Patents by Inventor MARK R. MAZUR

MARK R. MAZUR has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 9097974
    Abstract: A relief printing form is prepared from a photosensitive element. An in-situ mask is formed and disposed above a photopolymerizable layer of the photosensitive element, the element is exposed to actinic radiation through the in-situ mask in an environment having an inert gas and a concentration of oxygen between about 30,000 ppm and about 7500 ppm to form at least a polymerized portion and an unpolymerized portion of the layer, and the exposed element is processed by treating with at least one washout solution selected from solvent solution, aqueous solution, semi-aqueous solution, or water.
    Type: Grant
    Filed: February 20, 2013
    Date of Patent: August 4, 2015
    Assignee: E I DU PONT DE NEMOURS AND COMPANY
    Inventors: Edmund Francis Schieffer, Jr., Mark R. Mazur
  • Publication number: 20140057208
    Abstract: The invention provides a method for preparing a relief printing form from a photosensitive element. The method includes forming an in-situ mask disposed above a photopolymerizable layer of the photosensitive element, exposing the element to actinic radiation through the in-situ mask in an environment having an inert gas and a concentration of oxygen between about 30,000 ppm and about 7500 ppm to form at least a polymerized portion and an unpolymerized portion of the layer, and treating by processing the exposed element with at least one washout solution selected from solvent solution, aqueous solution, semi-aqueous solution, or water.
    Type: Application
    Filed: February 20, 2013
    Publication date: February 27, 2014
    Applicant: EI DU PONT DE NEMOURS AND COMPANY
    Inventors: EDMUND FRANCIS SCHIEFFER, JR., MARK R. MAZUR