Patents by Inventor Mark Potyen

Mark Potyen has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • SELECTIVE DEPOSITION OF SILICON AND OXYGEN CONTAINING DIELECTRIC FILM ON DIELECTRICS
    Publication number: 20230416911
    Abstract: A thermal atomic layer deposition method for selectively deposition of silicon and oxygen containing dielectric film selected from silicon oxide or carbon doped silicon oxide abundantly on a dielectric surface but not less on a metal surface employing a silicon precursor having at least three isocyanato ligands.
    Type: Application
    Filed: November 15, 2021
    Publication date: December 28, 2023
    Inventors: RAVINDRA KANJOLIA, GUO LIU, MARK POTYEN, JACOB WOODRUFF, BHUSHAN ZOPE, XINJIAN LEI
  • STABILIZED DEUTEROBORANE-TETRAHYDROFURAN COMPLEX
    Publication number: 20070197695
    Abstract: A stabilized deuteroborane-tetrahydrofuran complex is disclosed. Also disclosed are processes for the preparation of the deuteroborane-tetrahydrofuran complex and methods of storing and transporting the prepared complex. The deuteroborane-tetrahydrofuran complexes exhibit enhanced shelf life and increased self-accelerated decomposition temperatures.
    Type: Application
    Filed: February 8, 2007
    Publication date: August 23, 2007
    Applicant: SIGMA-ALDRICH CO.
    Inventors: Mark Potyen, Kanth Josyula, Peng Gao, Christopher Hewitt, Robert Todd