Patents by Inventor Mark Petar Stoykovich

Mark Petar Stoykovich has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 9539788
    Abstract: Methods of fabricating complex three-dimensional structures on patterned substrates and related compositions are provided. The methods involve depositing on the substrate a block copolymer material that is “mismatched” to the substrate pattern, and then ordering the material to form a complex three-dimensional structure. According to various embodiments, the copolymer material mismatches the substrate pattern in that the symmetry and/or length scale of its bulk morphology differs from that of the pattern. When ordered, a balance between the physics that determines the bulk block copolymer morphology and the physics that determines the substrate surface interfacial interactions results in a thermodynamically stable complex three-dimensional film that varies in a direction perpendicular to the substrate and has a morphology that differs from its bulk morphology.
    Type: Grant
    Filed: November 27, 2013
    Date of Patent: January 10, 2017
    Assignee: Wisconsin Alumni Research Foundation
    Inventors: Paul Franklin Nealey, Mark Petar Stoykovich, Konstantinos C. Daoulas, Marcus Muller, Juan J. De Pablo, SangMin Park
  • Publication number: 20140087142
    Abstract: Methods of fabricating complex three-dimensional structures on patterned substrates and related compositions are provided. The methods involve depositing on the substrate a block copolymer material that is “mismatched” to the substrate pattern, and then ordering the material to form a complex three-dimensional structure. According to various embodiments, the copolymer material mismatches the substrate pattern in that the symmetry and/or length scale of its bulk morphology differs from that of the pattern. When ordered, a balance between the physics that determines the bulk block copolymer morphology and the physics that determines the substrate surface interfacial interactions results in a thermodynamically stable complex three-dimensional film that varies in a direction perpendicular to the substrate and has a morphology that differs from its bulk morphology.
    Type: Application
    Filed: November 27, 2013
    Publication date: March 27, 2014
    Applicant: Wisconsin Alumni Research Foundation
    Inventors: Paul Franklin Nealey, Mark Petar Stoykovich, Konstantinos C. Daoulas, Marcus Muller, Juan J. De Pablo, SangMin Park
  • Patent number: 8623493
    Abstract: Methods of fabricating complex three-dimensional structures on patterned substrates and related compositions are provided. The methods involve depositing on the substrate a block copolymer material that is “mismatched” to the substrate pattern, and then ordering the material to form a complex three-dimensional structure. According to various embodiments, the copolymer material mismatches the substrate pattern in that the symmetry and/or length scale of its bulk morphology differs from that of the pattern. When ordered, a balance between the physics that determines the bulk block copolymer morphology and the physics that determines the substrate surface interfacial interactions results in a thermodynamically stable complex three-dimensional film that varies in a direction perpendicular to the substrate and has a morphology that differs from its bulk morphology.
    Type: Grant
    Filed: March 30, 2012
    Date of Patent: January 7, 2014
    Assignee: Wisconsin Alumni Research Foundation
    Inventors: Paul Franklin Nealey, Mark Petar Stoykovich, Konstantinos C. Daoulas, Marcus Muller, Juan J. De Pablo, SangMin Park
  • Publication number: 20120189824
    Abstract: Methods of fabricating complex three-dimensional structures on patterned substrates and related compositions are provided. The methods involve depositing on the substrate a block copolymer material that is “mismatched” to the substrate pattern, and then ordering the material to form a complex three-dimensional structure. According to various embodiments, the copolymer material mismatches the substrate pattern in that the symmetry and/or length scale of its bulk morphology differs from that of the pattern. When ordered, a balance between the physics that determines the bulk block copolymer morphology and the physics that determines the substrate surface interfacial interactions results in a thermodynamically stable complex three-dimensional film that varies in a direction perpendicular to the substrate and has a morphology that differs from its bulk morphology.
    Type: Application
    Filed: March 30, 2012
    Publication date: July 26, 2012
    Applicant: WISCONSIN ALUMNI RESEARCH FOUNDATION
    Inventors: Paul Franklin NEALEY, Mark Petar STOYKOVICH, Konstantinos C. DAOULAS, Marcus MULLER, Juan J. DE PABLO, SangMin PARK
  • Patent number: 8168284
    Abstract: Methods of fabricating complex three-dimensional structures on patterned substrates and related compositions are provided. The methods involve depositing on the substrate a block copolymer material that is “mismatched” to the substrate pattern, and then ordering the material to form a complex three-dimensional structure. According to various embodiments, the copolymer material mismatches the substrate pattern in that the symmetry and/or length scale of its bulk morphology differs from that of the pattern. When ordered, a balance between the physics that determines the bulk block copolymer morphology and the physics that determines the substrate surface interfacial interactions results in a thermodynamically stable complex three-dimensional film that varies in a direction perpendicular to the substrate and has a morphology that differs from its bulk morphology.
    Type: Grant
    Filed: October 5, 2006
    Date of Patent: May 1, 2012
    Assignee: Wisconsin Alumni Research Foundation
    Inventors: Paul Franklin Nealey, Mark Petar Stoykovich, Konstantinos C. Daoulas, Marcus Muller, Juan J. de Pablo, SangMin Park
  • Publication number: 20090087653
    Abstract: Methods of fabricating complex three-dimensional structures on patterned substrates and related compositions are provided. The methods involve depositing on the substrate a block copolymer material that is “mismatched” to the substrate pattern, and then ordering the material to form a complex three-dimensional structure. According to various embodiments, the copolymer material mismatches the substrate pattern in that the symmetry and/or length scale of its bulk morphology differs from that of the pattern. When ordered, a balance between the physics that determines the bulk block copolymer morphology and the physics that determines the substrate surface interfacial interactions results in a thermodynamically stable complex three-dimensional film that varies in a direction perpendicular to the substrate and has a morphology that differs from its bulk morphology.
    Type: Application
    Filed: October 5, 2006
    Publication date: April 2, 2009
    Inventors: Paul Franklin Nealey, Mark Petar Stoykovich, Konstantinos C. Daoulas, Marcus Muller, Juan J. de Pablo, SangMin Park