Patents by Inventor Mark Schattenburg

Mark Schattenburg has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 11879170
    Abstract: A device includes a substrate and a stressed layer disposed on a first surface of the substrate. The stressed layer includes: a first set of patterns having a predetermined geometry, size, and arrangement selected to control an equibiaxial stress field of the stressed layer, wherein the equibiaxial stress field varies in magnitude over the first surface of the substrate, and a second set of patterns etched into the first set of patterns and the substrate, the second set of patterns comprising a plurality of substantially parallel lines arranged to control at least a uniaxial stress field of the stressed layer, wherein the uniaxial stress field varies in magnitude over the first surface of the substrate.
    Type: Grant
    Filed: August 14, 2020
    Date of Patent: January 23, 2024
    Assignee: Massachusetts Institute of Technology
    Inventors: Youwei Yao, Brandon Chalifoux, Mark Schattenburg
  • Publication number: 20210047729
    Abstract: A device includes a substrate and a stressed layer disposed on a first surface of the substrate. The stressed layer includes: a first set of patterns having a predetermined geometry, size, and arrangement selected to control an equibiaxial stress field of the stressed layer, wherein the equibiaxial stress field varies in magnitude over the first surface of the substrate, and a second set of patterns etched into the first set of patterns and the substrate, the second set of patterns comprising a plurality of substantially parallel lines arranged to control at least a uniaxial stress field of the stressed layer, wherein the uniaxial stress field varies in magnitude over the first surface of the substrate.
    Type: Application
    Filed: August 14, 2020
    Publication date: February 18, 2021
    Inventors: Youwei Yao, Brandon Chalifoux, Mark Schattenburg
  • Patent number: 10503083
    Abstract: A method and apparatus for treating a substrate and, in particular, making secondary adjustments to the results of a primary process applied to the substrate, leading to improved uniformity of the overall process, in which a substrate is positioned on a substrate holder; a scanning a beam of light is directed onto the surface of the substrate; and the amplitude of the scanned beam is varied by location based on a substrate signature.
    Type: Grant
    Filed: October 22, 2018
    Date of Patent: December 10, 2019
    Assignee: Lithoptek LLC
    Inventors: Mark Schattenburg, Rudolf Hendel, John Glenn
  • Publication number: 20190056675
    Abstract: A method and apparatus for treating a substrate and, in particular, making secondary adjustments to the results of a primary process applied to the substrate, leading to improved uniformity of the overall process, in which a substrate is positioned on a substrate holder; a scanning a beam of light is directed onto the surface of the substrate; and the amplitude of the scanned beam is varied by location based on a substrate signature.
    Type: Application
    Filed: October 22, 2018
    Publication date: February 21, 2019
    Inventors: Mark Schattenburg, Rudolf Hendel, John Glenn
  • Patent number: 10145672
    Abstract: A method and apparatus in which retroreflective materials and surfaces are used for determining the position, orientation and scale of work pieces in order to accurately place process beams thereon for the purpose of surface patterning or treatment.
    Type: Grant
    Filed: January 24, 2017
    Date of Patent: December 4, 2018
    Assignee: Lithoptek LLC
    Inventors: Mark Schattenburg, Rudolf Hendel, Paul Glenn, John Glenn
  • Patent number: 10108096
    Abstract: A method and apparatus for treating a substrate and, in particular, making secondary adjustments to the results of a primary process applied to the substrate, leading to improved uniformity of the overall process, in which a substrate is positioned on a substrate holder; a scanning a beam of light is directed onto the surface of the substrate; and the amplitude of the scanned beam is varied by location based on a substrate signature.
    Type: Grant
    Filed: August 31, 2016
    Date of Patent: October 23, 2018
    Assignee: Lithoptek LLC
    Inventors: Mark Schattenburg, Rudolf Hendel, John Glenn
  • Publication number: 20180209780
    Abstract: A method and apparatus in which retroreflective materials and surfaces are used for determining the position, orientation and scale of work pieces in order to accurately place process beams thereon for the purpose of surface patterning or treatment.
    Type: Application
    Filed: January 24, 2017
    Publication date: July 26, 2018
    Inventors: Mark Schattenburg, Rudolf Hendel, Paul Glenn, John Glenn
  • Publication number: 20170060004
    Abstract: A method and apparatus for treating a substrate and, in particular, making secondary adjustments to the results of a primary process applied to the substrate, leading to improved uniformity of the overall process, in which a substrate is positioned on a substrate holder; a scanning a beam of light is directed onto the surface of the substrate; and the amplitude of the scanned beam is varied by location based on a substrate signature.
    Type: Application
    Filed: August 31, 2016
    Publication date: March 2, 2017
    Inventors: Rudolph Hendel, Mark Schattenburg, John Glenn
  • Patent number: 7492989
    Abstract: A hybrid transmission-reflection grating includes an array of essentially parallel principal interfaces, with each principal interface separating a first medium and a second medium. The first medium has a first index of refraction, and the second medium has a second index of refraction. The first medium allows for transmission of quantum-mechanical objects in excess of one percent of an incident number of quantum-mechanical objects. The array of principal interfaces has a spacing distance between adjacent principal interfaces. The first medium has a width in the direction normal to the principal interfaces, the width being less than the spacing distance.
    Type: Grant
    Filed: May 23, 2006
    Date of Patent: February 17, 2009
    Assignee: Massachusetts Institute of Technology
    Inventors: Ralf Heilmann, Mark Schattenburg
  • Publication number: 20070280595
    Abstract: A hybrid transmission-reflection grating includes an array of essentially parallel principal interfaces, with each principal interface separating a first medium and a second medium. The first medium has a first index of refraction, and the second medium has a second index of refraction. The first medium allows for transmission of quantum-mechanical objects in excess of one percent of an incident number of quantum-mechanical objects. The array of principal interfaces has a spacing distance between adjacent principal interfaces. The first medium has a width in the direction normal to the principal interfaces, the width being less than the spacing distance.
    Type: Application
    Filed: May 23, 2006
    Publication date: December 6, 2007
    Inventors: Ralf Heilmann, Mark Schattenburg
  • Patent number: 6882477
    Abstract: A method and system of interference lithography (also known as interferometric lithography or holographic lithography) which utilizes phase-locked, scanning beams (so-called scanning beam interference lithography, or SBIL). The invention utilizes a high-precision stage that moves a substrate under overlapped and interfering pairs of coherent beams. The overlapped beams interfere, generating fringes, which form a pattern “brush” for subsequent writing of periodic and quasi-periodic patterns on the substrate. The phase of the fringes in the overlapped region is phase-locked to the motion of the precision stage. The invention includes methods for forming, overlapping, and phase-locking interfering pairs of beams on a variety of substrates; methods for measuring and controlling the period, phase, and angular orientation of fringes generated by the overlapping beams; and methods for measuring and controlling the effects of stage mechanical and thermal drift and other disturbances during the writing process.
    Type: Grant
    Filed: November 9, 2000
    Date of Patent: April 19, 2005
    Assignee: Massachusetts Institute of Technology
    Inventors: Mark Schattenburg, Patrick N. Everett
  • Patent number: 5809103
    Abstract: X-ray masking apparatus includes a frame having a supporting rim surrounding an x-ray transparent region, a thin membrane of hard inorganic x-ray transparent material attached at its periphery to the supporting rim covering the x-ray transparent region and a layer of x-ray opaque material on the thin membrane inside the x-ray transparent region arranged in a pattern to selectively transmit x-ray energy entering the x-ray transparent region through the membrane to a predetermined image plane separated from the layer by the thin membrane.
    Type: Grant
    Filed: December 20, 1996
    Date of Patent: September 15, 1998
    Assignee: Massachusetts Institute of Technology
    Inventors: Henry I. Smith, Michael Lim, James Carter, Mark Schattenburg