Patents by Inventor Mark Steven Slezak

Mark Steven Slezak has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Self-topcoating photoresist for photolithography
    Patent number: 7951524
    Abstract: Photoresist additive polymers and photoresist formulations that can be used in immersion lithography without the use of an additional topcoat. The resist compositions include a photoresist polymer, at least one photoacid generator, a solvent; and a photoresist additive polymer. Also a method of forming using photoresist formulations including photoresist additive polymers.
    Type: Grant
    Filed: January 31, 2008
    Date of Patent: May 31, 2011
    Assignees: International Business Machines Corporation, JSR Micro Inc.
    Inventors: Robert Allen, Phillip Brock, Shiro Kusumoto, Yukio Nishimura, Daniel P. Sanders, Mark Steven Slezak, Ratnam Sooriyakumaran, Linda K. Sundberg, Hoa Trung, Gregory M. Wallraff
  • SELF-TOPCOATING PHOTORESIST FOR PHOTOLITHOGRAPHY
    Publication number: 20080193879
    Abstract: Photoresist additive polymers and photoresist formulations that can be used in immersion lithography without the use of an additional topcoat. The resist compositions include a photoresist polymer, at least one photoacid generator, a solvent; and a photoresist additive polymer. Also a method of forming using photoresist formulations including photoresist additive polymers.
    Type: Application
    Filed: January 31, 2008
    Publication date: August 14, 2008
    Inventors: Robert Allen, Phillip Brock, Shiro Kusumoto, Yukio Nishimura, Daniel P. Sanders, Mark Steven Slezak, Ratnam Sooriyakumaran, Linda K. Sundberg, Hoa Truong, Gregory M. Wallraff