Abstract: A module retainer is provided that can be rotatably attached to a purge module. The module retainer includes one or more engagement features configured to be inserted through openings provided in a substrate container and to engage tabs when rotated following insertion through the openings. The module retainer can be rotatable with respect to the purge module such that rotation between the insertion position and the retention position can be performed without affecting an orientation of the purge module.

Abstract: A method and purge gas assembly for supplying or distributing flow of purge gas into a substrate container is provided. The purge gas assembly includes a gas distributor comprising at least one outlet and a purge module comprising an inlet for receiving a flow of purge gas, a check valve, and an outlet. A combination of the gas distributor and purge module form a chamber. The chamber is configured to supply the purge gas to the at least one outlet of the gas distributor.

Abstract: A coated abrasive article comprising a substrate and a plurality of abrasive particles having an average solidity of at least 0.87 and less than 0.97, wherein each of the abrasive particles of the plurality of abrasive particles comprises a body and striations extending along an exterior surface of the body in a direction of a length of the body. Further directed to a plurality of extruded shaped abrasive particles comprising an average solidity of at least 0.87.

Abstract: A substrate container that includes a shell, a connector, and a gas distributing device. The connector is connected to an opening provided on a side wall of the shell, in which the connector includes a base portion having an inlet and an outlet and a connector body having a first end and a second end. The first end of the connector body is rotatably connected with the outlet of the base portion, and second end of the connector body is connected to the opening of the shell. The gas distributing device connector includes a first end and a second end, in which the first end of the gas distributing device connector is connected with the second end of the connector body and a second end of the gas distributing device connector is configured to connect with a gas distributing device.

Abstract: A method and purge flow distribution module for controlling flow of purge gas into a substrate container is provided. The purge flow distribution module includes a purge module comprising an inlet for receiving a flow of purge gas, a check valve for regulating a flow direction of the purge gas, a filter, and a filter retainer. A diffuser retainer and a diffusion device can be attached to the filter retainer. The purge module can provide a portion of a flow to the diffusion device and a second portion of the flow can leave the purge module. The purge module can be installed into a housing to define a chamber. The chamber can receive the second portion of the flow and direct the second portion of the flow to another diffusion device.

Abstract: A substrate container includes a shell and a door for an opening of the shell. The shell includes one or more first latch sockets and one or more second latch sockets. The door includes a first locking mechanism that includes a first latch with first latch tip insertable into the one or more first latch sockets and a second latch with a second latch tip extendable into the second latch sockets. A width of the one or more first latch sockets blocks the second latch tip from being inserted into the one or more first latch sockets. A door for a substrate container includes a door housing and a first locking mechanism disposed in the door housing. A method of closing a substrate container includes inserting a door into an opening of the substrate container and adjusting a first locking mechanism of the door.

Abstract: Brackets are provided on an interior of a substrate container to receive and retain a diffusion device. The brackets include an receiver having a first internal cross-sectional area and a retention region having a second internal cross-sectional area, with the first internal cross-sectional area being larger than the second internal cross-sectional area. The bracket can include a second receiver on an opposite end of the bracket from the first receiver, such that the bracket can be inverted for use on either side of the substrate container. The brackets can receive diffusion devices when the diffusion devices are inserted from an exterior of the substrate container.

Abstract: A method and purge flow distribution module for controlling flow of purge gas into a substrate container is provided. The purge flow distribution module includes a purge module comprising an inlet for receiving a flow of purge gas, a check valve for regulating a flow direction of the purge gas, and an outlet for supplying the purge gas, and a chamber surrounding at least an outlet of the purge module. The chamber includes a first opening for directing a first flow path to at least one rear gas distributing device for distributing a first portion of the purge gas in a rear portion of the substrate container and a second opening for a second flow path to at least one front gas distributing device for distributing a second portion of the purge gas to a front portion of the substrate container.

Abstract: Described are support devices that are useful with substrate containers used to hold or transport substrates in a clean environment, as well as associated systems and methods of using the support devices and substrate containers.

Abstract: Described are wafer containers adapted to store or transport semiconductor wafers in a clean environment, including containers that include a purge gas delivery device, as well as methods for purging the environment within the container.

Abstract: Purge diffusers for use in systems for transporting substrates include: i) a purge diffuser core having an internal purge gas channel, one or more diffuser ports and an outer surface; ii) filter media secured to the outer surface of the purge diffuser core; and iii) a purge port connector for mounting the purge diffuser to a purge port of a substrate container for transporting substrates. The purge diffuser core may be a unitary article, may be formed by injection molding, and may include diverters internal to the internal purge gas channel.

Abstract: A substrate container includes a container portion having an open side or bottom, and a door to sealingly close the open side or bottom, one of the door and the container portion defining access structure. The substrate container additionally includes a check-valve assembly, the check-valve assembly being retained with respect to the access structure to provide fluid communication with an interior of the substrate container. The check-valve assembly includes a grommet, the grommet being formed of an elastomeric material. A valve seat is disposed within the grommet, the valve seat being integrally formed with the grommet according to one aspect, and being formed of a separate piece according to another aspect. An elastomeric valve member, specifically an elastomeric umbrella valve member according to one aspect, is disposed within the grommet and held to engage the valve seat, thereby restricting fluid flow through the check-valve assembly with respect to the interior of the substrate container.

Abstract: A container includes a deflector, disposed in an interior of a substrate container, having a longitudinal opening and a deflection surface and a gas distributor configured to provide a purging gas to purge an interior of a substrate container. The gas distributor is configured such that at least a portion of the purging gas flows into a gap formed between the gas distributor and the deflector. The deflector is configured such that at least a portion of the purging gas in the gap flows through the longitudinal opening. The deflector directs a gas flow pattern of the purging gas from the gas distributor to an outlet of the substrate container to improve purging efficacy of the substrate container.

Abstract: A substrate container includes a shell defining an interior space and a purge flow distribution system. The shell includes a front opening, a bottom wall, and a rear wall. The purge flow distribution system receives a stream of purge gas and includes an inlet and a network of separate gas distributing devices configured to distribute the stream of purge gas into the interior space. A supply line is also included that is connected to the inlet and configured to divide the supply of purge gas to the network of separate gas distributing devices. A method of purging an open substrate container includes supplying a stream of purge gas to an inlet of a purge flow distribution system and dividing the purge gas to supply a network of separate gas distributing devices to distribute the stream of purge gas into the interior space.

Abstract: A system is provided. The system includes a substrate container having at least two purge modules. Each purge module of the at least two purge modules includes a flow control device. The flow control device of each purge module is configured to be actuated for egress of a purge fluid. A method of actuating flow control devices of purge modules of a substrate container is provided. The method includes starting a purge process of the substrate container; streaming a purge fluid into an interior of the substrate container, the substrate container having at least two purge modules, each purge module of the at least two purge modules including a flow control device, the flow control device of each purge module being configured to be actuated for egress of the purge fluid; and actuating the flow control device for egress of the purge fluid.

Abstract: Methods of installing a purge fluid conditioning element into an interior space of a semiconductor substrate carrying container are described. The purge fluid conditioning element is installed from outside the semiconductor substrate carrying container through a port formed in one of the walls of the container, where the port is sized to permit the purge fluid conditioning element to be inserted into the interior space of the container by installing the purge fluid conditioning element through the port. The wall may be a bottom wall of the container or another wall of the container. The described methods eliminate the need to install the purge fluid conditioning element from the inside of the container which can cause human contamination of the interior environment of the container.

Abstract: Purge diffusers for use in systems for transporting substrates include: i) a purge diffuser core having an internal purge gas channel, one or more diffuser ports and an outer surface; ii) filter media secured to the outer surface of the purge diffuser core; and iii) a purge port connector for mounting the purge diffuser to a purge port of a substrate container for transporting substrates. The purge diffuser core may be a unitary article, may be formed by injection molding, and may include diverters internal to the internal purge gas channel.

Abstract: A substrate container includes a shell defining an interior space and a purge flow distribution system. The shell includes a front opening, a bottom wall, and a rear wall. The purge flow distribution system receives a stream of purge gas and includes an inlet and a network of separate gas distributing devices configured to distribute the stream of purge gas into the interior space. A supply line is also included that is connected to the inlet and configured to divide the supply of purge gas to the network of separate gas distributing devices. A method of purging an open substrate container includes supplying a stream of purge gas to an inlet of a purge flow distribution system and dividing the purge gas to supply a network of separate gas distributing devices to distribute the stream of purge gas into the interior space.

Abstract: Substrate containers include purge flow distribution systems. The purge flow distribution systems can divide one or more input flows of purge gas to a plurality of gas distribution surfaces of a network of gas distribution devices. Methods of controlling purge can include configuring the substrate containers to provide determined purge gas flow rates at each of the gas distribution surfaces. The configuration can be performed using flow controls of the purge flow distribution systems. The purge gas flow rates can be determined based on purge performance parameters. A controller can direct the operation of the purge flow distribution systems. The controller and the substrate container can be combined in a substrate container purging system.

Abstract: Purge diffusers for use in systems for transporting substrates include: i) a purge diffuser core having an internal purge gas channel, one or more diffuser ports and an outer surface; ii) filter media secured to the outer surface of the purge diffuser core; and iii) a purge port connector for mounting the purge diffuser to a purge port of a substrate container for transporting substrates. The purge diffuser core may be a unitary article, may be formed by injection molding, and may include diverters internal to the internal purge gas channel.