Patents by Inventor Mark O'Loughlin

Mark O'Loughlin has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Overlay control for laser peening
    Patent number: 6841755
    Abstract: A method of controlling the application of laser peening overlays on the surface of a workpiece to reduce the variability of shock waves generated therein, comprises applying an energy-absorbing overlay to a portion of the surface of a workpiece, measuring the thickness of the energy-absorbing overlay in at least one location on the energy-absorbing overlay, applying a transparent overlay material over the energy-absorbing overlay, measuring the thickness of the transparent overlay in at least one location on the transparent overlay, determining if the measured values for each overlay is within a specified range, and directing a pulse of coherent energy to the workpiece to create a shock wave therein when the measured values are within the specified range.
    Type: Grant
    Filed: February 21, 2003
    Date of Patent: January 11, 2005
    Assignee: LSP Technologies Inc.
    Inventors: Steven E. Dykes, Allan H. Clauer, Jeff L. Dulaney, David F. Lahrman, Mark O'Loughlin
  • Overlay control for laser peening
    Publication number: 20030213788
    Abstract: A method of controlling the application of laser peening overlays on the surface of a workpiece to reduce the variability of shock waves generated therein, comprises applying an energy-absorbing overlay to a portion of the surface of a workpiece, measuring the thickness of the energy-absorbing overlay in at least one location on the energy-absorbing overlay, applying a transparent overlay material over the energy-absorbing overlay, measuring the thickness of the transparent overlay in at least one location on the transparent overlay, determining if the measured values for each overlay is within a specified range, and directing a pulse of coherent energy to the workpiece to create a shock wave therein when the measured values are within the specified range.
    Type: Application
    Filed: February 21, 2003
    Publication date: November 20, 2003
    Applicant: LSP Technologies, Inc.
    Inventors: Steven E. Dykes, Allan H. Clauer, Jeff L. Dulaney, David F. Lahrman, Mark O'Loughlin
  • Quality control plasma monitor for laser shock processing
    Patent number: 6554921
    Abstract: A method and apparatus for quality control of laser shock processing. The method includes measuring emissions and characteristics of a workpiece when subjected to a pulse of coherent energy from a laser. These empirically measured emissions and characteristics of the workpiece are correlated to theoretical shock pressure, residual stress profile, or fatigue life of the workpiece. The apparatus may include a radiometer or acoustic detection device for measuring these characteristics.
    Type: Grant
    Filed: June 29, 2001
    Date of Patent: April 29, 2003
    Assignee: LSP Technologies, Inc.
    Inventors: David W. Sokol, Craig T. Walters, Harold M. Epstein, Allan H. Clauer, Jeffrey L. Dulaney, Mark O'Loughlin
  • Overlay control for laser peening
    Patent number: 6548782
    Abstract: A method of controlling the application of laser peening overlays on the surface of a workpiece to reduce the variability of shock waves generated therein, comprises applying an energy-absorbing overlay to a portion of the surface of a workpiece, measuring the thickness of the energy-absorbing overlay in at least one location on the energy-absorbing overlay, applying a transparent overlay material over the energy-absorbing overlay, measuring the thickness of the transparent overlay in at least one location on the transparent overlay, determining if the measured values for each overlay is within a specified range, and directing a pulse of coherent energy to the workpiece to create a shock wave therein when the measured values are within the specified range.
    Type: Grant
    Filed: January 23, 2001
    Date of Patent: April 15, 2003
    Assignee: LSP Technologies, Inc.
    Inventors: Steven E. Dykes, Allan H. Clauer, Jeff L. Dulaney, David F. Lahrman, Mark O'Loughlin
  • OVERLAY CONTROL FOR LASER PEENING
    Publication number: 20030038123
    Abstract: A method of controlling the application of laser peening overlays on the surface of a workpiece to reduce the variability of shock waves generated therein, comprises applying an energy-absorbing overlay to a portion of the surface of a workpiece, measuring the thickness of the energy-absorbing overlay in at least one location on the energy-absorbing overlay, applying a transparent overlay material over the energy-absorbing overlay, measuring the thickness of the transparent overlay in at least one location on the transparent overlay, determining if the measured values for each overlay is within a specified range, and directing a pulse of coherent energy to the workpiece to create a shock wave therein when the measured values are within the specified range.
    Type: Application
    Filed: January 23, 2001
    Publication date: February 27, 2003
    Applicant: LSP TECHNOLOGIES INC
    Inventors: Steven E. Dykes, Allan H. Clauer, Jeff L. Dulaney, David F. Lahrman, Mark O'Loughlin
  • Quality control plasma monitor for laser shock processing
    Publication number: 20010045416
    Abstract: A method and apparatus for quality control of laser shock processing. The method includes measuring emissions and characteristics of a workpiece when subjected to a pulse of coherent energy from a laser. These empirically measured emissions and characteristics of the workpiece are correlated to theoretical shock pressure, residual stress profile, or fatigue life of the workpiece. The apparatus may include a radiometer or acoustic detection device for measuring these characteristics.
    Type: Application
    Filed: June 29, 2001
    Publication date: November 29, 2001
    Applicant: LSP TECHNOLOGIES, INC.
    Inventors: David W. Sokol, Craig T. Walters, Harold M. Epstein, Allan H. Clauer, Jeffrey L. Dulaney, Mark O'Loughlin
  • Quality control plasma monitor for laser shock processing
    Patent number: 6254703
    Abstract: A method and apparatus for quality control of laser shock processing. The method includes measuring emissions and characteristics of a workpiece when subjected to a pulse of coherent energy from a laser. These empirically measured emissions and characteristics of the workpiece are correlated to theoretical shock pressure, residual stress profile, or fatigue life of the workpiece. The apparatus may include a radiometer or acoustic detection device for measuring these characteristics.
    Type: Grant
    Filed: February 19, 1999
    Date of Patent: July 3, 2001
    Assignee: LSP Technologies, Inc.
    Inventors: David W. Sokol, Craig T. Walters, Harold M. Epstein, Allan H. Clauer, Jeffrey L. Dulaney, Mark O'Loughlin