Patents by Inventor Mark R. Lemay

Mark R. Lemay has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20240152245
    Abstract: A computer system displays a first object that includes at least a first portion of the first object and a second portion of the first object and detects a first gaze input that meets first criteria, wherein the first criteria require that the first gaze input is directed to the first portion of the first object in order for the first criteria to be met. In response, the computer system displays a first control element that corresponds to a first operation associated with the first object, wherein the first control element was not displayed prior to detecting that the first gaze input met the first criteria, and detects a first user input directed to the first control element. In response to detecting the first user input directed to the first control element, the computer system performs the first operation with respect to the first object.
    Type: Application
    Filed: September 21, 2023
    Publication date: May 9, 2024
    Inventors: Lee S. Broughton, Israel Pastrana Vicente, Matan Stauber, Miquel Estany Rodriguez, James J. Owen, Jonathan R. Dascola, Stephen O. Lemay, Christian Schnorr, Zoey C. Taylor, Jay Moon, Benjamin H. Boesel, Benjamin Hylak, Richard D. Lyons, Willliam A. Sorrentino, III, Lynn I. Streja, Jonathan Ravasz, Nathan Gitter, Peter D. Anton, Michael J. Rockwell, Peter L. Hajas, Evgenii Krivoruchko, Mark A. Ebbole, James Magahern, Andrew J. Sawyer, Christopher D. McKenzie, Michael E. Buerli, Olivier D. R. Gutknecht
  • Patent number: 9711591
    Abstract: Methods of forming hetero-layers with reduced surface roughness and bulk defect density on non-native surfaces and the devices formed thereby are described. In one embodiment, the method includes providing a substrate having a top surface with a lattice constant and depositing a first layer on the top surface of the substrate. The first layer has a top surface with a lattice constant that is different from the first lattice constant of the top surface of the substrate. The first layer is annealed and polished to form a polished surface. A second layer is then deposited above the polished surface.
    Type: Grant
    Filed: December 28, 2011
    Date of Patent: July 18, 2017
    Assignee: Intel Corporation
    Inventors: Niloy Mukherjee, Matthew V. Metz, James M. Powers, Van H. Le, Benjamin Chu-Kung, Mark R. Lemay, Marko Radosavljevic, Niti Goel, Loren Chow, Peter G. Tolchinsky, Jack T. Kavalieros, Robert S. Chau
  • Publication number: 20140203326
    Abstract: Methods of forming hetero-layers with reduced surface roughness and bulk defect density on non-native surfaces and the devices formed thereby are described. In one embodiment, the method includes providing a substrate having a top surface with a lattice constant and depositing a first layer on the top surface of the substrate. The first layer has a top surface with a lattice constant that is different from the first lattice constant of the top surface of the substrate. The first layer is annealed and polished to form a polished surface. A second layer is then deposited above the polished surface.
    Type: Application
    Filed: December 28, 2011
    Publication date: July 24, 2014
    Inventors: Niloy Mukherjee, Matthew V. Metz, james m. Powers, Van H. Le, Benjamin Chu-Kung, Mark R. Lemay, Marko Radosavljevic, Niti Goel