Patents by Inventor Mark W. Horn

Mark W. Horn has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20110010221
    Abstract: The present invention comprises a system and methods for managing janitorial, security, lighting, and temporary labor services provided to commercial, industrial, institutional, and retail facilities. The present invention comprises a system and methods for managing facility services though a mobile field inspection system. The mobile field inspection system provides a wireless network that enables a facility manager to supervise the performance of services by other employees at a particular facility. The present invention further comprises a system and methods for performing a series of quality inspections of a facility to ensure that services are performed satisfactorily. Additionally, the present invention provides a constant, proactive communication between the facilities contractor/manager and the customer purchasing the services.
    Type: Application
    Filed: September 21, 2010
    Publication date: January 13, 2011
    Inventor: Mark W. HORN
  • Patent number: 5925494
    Abstract: The invention provides a method for vapor-depositing a polymer film having constituents that are synthesized during the deposition and that can therefore be customized by time-dependent process control during the deposition. In the vapor-deposition process, a hydrocarbon precursor is reacted with an oxygen-containing precursor in a plasma environment. The plasma reaction synthesizes O--H bonds and forms a polymer having O--H bonds, C--C bonds, and C--H.sub.x bonds. Preferably, the hydrocarbon and oxygen-containing precursors are employed in a ratio selected such that the resulting polymer film has a selected level of oxygen constituency providing a corresponding selected ratio of O--H bond concentration to C--H.sub.x bond concentration. The precursor ratio is preferably varied as a function of time during the plasma reaction to result in a corresponding distribution, e.g., a depth-dependent distribution, of O--H bonds in the film.
    Type: Grant
    Filed: February 16, 1996
    Date of Patent: July 20, 1999
    Assignee: Massachusetts Institute of Technology
    Inventor: Mark W. Horn
  • Patent number: 5017403
    Abstract: A planarization process and apparatus which employs plasma-enhanced chemical vapor deposition (PECVD) to form plarnarization films of dielectric or conductive carbonaceous material on step-like substrates.
    Type: Grant
    Filed: April 13, 1989
    Date of Patent: May 21, 1991
    Assignee: Massachusetts Institute of Technology
    Inventors: Stella W. Pang, Mark W. Horn