Patents by Inventor Mark SCHÜRMANN

Mark SCHÜRMANN has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 10782456
    Abstract: A reflector element and a method for manufacturing a reflector element are disclosed. In an embodiment the reflector element includes a plastic substrate and a silver layer arranged on the plastic substrate. The reflector element further includes a first barrier layer arranged on the silver layer, wherein the barrier layer has an at least 15 nm-thick oxide layer and a second barrier layer arranged on the first barrier layer, wherein the barrier layer includes siloxane, and wherein a thickness of the second barrier layer is at least 250 nm and at most 450 nm.
    Type: Grant
    Filed: February 26, 2016
    Date of Patent: September 22, 2020
    Assignee: SITECO GMBH
    Inventors: Mark Schürmann, Peter Munzert, Dirk Salz, Klaus Stockwald, Reinhard Schaefer, Stefan Kotter, Paul Braun
  • Patent number: 10618840
    Abstract: A method for producing a reflector element and a reflector element are disclosed. In an embodiment the method includes depositing a layer sequence on a substrate, wherein the layer sequence includes at least one mirror layer and at least one reactive multilayer system and igniting the reactive multilayer system in order to activate heat input in the layer sequence.
    Type: Grant
    Filed: March 9, 2016
    Date of Patent: April 14, 2020
    Assignees: Fraunhofer-Gesellschaft zur Foerderung der angewandten Forschung e.V., Friedrich-Schiller-Universitaet Jena
    Inventors: Mark Schürmann, Stefan Schwinde, Robert Müller, Norbert Kaiser
  • Patent number: 10429549
    Abstract: An optical element including a reflective coating is disclosed. In an embodiment the reflective coating includes an adhesion-promoting layer, an at least partially reflective silver layer disposed on the adhesion-promoting layer and a protective layer system disposed on the silver layer, wherein the protective layer system includes a plurality of dielectric layers, wherein the dielectric layers include at least one first layer and at least one second layer, wherein the first layer and the second layer have a different resistance to at least two different contamination substances, wherein the dielectric layers have a thickness of not more than 30 nm, and wherein a number of the dielectric layers amounts to at least five.
    Type: Grant
    Filed: June 12, 2015
    Date of Patent: October 1, 2019
    Assignees: Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V., Friedrich-Schiller-Universität Jena
    Inventors: Mark Schürmann, Stefan Schwinde, Norbert Kaiser
  • Patent number: 10381802
    Abstract: The invention describes a light emitting device (100). The light emitting device (100) comprises at least one light emitting structure (110), at least one processing layer (120) and at least one optical structure (130). The optical structure (130) comprises at least one material processed by means of processing light (150). The at least one processing layer (120) is arranged to reduce reflection of the processing light (150) in a direction of the optical structure (130) at least by 50%, preferably at least by 80%, more preferably at least by 95% and most preferably at least by 99% during processing of the material by means of the processing light (150). It is a basic idea of the present invention to incorporate a non- or low-reflective processing layer (120) on top of a light emitting structure (110) like a VCSEL array in order to enable on wafer processing of light emitting structures (130) like microlens arrays. The invention further describes a method of manufacturing such a light emitting device (100).
    Type: Grant
    Filed: September 22, 2016
    Date of Patent: August 13, 2019
    Assignee: PHILIPS PHOTONICS GMBH
    Inventors: Stephan Gronenborn, Michael Miller, Peter Dannberg, Mark Schuermann, Holger Moench
  • Publication number: 20180278024
    Abstract: The invention describes a light emitting device (100). The light emitting device (100) comprises at least one light emitting structure (110), at least one processing layer (120) and at least one optical structure (130). The optical structure (130) comprises at least one material processed by means of processing light (150). The at least one processing layer (120) is arranged to reduce reflection of the processing light (150) in a direction of the optical structure (130) at least by 50%, preferably at least by 80%, more preferably at least by 95% and most preferably at least by 99% during processing of the material by means of the processing light (150). It is a basic idea of the present invention to incorporate a non- or low-reflective processing layer (120) on top of a light emitting structure (110) like a VCSEL array in order to enable on wafer processing of light emitting structures (130) like microlens arrays. The invention further describes a method of manufacturing such a light emitting device (100).
    Type: Application
    Filed: September 22, 2016
    Publication date: September 27, 2018
    Inventors: Stephan Gronenborn, Michael Miller, Peter Dannberg, Mark Schuermann, Holger Moench
  • Publication number: 20180045864
    Abstract: A reflector element and a method for manufacturing a reflector element are disclosed. In an embodiment the reflector element includes a plastic substrate and a silver layer arranged on the plastic substrate. The reflector element further includes a first barrier layer arranged on the silver layer, wherein the barrier layer has an at least 15 nm-thick oxide layer and a second barrier layer arranged on the first barrier layer, wherein the barrier layer includes siloxane, and wherein a thickness of the second barrier layer is at least 250 nm and at most 450 nm.
    Type: Application
    Filed: February 26, 2016
    Publication date: February 15, 2018
    Inventors: Mark Schürmann, Peter Munzert, Dirk Salz, Klaus Stockwald, Reinhard Schaefer, Stefan Kotter, Paul Braun
  • Publication number: 20180029931
    Abstract: A method for producing a reflector element and a reflector element are disclosed. In an embodiment the method includes depositing a layer sequence on a substrate, wherein the layer sequence includes at least one mirror layer and at least one reactive multilayer system and igniting the reactive multilayer system in order to activate heat input in the layer sequence.
    Type: Application
    Filed: March 9, 2016
    Publication date: February 1, 2018
    Inventors: Mark Schürmann, Stefan Schwinde, Robert Müller, Norbert Kaiser
  • Publication number: 20170139085
    Abstract: An optical element including a reflective coating is disclosed. In an embodiment the reflective coating includes an adhesion-promoting layer, an at least partially reflective silver layer disposed on the adhesion-promoting layer and a protective layer system disposed on the silver layer, wherein the protective layer system includes a plurality of dielectric layers, wherein the dielectric layers include at least one first layer and at least one second layer, wherein the first layer and the second layer have a different resistance to at least two different contamination substances, wherein the dielectric layers have a thickness of not more than 30 nm, and wherein a number of the dielectric layers amounts to at least five.
    Type: Application
    Filed: June 12, 2015
    Publication date: May 18, 2017
    Inventors: Mark SCHÜRMANN, Stefan SCHWINDE, Norbert KAISER
  • Patent number: 9233873
    Abstract: The present invention pertains to a process for the silicate bonding of joined surfaces, facing one another, of two components by means of an aqueous, alkaline, silicon-cation-containing joining solution for the purpose of producing an optical element, characterized in that one or both of said joined surfaces (1; 2b; 10) are covered with a layer of an oxide (3), which has a higher refractive index than SiO2 and is selected from among oxides of the third and fourth main group elements, of the second and third group of the transition elements as well as zirconium and from among mixed oxides of the said elements, whereupon the joining solution is applied to at least one of the surfaces to be joined and the surfaces are bonded to one another.
    Type: Grant
    Filed: May 9, 2011
    Date of Patent: January 12, 2016
    Assignee: Fraunhofer-Gesellschaft zur Foerderung der angewandten Forschung e.V.
    Inventors: Gerhard Kalkowski, Simone Fabian, Charlotte Jahnke, Ramona Eberhardt, Mark Schuermann
  • Publication number: 20130048214
    Abstract: The present invention pertains to a process for the silicate bonding of joined surfaces, facing one another, of two components by means of an aqueous, alkaline, silicon-cation-containing joining solution for the purpose of producing an optical element, characterized in that one or both of said joined surfaces (1; 2b; 10) are covered with a layer of an oxide (3), which has a higher refractive index than SiO2 and is selected from among oxides of the third and fourth main group elements, of the second and third group of the transition elements as well as zirconium and from among mixed oxides of the said elements, whereupon the joining solution is applied to at least one of the surfaces to be joined and the surfaces are bonded to one another.
    Type: Application
    Filed: May 9, 2011
    Publication date: February 28, 2013
    Applicant: Fraunhofer-Gesellschaft zur Foerderung der angewan Forschung e.V.
    Inventors: Gerhard Kalkowski, Simone Fabian, Charlotte Jahnke, Ramona Eberhardt, Mark Schuermann