Patents by Inventor Mark R. McKeever

Mark R. McKeever has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Cationically polymerizable photoimageable thick film compositions, electrodes, and methods of forming thereof
    Patent number: 7214466
    Abstract: The invention is directed to a photoimageable composition comprising: (I) finely divided particles of inorganic material comprising: (a) functional phase particles selected from electrically conductive, resistive, and dielectric particles; (b) inorganic binder having a glass transition temperature in the range of from 325 to 600° C., a surface area of no greater than 10 m2/g and at least 85 wt. % of the particles having a size of 0.1–10 ?m; dispersed in: (II) an organic medium comprising: (a) aqueous developable polymer which is a copolymer, interpolymer or mixture thereof, wherein each copolymer or interpolymer comprises (1) a nonacidic comonomer comprising a C1-10 alkyl acrylate, C1-10 alkyl methacrylate, styrenes, substituted styrenes or combinations thereof and (2) an acidic comonomer comprising ethylenically unsaturated carboxylic acid containing moiety; (g) cationically polymerizable monomer; (h) photoinitiation system; and (i) organic solvent.
    Type: Grant
    Filed: December 14, 2005
    Date of Patent: May 8, 2007
    Assignee: E. I. du Pont de Nemours and Company
    Inventors: Haixin Yang, Mark R. McKeever
  • Process for the continuous liquid processing of photosensitive compositions having reduced levels of residues
    Patent number: 6180319
    Abstract: Minimization of developed photosensitive compositions is realized through use of a photoinitiator of hexaarylbiimidazole compound having at least one hydrophilic group.
    Type: Grant
    Filed: March 11, 1998
    Date of Patent: January 30, 2001
    Assignee: E. I. du Pont de Nemours and Company
    Inventor: Mark R. McKeever
  • Aqueous processable, multilayer, photoimageable permanent coatings for printed circuits
    Patent number: 5405731
    Abstract: The use of a two layer photoimageable, aqueous processable, resist with a hydrophic binder in the outermost layer provides a permanent coating highly resistant to printed circuit processing chemicals. This resistance results in levels of adsorbed or absorbed ionic contamination less than 14 micrograms per square inch.
    Type: Grant
    Filed: December 22, 1992
    Date of Patent: April 11, 1995
    Assignee: E. I. Du Pont de Nemours and Company
    Inventors: Karuppiah Chandrasekaran, Mark R. McKeever, James W. O'Neil
  • Aqueous processable, multilayer, photoimageable permanent coatings for printed circuits
    Patent number: 5288589
    Abstract: The use of a two layer photoimageable, aqueous processable, resist with an amphoteric binder in the layer laminated directly to a printed circuit board provides a permanent coating with improved adhesion throughout the lamination process while maintaining other desirable properties such as storage stability and circuit encapsulation.
    Type: Grant
    Filed: December 3, 1992
    Date of Patent: February 22, 1994
    Inventors: Mark R. McKeever, Karuppiah Chandrasekaran
  • Photosensitive compositions and elements containing substituted hydroxylamine
    Patent number: 4298678
    Abstract: A photosensitive composition comprising a photooxidant, leuco dye and a substituted hydroxylamine compound of the formula R.sub.1 R.sub.2 NOH wherein R.sub.1 and R.sub.2, e.g., are alkyl, cyclic alkyl, aryl, aralkyl, alkaryl and R.sub.1 and R.sub.2 taken together form a heterocyclic ring of 5 to 7 carbon atoms. Optionally monomers and polymeric binders can be present. The compositions are useful for photoimaging and in solvent and aqueous developable resist-forming films.
    Type: Grant
    Filed: August 14, 1980
    Date of Patent: November 3, 1981
    Assignee: E. I. Du Pont de Nemours and Company
    Inventor: Mark R. McKeever