Patents by Inventor Mark Wihl

Mark Wihl has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Methods for detecting and classifying defects on a reticle
    Patent number: 7738093
    Abstract: Methods for detecting and classifying defects on a reticle are provided. One method includes acquiring images of the reticle at first and second conditions during inspection of the reticle. The first condition is different than the second condition. The method also includes detecting the defects on the reticle using one or more of the images acquired at the first condition. In addition, the method includes classifying an importance of the defects detected on the reticle using one or more of the images acquired at the second condition. The detecting and classifying steps are performed substantially simultaneously during the inspection.
    Type: Grant
    Filed: May 6, 2008
    Date of Patent: June 15, 2010
    Assignee: KLA-Tencor Corp.
    Inventors: David Alles, Mark Wihl, Stan Stokowski, Yalin Xiong, Damon Kvamme
  • METHODS FOR DETECTING AND CLASSIFYING DEFECTS ON A RETICLE
    Publication number: 20080304056
    Abstract: Methods for detecting and classifying defects on a reticle are provided. One method includes acquiring images of the reticle at first and second conditions during inspection of the reticle. The first condition is different than the second condition. The method also includes detecting the defects on the reticle using one or more of the images acquired at the first condition. In addition, the method includes classifying an importance of the defects detected on the reticle using one or more of the images acquired at the second condition. The detecting and classifying steps are performed substantially simultaneously during the inspection.
    Type: Application
    Filed: May 6, 2008
    Publication date: December 11, 2008
    Inventors: David Alles, Mark Wihl, Stan Stokowski, Yalin Xiong, Damon Kvamme