Patents by Inventor Mark R. Denome

Mark R. Denome has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20240310819
    Abstract: A first selection of a first fabrication process and/or first manufacturing equipment to perform manufacturing operations of the first fabrication process is received. The first selection is input into a digital replica of the first manufacturing equipment, where the digital replica outputs physical conditions of the first fabrication process. Environmental resource usage data indicative of a first environmental resource consumption of the first fabrication process run on the first manufacturing equipment based on the physical conditions of the first fabrication process is determined. A modification to the first fabrication process that reduces the environmental resource consumption of the first fabrication process run on the first manufacturing equipment is determined. Applying the modification to the first fabrication and/or providing the modification for display by a graphical user interface (GUI) is performed.
    Type: Application
    Filed: May 30, 2024
    Publication date: September 19, 2024
    Inventors: Ala Moradian, Elizabeth Neville, Umesh Madhav Kelkar, Mark R. Denome, Prashanth Kothnur, Karthik Ramanathan, Kartik Shah, Orlando Trejo, Sergey Meirovich
  • Patent number: 12001197
    Abstract: A method including receiving, by a processing device, a first selection of at least one of a first fabrication process or first manufacturing equipment to perform manufacturing operations of the first fabrication process. The method can further include inputting the first selection into a digital replica of the first manufacturing equipment wherein the digital replica outputs physical conditions of the first fabrication process. The method may further include determining environmental resource usage data indicative of a first environmental resource consumption of the first fabrication process run on the first manufacturing equipment based on the physical conditions of the first fabrication process. The processing device may further determine a modification to the first fabrication process that reduces the environmental resource consumption of the first fabrication process run on the first manufacturing equipment.
    Type: Grant
    Filed: April 14, 2021
    Date of Patent: June 4, 2024
    Assignee: Applied Materials, Inc.
    Inventors: Ala Moradian, Elizabeth Neville, Umesh Madhav Kelkar, Mark R. Denome, Prashanth Kothnur, Karthik Ramanathan, Kartik Shah, Orlando Trejo, Sergey Meirovich
  • Publication number: 20220334569
    Abstract: A method including receiving, by a processing device, a first selection of at least one of a first fabrication process or first manufacturing equipment to perform manufacturing operations of the first fabrication process. The method can further include inputting the first selection into a digital replica of the first manufacturing equipment wherein the digital replica outputs physical conditions of the first fabrication process. The method may further include determining environmental resource usage data indicative of a first environmental resource consumption of the first fabrication process run on the first manufacturing equipment based on the physical conditions of the first fabrication process. The processing device may further determine a modification to the first fabrication process that reduces the environmental resource consumption of the first fabrication process run on the first manufacturing equipment.
    Type: Application
    Filed: April 14, 2021
    Publication date: October 20, 2022
    Inventors: Ala Moradian, Elizabeth Neville, Umesh Madhav Kelkar, Mark R. Denome, Prashanth Kothnur, Karthik Ramanathan, Kartik Shah, Orlando Trejo, Sergey Meirovich
  • Patent number: 7005046
    Abstract: A system is provided in which a smaller flow of deposition solution is diverted from a larger flow of deposition solution flowing on an electrochemical deposition tool platform. The smaller flow is diverted to a dosing unit which may be on a separate platform. The dosing unit in one embodiment comprises a pressurized flow line.
    Type: Grant
    Filed: August 13, 2002
    Date of Patent: February 28, 2006
    Assignee: Applied Materials Inc.
    Inventors: Joseph J. Stevens, Yevgeniy Rabinovich, Sandy S. Chao, Mark R. Denome, Allen L. D'Ambra, Donald J. Olgado
  • Publication number: 20030000841
    Abstract: A system is provided in which a smaller flow of deposition solution is diverted from a larger flow of deposition solution flowing on an electrochemical deposition tool platform. The smaller flow is diverted to a dosing unit which may be on a separate platform. The dosing unit in one embodiment comprises a pressurized flow line.
    Type: Application
    Filed: August 13, 2002
    Publication date: January 2, 2003
    Applicant: Applied Materials, Inc.
    Inventors: Joseph J. Stevens, Yevgeniy Rabinovich, Sandy S. Chao, Mark R. Denome, Allen L. D'Ambra, Donald J. Olgado
  • Patent number: 6454927
    Abstract: A system is provided in which a smaller flow of deposition solution is diverted from a larger flow of deposition solution flowing on an electro-chemical deposition tool platform. The smaller flow is diverted to a dosing unit which may be on a separate platform. The dosing unit in one embodiment comprises a pressurized flow line.
    Type: Grant
    Filed: June 26, 2000
    Date of Patent: September 24, 2002
    Assignee: Applied Materials, Inc.
    Inventors: Joseph J. Stevens, Yevgeniy Rabinovich, Sandy S. Chao, Mark R. Denome, Allen L. D'Ambra, Donald J. Olgado