Abstract: A disinfectant composition useful in shrimp aquaculture and a process for using such a disinfectant, in which there is a composition containing a) 25 to 87 wt. % of KHSO5 containing triple salt b) 1 to 20 wt. % of at least one H2N(CH2)nSO3H compound with n being 0, 1, 2 or 3, c) 1 to 8 wt. % of a surfactant d) 1 to 60 wt. % of a C2-C10 aliphatic dicarboxylic acid, optionally substituted with a hydroxyl and/or carboxylic group and e) 10 to 30 wt. % alkali metal phosphate.

Abstract: A composition containing a) 25 to 87 wt. % of KHSO5 containing triple salt b) 1 to 20 wt. % of at least one H2N(CH2)nSO3H compound with n being 0, 1, 2 or 3, c) 1 to 8 wt. % of a surfactant d) 1 to 60 wt. % of a C2-C10 aliphatic dicarboxylic acid, optionally substituted with a hydroxyl and/or carboxylic group and e) 10 to 30 wt. % alkali metal phosphate.

Abstract: A multi-part kit system comprising (i) a solid part A which comprises 10 to 80 wt. % of peroxy compound selected from the group consisting of KHSO5, K2S2O8, Na2S2O8, magnesium monoperoxyphthalate hexahydrate, sodium percarbonate and sodium perborate, 0.1 to 10 wt. % of LiCl, NaCl and/or KCl and 1 to 20 wt. % of H2N(CH2)nSO3H with n=0, 1, 2 or 3, and (ii) a liquid part B in the form of an aqueous solution which comprises 0 to 20 wt. % of nonionic surfactant, 3.6 to 20 wt. % of amphoteric surfactant and 0.5 to 20 wt. % of at least one compound comprising substituted ammonium selected from the group consisting of dihydrocarbyl dimethylammonium chlorides or bromides, didecyl methyl-poly(oxyethyl) ammonium propionate, chlorhexidine gluconate, cetylpyridinium chloride or bromide, and polyhexamethylene biguanide hydrochloride, wherein at least one of the two hydrocarbyl residues comprises 8 to 18 carbon atoms.

Abstract: A multi-part kit system comprising (i) a solid part A which comprises 10 to 80 wt. % of peroxy compound selected from the group consisting of KHSO5, K2S2O8, Na2S2O8, magnesium monoperoxyphthalate hexahydrate, sodium percarbonate and sodium perborate, 0.1 to 10 wt. % of LiCl, NaCl and/or KCl and 1 to 20 wt. % of H2N(CH2)nSO3H with n=0, 1, 2 or 3, and (ii) a liquid part B in the form of an aqueous solution which comprises 0 to 20 wt. % of nonionic surfactant, 3.6 to 20 wt. % of amphoteric surfactant and 0.5 to 20 wt. % of at least one compound comprising substituted ammonium selected from the group consisting of dihydrocarbyl dimethylammonium chlorides or bromides, didecyl methyl-poly(oxyethyl)ammonium propionate, chlorhexidine gluconate, cetylpyridinium chloride or bromide, and polyhexamethylene biguanide hydrochloride, wherein at least one of the two hydrocarbyl residues comprises 8 to 18 carbon atoms.

Abstract: A multi-part kit system comprising a solid part A which comprises at least one acetyl donor, a liquid part B in the form of an aqueous composition which comprises 3 to 35 wt. % of hydrogen peroxide and one or more parts C, wherein the solid part A and/or the part(s) C comprise at least one surfactant selected from the group consisting of anionic surfactants, amphoteric surfactants and nonionic surfactants, wherein the composition of the parts of the multi-part kit system is such, that directly after being mixed with each other and water in a specified ratio the pH of the mixture is in the range of 5.5 to 8.

Abstract: A multi-part kit system comprising a solid part A which comprises at least one acetyl donor, a liquid part B in the form of an aqueous composition which comprises 3 to 35 wt. % of hydrogen peroxide and one or more parts C, wherein the solid part A and/or the part(s) C comprise at least one surfactant selected from the group consisting of anionic surfactants, amphoteric surfactants and nonionic surfactants, wherein the composition of the parts of the multi-part kit system is such, that directly after being mixed with each other and water in a specified ratio the pH of the mixture is in the range of 5.5 to 8.

Abstract: A process for eliminating bacterial spores on surfaces by contacting the surfaces with an aqueous composition comprising 3 to 30 wt. % of hydrogen peroxide and having a pH value of 6 to 8 for a period of 1 to 60 minutes at a temperature of 0 to 35° C., wherein the process does not comprise any germination step.