Patents by Inventor Mark Schumann

Mark Schumann has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Texturing and cleaning agent for the surface treatment of wafers and use thereof
    Patent number: 8900472
    Abstract: A liquid agent for the surface treatment of monocrystalline wafers, which contains an alkaline etching agent and also at least one low-volatile organic compound. Systems of this type can be used both for the cleaning, damage etch and texturing of wafer surfaces in a single etching step and exclusively for the texturing of silicon wafers with different surface quality, whether it now be wire-sawn wafers with high surface damage or chemically polished surfaces with minimum damage density.
    Type: Grant
    Filed: June 2, 2010
    Date of Patent: December 2, 2014
    Assignee: Fraunhofer-Gesellschaft zur Föerderung der angewandten Forschung E.V.
    Inventors: Kuno Mayer, Mark Schumann, Daniel Kray, Teresa Orellana Peres, Jochen Rentsch, Martin Zimmer, Elias Kirchgässner, Eva Zimmer, Daniel Biro, Arpad Mihai Rostas, Filip Granek
  • Texturing and cleaning agent for the surface treatment of wafers and use thereof
    Publication number: 20110092074
    Abstract: A liquid agent for the surface treatment of monocrystalline wafers, which contains an alkaline etching agent and also at least one low-volatile organic compound. Systems of this type can be used both for the cleaning, damage etch and texturing of wafer surfaces in a single etching step and exclusively for the texturing of silicon wafers with different surface quality, whether it now be wire-sawn wafers with high surface damage or chemically polished surfaces with minimum damage density.
    Type: Application
    Filed: June 2, 2010
    Publication date: April 21, 2011
    Applicant: Fraunhofer-Gesellschaft zur Forderung der angewandten Forschung e.V.
    Inventors: Kuno Mayer, Mark Schumann, Daniel Kray, Teresa Orellana Peres, Jochen Rentsch, Martin Zimmer, Elias Kirchgässner, Eva Zimmer, Daniel Biro, Arpad Mihai Rostas, Filip Granek