Patents by Inventor Mark Stenholm
Mark Stenholm has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Patent number: 11747396Abstract: A hybrid optical-electrical automated testing equipment (ATE) system can implement a workpress assembly that can interface with a device under test (DUT) and a load board that holds the DUT during testing, analysis, and calibration. A test hand can actuate to position the DUT on a socket and align one or more alignment features. The workpress assembly can include two optical interfaces that are optically coupled such that light can be provided to a side of the DUT that is facing away from the load board, thereby enabling the ATE system to perform simultaneous optical and electrical testing of the DUT.Type: GrantFiled: July 30, 2020Date of Patent: September 5, 2023Assignee: OpenLight Photonics, Inc.Inventors: Steven William Keck, Crispin Cruz Mapagay, Mark Stenholm
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Publication number: 20220107659Abstract: An optical-electrical device can implement a feedback-based control loop for temperature of the device during component calibration. The optical-electrical device can implement compressed air to vary the device temperature during calibration. Additionally, non-active components of the device can be provided current to vary the temperature of the device in concert with the provided compressed air. Additional calibration temperatures can be implemented by activating and deactivating additional non-active components in the device, such as light sources, optical amplifiers, and modulators.Type: ApplicationFiled: December 17, 2021Publication date: April 7, 2022Inventors: Chris Barnard, Steven William Keck, Crispin Cruz Mapagay, George R. Sosnowski, Mark Stenholm
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Patent number: 11243550Abstract: An optical-electrical device can implement a feedback-based control loop for temperature of the device during component calibration. The optical-electrical device can implement compressed air to vary the device temperature during calibration. Additionally, non-active components of the device can be provided current to vary the temperature of the device in concert with the provided compressed air. Additional calibration temperatures can be implemented by activating and deactivating additional non-active components in the device, such as light sources, optical amplifiers, and modulators.Type: GrantFiled: May 29, 2020Date of Patent: February 8, 2022Assignee: Juniper Networks, Inc.Inventors: Chris Barnard, Steven William Keck, Crispin Cruz Mapagay, George R. Sosnowski, Mark Stenholm
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Publication number: 20220034963Abstract: A hybrid optical-electrical automated testing equipment (ATE) system can implement a workpress assembly that can interface with a device under test (DUT) and a load board that holds the DUT during testing, analysis, and calibration. A test hand can actuate to position the DUT on a socket and align one or more alignment features. The workpress assembly can include two optical interfaces that are optically coupled such that light can be provided to a side of the DUT that is facing away from the load board, thereby enabling the ATE system to perform simultaneous optical and electrical testing of the DUT.Type: ApplicationFiled: July 30, 2020Publication date: February 3, 2022Inventors: Steven William Keck, Crispin Cruz Mapagay, Mark Stenholm
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Publication number: 20210373585Abstract: An optical-electrical device can implement a feedback-based control loop for temperature of the device during component calibration. The optical-electrical device can implement compressed air to vary the device temperature during calibration. Additionally, non-active components of the device can be provided current to vary the temperature of the device in concert with the provided compressed air. Additional calibration temperatures can be implemented by activating and deactivating additional non-active components in the device, such as light sources, optical amplifiers, and modulators.Type: ApplicationFiled: May 29, 2020Publication date: December 2, 2021Inventors: Chris Barnard, Steven William Keck, Crispin Cruz Mapagay, George R. Sosnowski, Mark Stenholm
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Publication number: 20060245854Abstract: A workpiece loading interface is included within a workpiece processing system which processes workpieces, typically wafers, in a vacuum. The workpiece loading interface includes two separate chambers. Each chamber may be separately pumped down. Thus, while a first cassette of wafers, from a first chamber is being accessed, a second cassette of wafers may be loaded in the second chamber and the second chamber pumped down. Each chamber is designed to minimize intrusion to a clean room. Thus a door to each chamber has a mechanism which, when opening the door, first moves the door slightly away from an opening in the chamber and then the door is moved down parallel to the chamber. After the door is opened, a cassette of wafers is lowered through the opening in a motion much like a drawbridge. The cassette may be pivoted within the chamber when the position from which wafers are accessed from the cassette differs from the position from which the cassette is lowered out of the chamber.Type: ApplicationFiled: April 24, 2006Publication date: November 2, 2006Inventors: Masato Toshima, Phil Salzman, Steven Murdoch, Cheng Wang, Mark Stenholm, James Howard, Leonard Hall
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Patent number: 6599076Abstract: A workpiece loading interface is included within a workpiece processing system which processes workpieces, typically wafers, in a vacuum. The workpiece loading interface includes two separate chambers. Each chamber may be separately pumped down. Thus, while a first cassette of wafers, from a first chamber is being accessed, a second cassette of wafers may be loaded in the second chamber and the second chamber pumped down. Each chamber is designed to minimize intrusion to a clean room. Thus a door to each chamber has a mechanism which, when opening the door, first moves the door slightly away from an opening in the chamber and then the door is moved down parallel to the chamber. After the door is opened, a cassette of wafers is lowered through the opening in a motion much like a drawbridge. The cassette may be pivoted within the chamber when the position from which wafers are accessed from the cassette differs from the position from which the cassette is lowered out of the chamber.Type: GrantFiled: August 19, 2002Date of Patent: July 29, 2003Assignee: Applied Materials, Inc.Inventors: Masato M. Toshima, Phil M. Salzman, Steven C. Murdoch, Cheng Wang, Mark A. Stenholm, James Howard, Leonard Hall
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Publication number: 20030002959Abstract: A workpiece loading interface is included within a workpiece processing system which processes workpieces, typically wafers, in a vacuum. The workpiece loading interface includes two separate chambers. Each chamber may be separately pumped down. Thus, while a first cassette of wafers, from a first chamber is being accessed, a second cassette of wafers may be loaded in the second chamber and the second chamber pumped down. Each chamber is designed to minimize intrusion to a clean room. Thus a door to each chamber has a mechanism which, when opening the door, first moves the door slightly away from an opening in the chamber and then the door is moved down parallel to the chamber. After the door is opened, a cassette of wafers is lowered through the opening in a motion much like a drawbridge. The cassette may be pivoted within the chamber when the position from which wafers are accessed from the cassette differs from the position from which the cassette is lowered out of the chamber.Type: ApplicationFiled: August 19, 2002Publication date: January 2, 2003Inventors: Masato M. Toshima, Phil M. Salzman, Steven C. Murdoch, Cheng Wang, Mark A. Stenholm, James Howard, Leonard Hall
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Publication number: 20030002960Abstract: A workpiece loading interface is included within a workpiece processing system which processes workpieces, typically wafers, in a vacuum. The workpiece loading interface includes two separate chambers. Each chamber may be separately pumped down. Thus, while a first cassette of wafers, from a first chamber is being accessed, a second cassette of wafers may be loaded in the second chamber and the second chamber pumped down. Each chamber is designed to minimize intrusion to a clean room. Thus a door to each chamber has a mechanism which, when opening the door, first moves the door slightly away from an opening in the chamber and then the door is moved down parallel to the chamber. After the door is opened, a cassette of wafers is lowered through the opening in a motion much like a drawbridge. The cassette may be pivoted within the chamber when the position from which wafers are accessed from the cassette differs from the position from which the cassette is lowered out of the chamber.Type: ApplicationFiled: August 19, 2002Publication date: January 2, 2003Inventors: Masato M. Toshima, Phil M. Salzman, Steven C. Murdoch, Cheng Wang, Mark A. Stenholm, James Howard, Leonard Hall
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Patent number: 6454508Abstract: A workpiece loading interface is included within a workpiece processing system which processes workpieces, typically wafers, in a vacuum. The workpiece loading interface includes two separate chambers. Each chamber may be separately pumped down. Thus, while a first cassette of wafers, from a first chamber is being accessed, a second cassette of wafers may be loaded in the second chamber and the second chamber pumped down. Each chamber is designed to minimize intrusion to a clean room. Thus a door to each chamber has a mechanism which, when opening the door, first moves the door slightly away from an opening in the chamber and then the door is moved down parallel to the chamber. After the door is opened, a cassette of wafers is lowered through the opening in a motion much like a drawbridge. The cassette may be pivoted within the chamber when the position from which wafers are accessed from the cassette differs from the position from which the cassette is lowered out of the chamber.Type: GrantFiled: May 1, 1998Date of Patent: September 24, 2002Assignee: Applied Materials, Inc.Inventors: Masato M. Toshima, Phil M. Salzman, Steven C. Murdoch, Cheng Wang, Mark A. Stenholm, James Howard, Leonard Hall
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Patent number: 6454519Abstract: A workpiece loading interface is included within a workpiece processing system which processes workpieces, typically wafers, in a vacuum. The workpiece loading interface includes two separate chambers. Each chamber may be separately pumped down. Thus, while a first cassette of wafers, from a first chamber is being accessed, a second cassette of wafers may be loaded in the second chamber and the second chamber pumped down. Each chamber is designed to minimize intrusion to a clean room. Thus a door to each chamber has a mechanism which, when opening the door, first moves the door slightly away from an opening in the chamber and then the door is moved down parallel to the chamber. After the door is opened, a cassette of wafers is lowered through the opening in a motion much like a drawbridge. The cassette may be pivoted within the chamber when the position from which wafers are accessed from the cassette differs from the position from which the cassette is lowered out of the chamber.Type: GrantFiled: March 7, 1997Date of Patent: September 24, 2002Assignee: Applied Materials, Inc.Inventors: Masato M. Toshima, Phil M. Salzman, Steven C. Murdoch, Cheng Wang, Mark A. Stenholm, James Howard, Leonard Hall, David Cheng
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Publication number: 20010014266Abstract: A workpiece loading interface is included within a workpiece processing system which processes workpieces, typically wafers, in a vacuum. The workpiece loading interface includes two separate chambers. Each chamber may be separately pumped down. Thus, while a first cassette of wafers, from a first chamber is being accessed, a second cassette of wafers may be loaded in the second chamber and the second chamber pumped down. Each chamber is designed to minimize intrusion to a clean room. Thus a door to each chamber has a mechanism which, when opening the door, first moves the door slightly away from an opening in the chamber and then the door is moved down parallel to the chamber. After the door is opened, a cassette of wafers is lowered through the opening in a motion much like a drawbridge. The cassette may be pivoted within the chamber when the position from which wafers are accessed from the cassette differs from the position from which the cassette is lowered out of the chamber.Type: ApplicationFiled: May 1, 1998Publication date: August 16, 2001Inventors: MASATO M. TOSHIMA, PHIL M. SALZMAN, STEVEN C. MURDOCH, CHENG WANG, MARK A. STENHOLM, JAMES HOWARD, LEONARD HALL
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Patent number: 5769588Abstract: A workpiece loading interface is included within a workpiece processing system which processes workpieces, typically wafers, in a vacuum. The workpiece loading interface includes two separate chambers. Each chamber may be separately pumped down. Thus, while a first cassette of wafers, from a first chamber is being accessed, a second cassette of wafers may be loaded in the second chamber and the second chamber pumped down. Each chamber is designed to minimize intrusion to a clean room. Thus a door to each chamber has a mechanism which, when opening the door, first moves the door slightly away from an opening in the chamber and then the door is moved down parallel to the chamber. After the door is opened, a cassette of wafers is lowered through the opening in a motion much like a drawbridge. The cassette may be pivoted within the chamber when the position from which wafers are accessed from the cassette differs from the position from which the cassette is lowered out of the chamber.Type: GrantFiled: August 20, 1996Date of Patent: June 23, 1998Assignee: Applied Materials, Inc.Inventors: Masato M. Toshima, Phil M. Salzman, Steven C. Murdoch, Cheng Wang, Mark A. Stenholm, James Howard, Leonard Hall, David Cheng
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Patent number: 5186594Abstract: A workpiece loading interface is included within a workpiece processing system which processes workpieces, typically wafers, in a vacuum. The workpiece loading interface includes two separate chambers. Each chamber may be separately pumped down. Thus, while a first cassette of wafers, from a first chamber is being accessed, a second cassette of wafers may be loaded in the second chamber and the second chamber pumped down. Each chamber is designed to minimize intrusion to a clean room. Thus a door to each chamber has a mechanism which, when opening the door, first moves the door slightly away from an opening in the chamber and then the door is moved down parallel to the chamber. After the door is opened, a cassette of wafers is lowered through the opening in a motion much like a drawbridge. The cassette may be pivoted within the chamber when the position from which wafers are accessed from the cassette differs from the position from which the cassette is lowered out of the chamber.Type: GrantFiled: April 19, 1990Date of Patent: February 16, 1993Assignee: Applied Materials, Inc.Inventors: Masato M. Toshima, Phil M. Salzman, Steven C. Murdoch, Cheng Wang, Mark A. Stenholm, James Howard, Leonard Hall, David Cheng