Abstract: An aftertreatment device includes flow guides disposed within a dosing conduit. Exhaust enters through a perforated region of the dosing conduit and passes through the flow guides. The flow guides induce swirling or other turbulence to mix injected reactant with the exhaust gas. Various types of flow guides include cantilevered vanes, guide passageways, and louvered openings of a second conduit. Some types of flow guides induce localized mixing to inhibit deposit formation at the doser mounting unit. Other types of flow guides induce mixing downstream of the dosing conduit.

Abstract: An aftertreatment device includes flow guides disposed within a dosing conduit. Exhaust enters through a perforated region of the dosing conduit and passes through the flow guides. The flow guides induce swirling or other turbulence to mix injected reactant with the exhaust gas. Various types of flow guides include cantilevered vanes, guide passageways, and louvered openings of a second conduit. Some types of flow guides induce localized mixing to inhibit deposit formation at the doser mounting unit. Other types of flow guides induce mixing downstream of the dosing conduit.

Abstract: An aftertreatment device includes flow guides disposed within a dosing conduit. Exhaust enters through a perforated region of the dosing conduit and passes through the flow guides. The flow guides induce swirling or other turbulence to mix injected reactant with the exhaust gas. Various types of flow guides include cantilevered vanes, guide passageways, and louvered openings of a second conduit. Some types of flow guides induce localized mixing to inhibit deposit formation at the doser mounting unit. Other types of flow guides induce mixing downstream of the dosing conduit.

Abstract: An exhaust treatment arrangement includes a mixing assembly disposed between first and second substrates; and an injection mounting location disposed at the mixing assembly. The mixing assembly includes a mixing arrangement configured to direct exhaust flow exiting the first substrate in a swirling configuration, a restricting member defining a restricted passage, and optionally a dispersing member configured to even out the exhaust flow.

Abstract: A dosing and mixing arrangement including an exhaust conduit defining a central axis; a mixing conduit positioned within the exhaust conduit; a dispersing arrangement (e.g., a mesh) disposed at the upstream end of the mixing conduit; an injector coupled to the exhaust conduit and configured to direct reactants into the exhaust conduit towards the mesh; and an annular bypass defined between the mixing conduit and the exhaust conduit for allowing exhaust to bypass the upstream end of the mixing conduit and to enter the mixing conduit downstream of the mesh.

Abstract: An exhaust treatment arrangement includes a mixing assembly disposed between first and second substrates; and an injection mounting location disposed at the mixing assembly. The mixing assembly includes a mixing arrangement configured to direct exhaust flow exiting the first substrate in a swirling configuration, a restricting member defining a restricted passage, and optionally a dispersing member configured to even out the exhaust flow.

Abstract: An exhaust treatment arrangement includes a mixing assembly disposed between first and second substrates; and an injection mounting location disposed at the mixing assembly. The mixing assembly includes a mixing arrangement configured to direct exhaust flow exiting the first substrate in a swirling configuration, a restricting member defining a restricted passage, and optionally a dispersing member configured to even out the exhaust flow.

Abstract: A dosing and mixing arrangement including an exhaust conduit defining a central axis; a mixing conduit positioned within the exhaust conduit; a dispersing arrangement (e.g., a mesh) disposed at the upstream end of the mixing conduit; an injector coupled to the exhaust conduit and configured to direct reactants into the exhaust conduit towards the mesh; and an annular bypass defined between the mixing conduit and the exhaust conduit for allowing exhaust to bypass the upstream end of the mixing conduit and to enter the mixing conduit downstream of the mesh.

Abstract: A dosing and mixing arrangement including an exhaust conduit defining a central axis; a mixing conduit positioned within the exhaust conduit; a dispersing arrangement (e.g., a mesh) disposed at the upstream end of the mixing conduit; an injector coupled to the exhaust conduit and configured to direct reactants into the exhaust conduit towards the mesh; and an annular bypass defined between the mixing conduit and the exhaust conduit for allowing exhaust to bypass the upstream end of the mixing conduit and to enter the mixing conduit downstream of the mesh.

Abstract: A dosing and mixing arrangement including an exhaust conduit defining a central axis; a mixing conduit positioned within the exhaust conduit; a dispersing arrangement (e.g., a mesh) disposed at the upstream end of the mixing conduit; an injector coupled to the exhaust conduit and configured to direct reactants into the exhaust conduit towards the mesh; and an annular bypass defined between the mixing conduit and the exhaust conduit for allowing exhaust to bypass the upstream end of the mixing conduit and to enter the mixing conduit downstream of the mesh.

Abstract: A dosing and mixing arrangement including an exhaust conduit defining a central axis; a mixing conduit positioned within the exhaust conduit; a dispersing arrangement (e.g., a mesh) disposed at the upstream end of the mixing conduit; an injector coupled to the exhaust conduit and configured to direct reactants into the exhaust conduit towards the mesh; and an annular bypass defined between the mixing conduit and the exhaust conduit for allowing exhaust to bypass the upstream end of the mixing conduit and to enter the mixing conduit downstream of the mesh.

Abstract: An exhaust treatment arrangement includes a mixing assembly disposed between first and second substrates; and an injection mounting location disposed at the mixing assembly. The mixing assembly includes a mixing arrangement configured to direct exhaust flow exiting the first substrate in a swirling configuration, a restricting member defining a restricted passage, and optionally a dispersing member configured to even out the exhaust flow.

Abstract: A dosing and mixing arrangement including an exhaust conduit defining a central axis; a mixing conduit positioned within the exhaust conduit; a dispersing arrangement (e.g., a mesh) disposed at the upstream end of the mixing conduit; an injector coupled to the exhaust conduit and configured to direct reactants into the exhaust conduit towards the mesh; and an annular bypass defined between the mixing conduit and the exhaust conduit for allowing exhaust to bypass the upstream end of the mixing conduit and to enter the mixing conduit downstream of the mesh.