: The present invention relates to a composition comprising: (a) a polymer having at least one repeating unit of formula where R1 is a non-hydrolysable group and n is an integer ranging from 1 to 3; and (b) a crosslinking catalyst. The composition is useful in forming low k dielectric constant materials and as well as hard mask and underlayer materials with anti-reflective properties for the photolithography industry.

Abstract: The present invention relates to an organic spin on hard mask antireflective coating composition comprising a polymer comprising at least one unit of fused aromatic rings in the backbone of the polymer and at least one unit with a cycloaliphatic moiety in the backbone of the polymer. The invention further relates to a process for making the polymer and a process for imaging the present composition.