Patents by Inventor Mark Theo Meuwese

Mark Theo Meuwese has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20090270834
    Abstract: The invention refers to an electrically actuated, needle-free injection device. The main field of application is drug delivery. The device is based on a piezoelectric actuator (11). The device enables controlled, continuous, tuneable drug delivery. The device enables painless injection, personalized and programmable dosage profiles. The device is designed, both to pierce the epidermis for trans-epidermal drug delivery and to deliver controlled amounts of fluid (transdermal, electronic pill and implantable drug delivery). This type of device enables personalized drug delivery and is an enabling component for closed-loop drug delivery systems.
    Type: Application
    Filed: August 13, 2007
    Publication date: October 29, 2009
    Applicant: KONINKLIJKE PHILIPS ELECTRONICS N.V.
    Inventors: Giovanni Nisato, Jen-Eric Jack Martijn Rubingh, Johan Frederik Dijksman, Henry Timmermans, Mark Theo Meuwese
  • Patent number: 7456413
    Abstract: The invention relates to an apparatus for evacuating samples. A sample 4 is hereby placed in a cavity 3 of a sheet 1 with a smooth surface 2. A sole plate 5 Is placed upon this smooth surface 2, whereby the smooth surface 2 and the sole plate 5 placed thereupon together form a vacuum seal. The sole plate 5, upon which a vacuum column 6 is mounted, can be slid across the smooth surface 2. By sliding the sole plate 5 over the cavity 4, the cavity 4 is evacuated in several steps. In an embodiment of the invention, the vacuum column 6 takes the form of an ESEM (Environmental Scanning Electron Microscope). In this way, it is possible to inspect the evacuated sample 4 with the ESEM.
    Type: Grant
    Filed: June 28, 2005
    Date of Patent: November 25, 2008
    Assignee: FEI Company
    Inventors: Bart Buijsse, Mark Theo Meuwese, Maria Van Wely-Dieleman, Sjoerd Antonius Maria Mentink, Theodorus Hubertus Josephus Bisschops
  • Publication number: 20080186550
    Abstract: The invention relates to a micro electromechanical device (1?) for tilting a body (2) in two degrees of freedom comprising a carrier element (3) and a membrane (4), the body (2) being connected via the membrane (4) to the carrier element (3), wherein the body (2) and the carrier element (3) each comprise at least one electrode (5,6). The body (2) is tilted by means of electrostatic forces (7) between the at least one electrode (5) of the body (2) and the at least one electrode (6) of the carrier element (3) by an application of a voltage (V1,V2) to said electrodes (5,6) from a voltage source.
    Type: Application
    Filed: January 10, 2006
    Publication date: August 7, 2008
    Applicant: KONINKLIJKE PHILIPS ELECTRONICS, N.V.
    Inventors: Mark Theo Meuwese, Diederik Van Lierop, Ronald Jan Asjes, Gerardus L.M. Jansen, Eric Cornelis Egbertus Van Grunsven, Dannis Michel Brouwer
  • Patent number: 7301157
    Abstract: A cluster tool includes multiple tools for microscopic processing of a sample positioned around a rotatable base. A sample holder on the base rotates the sample between the working areas of the tools. A slidable vacuum seal maintains a vacuum in a sample chamber for tools that require a vacuum.
    Type: Grant
    Filed: September 28, 2005
    Date of Patent: November 27, 2007
    Assignee: FEI Company
    Inventors: Bart Buijsse, Mark Theo Meuwese, Bernardus Jacobus Marie Bormans, Hendrik Nicolaas Slingerland, Hendrik Gezinus Tappel
  • Patent number: 7285785
    Abstract: The invention describes a particle-optical apparatus arranged to focus a beam (1) of electrically charged particles with the aid of two particle-optical lens systems (10, 20). The lens action is achieved by magnetic fields, which fields are generated by permanent-magnetic materials (13, 23). In contrast to magnetic lenses equipped with a coil, it is not easy in the case of lenses equipped with permanent-magnetic material to alter the focusing magnetic field with the aim of altering the optical power. In an apparatus according to the invention, the optical power of the lens systems is altered by altering the energy with which the beam (1) traverses the lens systems (10, 20). This can easily happen by altering the voltage of electrical power supplies (14, 24).
    Type: Grant
    Filed: May 3, 2006
    Date of Patent: October 23, 2007
    Assignee: FEI Company
    Inventors: Bart Buijsse, Theodorus Hubertus Josephus Bisschops, Mark Theo Meuwese
  • Patent number: 7064325
    Abstract: The invention describes a particle-optical apparatus arranged to focus a beam (1) of electrically charged particles with the aid of two particle-optical lens systems (10, 20). The lens action is achieved by magnetic fields, which fields are generated by permanent-magnetic materials (13, 23). In contrast to magnetic lenses equipped with a coil, it is not easy in the case of lenses equipped with permanent-magnetic material to alter the focusing magnetic field with the aim of altering the optical power. In an apparatus according to the invention, the optical power of the lens systems is altered by altering the energy with which the beam (1) traverses the lens systems (10, 20). This can easily happen by altering the voltage of electrical power supplies (14, 24).
    Type: Grant
    Filed: April 21, 2005
    Date of Patent: June 20, 2006
    Assignee: FEI Company
    Inventors: Bart Buijsse, Theodorus Hubertus Josephus Bisschops, Mark Theo Meuwese
  • Patent number: 6304630
    Abstract: A method is described for generating EUV radiation, comprising the steps of: generating a flow (35) of liquid droplets (39); injecting the flow into a source space (33) connected to a vacuum pump (34), and successively irradiating individual droplets (39) with an intense, pulsed, laser beam (41) focused on a droplet, thus creating a plasma (47) which emits EUV radiation. In order to prevent that liquid vapor destroys the vacuum in the source space (33) and to guarantee a continuous flux of EUV radiation, the flow (35) is guided through additional vacuum spaces (53, 56, 63) in series with the source space. Also described are an EUV radiation source unit for realizing the method and the application of the method in the manufacture of devices, like IC devices, and in a lithographic projection apparatus.
    Type: Grant
    Filed: November 16, 2000
    Date of Patent: October 16, 2001
    Assignee: U.S. Philips Corporation
    Inventors: Theodorus Hubertus Josephus Bisschops, Joseph Johannes Antonius Maria Vrakking, Mark Theo Meuwese