Patents by Inventor Mark W. Haley

Mark W. Haley has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 6690083
    Abstract: The present invention is drawn to a method and a system for creating a sub-1V bandgap reference (BGR) circuit. In particular, a sub-1V BGR circuit is formed comprising a shallow trench isolation (STI) region and a poly silicon region above said STI region. The poly silicon region is formed having a first doped region longer than a second doped region. The poly silicon region as one single structure is adapted to function as a resistor and a diode coupled in series, said structure adapted to generate currents in a feedback loop to generate a BGR voltage. In forming the sub-1V BGR circuit, a silicide blocking mask (already available in the process flow for forming a standard semiconductor device) is used to prevent spacer oxide from forming above the center portion of the poly silicon region. In turn, silicide contacts can be formed away from the center portion of the poly silicon region.
    Type: Grant
    Filed: June 1, 2000
    Date of Patent: February 10, 2004
    Assignee: Koninklijke Philips Electronics N.V.
    Inventors: Todd Mitchell, Mark W. Haley
  • Patent number: 6306746
    Abstract: The present invention is directed to a method of forming an insulative layer over a fuse link in a semiconductor device that is sufficiently thick to encapsulate the fuse link during laser opening, thereby preventing vaporized metal from re-depositing on the fuse link. The layer is also sufficiently thin to allow the laser to penetrate the insulative layer during laser opening of the fuse. A primary dielectric layer is formed over a metal fuse link, the primary dielectric having a predetermined deposition thickness over the fuse link. The primary dielectric layer is then covered with an etch interrupting layer. The etch interrupting layer is covered with a secondary dielectric layer and a portion of the secondary dielectric layer is then removed, resulting in an interlayer dielectric (ILD) stack formed from the etch interrupting layer and the remaining secondary dielectric layer. The ILD has a selected thickness that is greater than the thickness of the primary dielectric layer.
    Type: Grant
    Filed: December 30, 1999
    Date of Patent: October 23, 2001
    Assignee: Koninklijke Philips Electronics
    Inventors: Mark W. Haley, Todd Mitchell
  • Patent number: 5953200
    Abstract: An electrostatic chuck device for clamping a semiconductor wafer substrate during processing of the semiconductor wafer includes a power source, at least one negative pole, and a plurality of positive poles. Each positive pole selected from the plurality of positive poles is electrically separated from the negative pole. Also provided is a plurality of fuses, each fuse of the plurality of fuses is coupled to an associated positive pole included in the plurality of positive poles. Each fuse is further coupled to the power source. In some embodiments, each positive pole is electrically separated from the negative pole by an insulating epoxy. In other embodiments, the plurality of positive poles are connected to each other in parallel.
    Type: Grant
    Filed: February 5, 1998
    Date of Patent: September 14, 1999
    Assignee: VLSI Technology, Inc.
    Inventors: Mark W. Haley, Albert H. Liu
  • Patent number: 5917327
    Abstract: A testing apparatus including a testing plate can be used to test an electrostatic wafer chuck. A DC potential is supplied so as to produce an electrostatic force. A mechanical force is supplied to the testing plate in order to give an indication of the produced electrostatic force. By examining the DC potential and the produced electrostatic force, an electrostatic wafer chuck can be qualified or rejected before being placed into a wafer processing machine. This reduces the possibility of damage to the wafer or the wafer processing machine.
    Type: Grant
    Filed: September 8, 1997
    Date of Patent: June 29, 1999
    Assignee: VLSI Technology, Inc.
    Inventors: Mark W. Haley, Delbert H. Parks
  • Patent number: 5600236
    Abstract: A converter and digital channel selector device is provided which is interconnected between a source measurement unit having a plurality of output terminal connectors and a probe station having a plurality of input probe terminal connectors. The channel selector device is used to selectively connect each one of the plurality of output terminals of the source measurement unit to corresponding one of the plurality of input probe terminal connectors, respectively. The channel selector device includes a converter for generating a plurality of digital control signals and a digital channel select logic circuit which is responsive to the digital control signals for selectively connecting respective ones of a plurality of its input channel connectors connected to the plurality of output terminal connectors to any one of a plurality of its output channel connectors connected to the plurality of input probe terminal connectors.
    Type: Grant
    Filed: November 1, 1994
    Date of Patent: February 4, 1997
    Assignee: VLAI Technology, Inc.
    Inventors: Mark W. Haley, Eric A. Sparks