Abstract: A method for exposing light sensitive material to provide exposure patches representing the material sensitivity and which minimizes the effects of intermittency of the light sensitive material, including providing a source of laser light by producing a laser light beam by a continuous wave pump laser which produces a first beam of light and a continuous wave dye laser responsive to the beam of light to produce a second beam of light having gaussian intensity distributions in two orthogonal directions; shaping the second light beam so as to produce a substantially square wave intensity distribution in one direction, while the other direction has a gaussian distribution; and scanning the shaped second light beam through a target of different uniform densities and onto light sensitive material so as to produce a series of exposure patches in one scan of different densities but with the density in each exposure patch being uniform, whereby the effect of intermittency in the light sensitive material is minimized.

Abstract: A process for producing benzene-soluble substantially linear dichlorophosphazene polymer having the formula (NPCl.sub.2).sub.x, in which x is greater than 20 and may be as high as 50,000 or higher, from a cyclic oligomer having the formula (NPCl.sub.2).sub.n, in which n is from 3 to 9, particularly the trimer (NPCl.sub.2).sub.3 or tetramer (NPCl.sub.2).sub.4, in the presence of a small but significant amount of an inorganic salt, preferably a halide of a metal such as Cr, Ni, Co, Cu, Fe, Mn or Mg which affords control of the molecular weight and avoids the formation of large amounts of gel.