Patents by Inventor Mark Schormann

Mark Schormann has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Process for preparing isobutylene-based polymers
    Patent number: 7238819
    Abstract: This invention relates to a metal organic compound, a catalytic composition comprising said metal organic compound, a process for homo- or co-polymerizing isoolefines in the presence of said metal organic compound and a method of stabilizing a compound of the general structure (II) [R?HC(CRR?)2]2+[M2X9]?, in which R is a group of the formula SiR1R2R3, R? is hydrogen, C1 to C12 alkyl, a C6 to C14 aryl or a C7 to C20 alkylaryl, M is Zr or Hf, X is a halogen atom, and R1 to R3 is a C1 to C12 alkyl group, with a compound R? of the formula M?R4R5R6, in which M? is Si, Ge, Sn or Pb and R4 to R6 is a C1 to C12 alkyl group as well as a non-coordinating anion of the general structure [M2X9]? in which M is Zr or Hf and X is a halogen atom.
    Type: Grant
    Filed: January 21, 2003
    Date of Patent: July 3, 2007
    Assignee: LANXESS Inc.
    Inventors: Manfred Bochmann, Mark Schormann, Shaun Garratt
  • Process for preparing isobutylene-based polymers
    Publication number: 20050165182
    Abstract: This invention relates to a metal organic compound, a catalytic composition comprising said metal organic compound, a process for homo- or co-polymerizing isoolefines in the presence of said metal organic compound and a method of stabilizing a compound of the general structure (II) [R?HC(CRR?)2]2+[M2X9]?, in which R is a group of the formula SiR1R2R3, R? is hydrogen, C1 to C12 alkyl, a C6 to C14 aryl or a C7 to C20 alkylaryl, M is Zr or Hf, X is a halogen atom, and R1 to R3 is a C1 to C12 alkyl group, with a compound R? of the formula M?R4R5R6, in which M? is Si, Ge, Sn or Pb and R4 to R6 is a C1 to C12 alkyl group as well as a non-coordinating anion of the general structure [M2X9]? in which M is Zr or Hf and X is a halogen atom.
    Type: Application
    Filed: January 21, 2003
    Publication date: July 28, 2005
    Inventors: Manfred Bochmann, Mark Schormann, Shaun Garratt