Patents by Inventor Markku E. Jaaskelainen

Markku E. Jaaskelainen has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Machine vision method and system for the inspection of a material
    Patent number: 6765224
    Abstract: A machine vision method and system for inspecting a material. The system comprises a light source arranged to illuminate the material and an imaging device configured to acquire image data corresponding to at least one characteristic of the material while the material is being illuminated by the light source. An image processor is configured to normalize the image data and to control adjustment of an exposure control level for the imaging device based upon the normalized image data. An exemplary method of implementing the machine vision system may include illuminating a material using a light source and obtaining image data corresponding to the material using an imaging device. The image data may be normalized and the adjustment of an exposure control level of the imaging device may be controlled based on the normalized image data.
    Type: Grant
    Filed: January 14, 2003
    Date of Patent: July 20, 2004
    Assignee: Cognex Corporation
    Inventors: Patrice Favreau, Jeffrey Wolinsky, Markku E. Jaaskelainen
  • Machine vision method for the inspection of a material for defects
    Patent number: 6531707
    Abstract: A machine vision method and system for inspecting a material. The system comprises a light source arranged to illuminate the material and an imaging device configured to acquire image data corresponding to at least one characteristic of the material while the material is being illuminated by the light source. An image processor is configured to normalize the image data and to control adjustment of an exposure control level for the imaging device based upon the normalized image data. An exemplary method of implementing the machine vision system may include illuminating a material using a light source and obtaining image data corresponding to the material using an imaging device. The image data may be normalized and the adjustment of an exposure control level of the imaging device may be controlled based on the normalized image data.
    Type: Grant
    Filed: April 27, 2001
    Date of Patent: March 11, 2003
    Assignee: Cognex Corporation
    Inventors: Patrice Favreau, Jeffrey Wolinsky, Markku E. Jaaskelainen