Patents by Inventor Markus Antonius Eurlings

Markus Antonius Eurlings has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Lithographic apparatus and device manufacturing method
    Publication number: 20070195305
    Abstract: A lithographic projection system has an illumination system with a polarization member. A plurality of directing elements reflect different sub-beams of an incident beam into adjustable, individually controllable directions. By means of re-directing optics any desired polarized spatial intensity distribution of the beam can be produced in its cross-sectional plane.
    Type: Application
    Filed: February 23, 2006
    Publication date: August 23, 2007
    Applicant: ASML NETHERLANDS B.V.
    Inventors: Heine Mulder, Markus Antonius Eurlings
  • Method and apparatus for performing model-based layout conversion for use with dipole illumination
    Publication number: 20070042277
    Abstract: A method of generating complementary masks for use in a multiple-exposure lithographic imaging process.
    Type: Application
    Filed: October 27, 2006
    Publication date: February 22, 2007
    Applicant: ASML Masktools B.V.
    Inventors: Duan-Fu Hsu, Kurt Wampler, Markus Antonius Eurlings, Jang Chen, Noel Corcoran