Patents by Inventor Mark Ray McClanahan

Mark Ray McClanahan has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 6402906
    Abstract: A method and system for producing thin film alloy by a sputtering deposition process comprising using a crescent-shaped aperture interposed between the target and substrate of a sputtering deposition system.
    Type: Grant
    Filed: October 19, 2000
    Date of Patent: June 11, 2002
    Assignee: Delphi Technologies, Inc.
    Inventors: Robert O. Pichulo, Gregory Keller Rasmussen, Mark Ray McClanahan
  • Patent number: 6368451
    Abstract: High voltage feedthrough connectors provide a means for isolating high voltage through a reactor housing while providing thermal expansion tolerance along with ease of assembly. The connectors provide an insulating body having a bore extending axially through said insulating body for housing a center conductor, a threaded shell assembly for engaging the insulating body and securing the insulating body to a NTP reactor housing, and a gas tight seal to prevent gas leaks to the center conductor. The center conductor includes a first end for contacting a high voltage source and a second end for contacting a high voltage electrode of a NTP reactor. In one embodiment, a fixed center conductor is provided. Preferably, a dome shaped tip may be provided on the bottom terminal connector for improved contact with the non-thermal plasma reactor high voltage electrode. Optionally, a compression spring is attached to the bottom terminal connector end of the fixed center conductor.
    Type: Grant
    Filed: February 9, 2000
    Date of Patent: April 9, 2002
    Assignee: Delphi Technologies, Inc.
    Inventors: David Alexander Goulette, Mark Ray McClanahan, David Emil Nelson
  • Patent number: 6303008
    Abstract: A method and system for producing thin film alloy by a sputtering deposition process comprising using a circle-shaped aperture interposed between the target and substrate of a sputtering deposition system and establishing a rotating/oscillating relationship between the substrate and the aperture.
    Type: Grant
    Filed: September 21, 2000
    Date of Patent: October 16, 2001
    Assignee: Delphi Technologies, Inc.
    Inventors: Robert O. Pichulo, Gregory Keller Rasmussen, Mark Ray McClanahan