Abstract: A system and method of generating radiation are disclosed. In at least some embodiments, the system is suitable for use as (or as part of) an extreme ultraviolet lithography (EUVL) light source. Also, in at least some embodiments, the system includes a laser source for generating a laser pulse, a target including a solid material, and a lens device that assists in directing the laser pulse toward the target. At least a portion of the target becomes a plasma that emits radiation upon being exposed to the laser pulse. The laser pulse has a pulse duration of at least 50 nanoseconds and, in at least some such embodiments, has a pulse duration of at least 100 nanoseconds.