Abstract: A method on a computing system for associating an output of a coupled peripheral device to an input of the peripheral device is provided. A computing system configured to be coupled to a peripheral device comprising an input and an associated output is provided. The computing system comprises an input logical layer configured to receive descriptor configuration information from the peripheral device and build interface sets including attributes of the input of the peripheral device and the associated output. The input logical layer uses the interface sets to select and set attributes of the output of the peripheral device.

Abstract: A method on a computing system for associating an output of a coupled peripheral device to an input of the peripheral device is provided. A computing system configured to be coupled to a peripheral device comprising an input and an associated output is provided. The computing system comprises an input logical layer configured to receive descriptor configuration information from the peripheral device and build interface sets including attributes of the input of the peripheral device and the associated output. The input logical layer uses the interface sets to select and set attributes of the output of the peripheral device.

Abstract: A method on a computing system for associating an output of a coupled peripheral device to an input of the peripheral device is provided. The method comprises receiving a descriptor configuration input from the coupled peripheral device describing attributes of the peripheral device and an association between the input of the peripheral device and the output of the peripheral device; providing peripheral device classes of associated input attributes including associated output attributes of the peripheral device; and informing an instantiated application of attributes of the peripheral device through classes.

Abstract: The present invention is directed to novel radiation-sensitive, wet developable bottom antireflective coating (DBARC) compositions and their use in semiconductor device manufacturing. The DBARC compositions contain a photoacid generator that produces a photoacid upon exposure to activating radiation. In a photolithographic imaging process, the relatively strong photoacid reduces or eliminates scumming. Further, the relatively large size of the photoacid limits its diffusion through the DBARC, thus minimizing or preventing undercut. The inventive method also limits diffusion of the photoacid by controlling the temperature of the post-exposure baking step. Use of the DBARC compositions with a photoresist in photolithography results in highly resolved features having essentially vertical profiles and no scumming and no undercut, which is critical as microelectronics and semiconductor components become increasingly miniaturized.