Abstract: A method for repairing at least one defect of a lithographic mask comprises the step of: ascertaining parameters of at least one repair shape for the at least one defect, wherein ascertaining parameters comprises: allocating at least one numerical value to a parameter, wherein the numerical value deviates from the numerical value predefined by the at least one defect for said parameter.

Abstract: A method for setting at least one side wall angle of at least one pattern element of a photolithographic mask including the steps of: (a) providing at least one precursor gas; (b) providing at least one massive particle beam which induces a local chemical reaction of the at least one precursor gas; and (c) altering at least one parameter of the particle beam and/or a process parameter during the local chemical reaction in order to set the at least one side wall angle of the at least one pattern element.

Abstract: A lighting device for a motor vehicle including a processing module which is configured to receive and process signals of a data bus of the motor vehicle and send a data signal. The lighting device also includes an LED unit configured to emit light, when operational, with an adjustable brightness and a predefined color location. The LED unit has a microcontroller and a plurality of LEDs, and the microcontroller and the plurality of LEDs are surrounded by a housing of the LED unit. Furthermore, the processing module is configured to convert the data signal, which contains control information for the LED unit, into a pulse width-modulated signal of the current supplied to the individual LEDs and to verify whether the pulse width-modulated signal contains information corresponding to the control information for the LED unit.

Abstract: A method for checking a lithography mask for a repair of the lithography mask, the lithography mask having a plurality of edges between partial regions of the lithography mask and the object of the repair lying in an adjustment of a profile of a selected edge in a repair portion of the selected edge, comprises: a) capturing an image representation of a repair region of the lithography mask comprising the repair portion of the selected edge, b) determining the profile of the selected edge in the repair portion on the basis of the captured image representation of the repair region, b1) determining a reference profile on the basis of a profile of an edge corresponding to the selected edge, the corresponding edge being an edge which should not be repaired or a portion of the selected edge which should not be repaired, the corresponding edge being determined on the basis of the captured image representation of the repair region, and c) comparing the determined profile of the selected edge with a reference profi

Abstract: A method of processing a ferrule end face using at least one grinding wheel rotatable about a central axis and having a working surface with an abrasive element is provided. The method includes holding the ferrule stationary, engaging the end face of the ferrule and the working surface of the at least one grinding wheel, rotating the at least one grinding wheel about the central axis, and moving the at least one grinding wheel relative to the ferrule along a curve perpendicular to the central axis. Processing the ferrule in this manner imparts a convex shape of the end face of the ferrule. An apparatus for carrying out the method is also disclosed.

Abstract: A bipolar HF instrument includes a jaws part, a first instrument branch, and a second instrument branch for grasping tissue. The jaws part, first instrument branch and second instrument branch move away from one another during opening and towards one another during closing. A blade actuating element moves a mechanical blade in the jaws part to cut tissue, and/or an HF activation element activates an HF current supply for sealing tissue. The blade actuation element and/or the HF activation element is/are operable simultaneously in each case from two opposite sides of the HF instrument.

Abstract: A pitch angle blocking device for blocking the pitch angle of a multi-blade rotor that has neighboring first and second rotor blades in circumferential direction that extend from a rotor hub of a rotary-wing aircraft In non-operational mode of the rotary-wing aircraft. The present embodiments further relate to a multi-blade rotor of a rotary-wing aircraft that is adapted to receiving such a pitch angle blocking device, and to a rotary-wing aircraft with such a multi-blade rotor. The pitch angle blocking device comprises first and second attachment means that are configured to be non-rotatably and releasably attached to the first and second rotor blades spaced apart from the rotor hub, and a connecting device that non-rotatably connects the first attachment means with the second attachment means.

Abstract: The disclosure relates to a method for separating material to be separated in a centrifugal force separator (CFS), wherein a separating medium is introduced into the CFS in such a way that a vortex with an air core is generated inside the CFS, wherein the material to be separated is introduced into the CFS via at least one forced conveying device. Furthermore, the disclosure relates to an apparatus for carrying out said method, comprising a CFS having an inlet for the material to be separated for introducing material to be separated and a separating medium inlet for introducing a separating medium, wherein the apparatus comprises at least one forced conveying device connected to the inlet for the material to be separated.

Abstract: A cylinder of an internal combustion engine, having a cylinder liner and a cylinder piston guided in the cylinder liner The cylinder piston has multiple ring grooves delimited by ring webs and are separated by the ring webs. Each ring grooves receives a compression ring or an oil scraping ring. Each ring groove is delimited by an upper groove flank, a lower groove flank and a groove base, and each piston ring has a lower ring flank, an upper ring flank a ring back and a section which rests against a radially inner running surface of the cylinder liner. A depression is introduced into the lower groove flank of the at least one ring groove or each ring groove which receives a compression ring and/or into the lower ring flank of the piston ring designed as a compression ring.

Abstract: The present invention relates to a method for examining a beam of charged particles, including the following steps: producing persistent interactions of the beam with a sample at a plurality of positions of the sample relative to the beam and deriving at least one property of the beam by analyzing the spatial distribution of the persistent interactions at the plurality of positions.

Abstract: The present invention relates to a method for examining a measuring tip of a scanning probe microscope, wherein the method includes the following steps: (a) generating at least one test structure before a sample is analyzed, or after said sample has been analyzed, by the measuring tip; and (b) examining the measuring tip with the aid of the at least one generated test structure.

Abstract: Method for the particle beam-induced etching of a lithography mask, more particularly a non-transmissive EUV lithography mask, having the steps of: a) providing the lithography mask in a process atmosphere, b) beaming a focused particle beam onto a target position on the lithography mask, c) supplying at least one first gaseous component to the target position in the process atmosphere, where the first gaseous component can be converted by activation into a reactive form, where the reactive form reacts with a material of the lithography mask to form a volatile compound, and d) supplying at least one second gaseous component to the target position in the process atmosphere, where the second gaseous component under predetermined process conditions with exposure to the particle beam forms a deposit comprising a compound of silicon with oxygen, nitrogen and/or carbon.

Abstract: The present invention relates to a method for repairing at least one defect of a lithographic mask, the method comprising the step of: ascertaining parameters of at least one repair shape for the at least one defect, wherein ascertaining parameters comprises: allocating at least one numerical value to a parameter, wherein the numerical value deviates from the numerical value predefined by the at least one defect for said parameter.

Abstract: The present invention relates to a method for setting at least one side wall angle of at least one pattern element of a photolithographic mask including the steps of: (a) providing at least one precursor gas; (b) providing at least one massive particle beam which induces a local chemical reaction of the at least one precursor gas; and (c) altering at least one parameter of the particle beam and/or a process parameter during the local chemical reaction in order to set the at least one side wall angle of the at least one pattern element.

Abstract: The polymer film serves for the embedding of a medical technology product to be implanted in a human organism. The polymer film includes a polymer of natural origin being biodegradable and absorbable by the human body. The polymer film has a polymer content. The polymer film further includes two antimicrobial active ingredients having a different mechanism of action and the polymer film has a total active-ingredient content. The ratio of the total active-ingredient content to the polymer content is at least 15%. The polymer content is greater than the total active-ingredient content. The polymer film is bendable and modulable and uninterrupted. The polymer forms a polymer matrix in which the antimicrobial active ingredients are embedded in a homogeneously distributed manner. The polymer film has, for each of the antimicrobial active ingredients, an individual active-ingredient content deviating from one another by at most 20%.

Abstract: The disclosure provides a method that includes filling a cavity in a substrate with a second material, wherein the substrate includes a first material. The method also includes using galvanic and/or chemical deposition of a third material to apply an overcoating to a first surface of the substrate in a region of the cavity. The method further includes removing the second material from the cavity. In addition, the method includes, before or after removing the second material from the cavity, applying a reflective layer to the overcoating. The disclosure also provides related optical articles and systems.

Abstract: A pitch angle blocking device for blocking the pitch angle of a multi-blade rotor that has neighboring first and second rotor blades in circumferential direction that extend from a rotor hub of a rotary-wing aircraft In non-operational mode of the rotary-wing aircraft. The present embodiments further relate to a multi-blade rotor of a rotary-wing aircraft that is adapted to receiving such a pitch angle blocking device, and to a rotary-wing aircraft with such a multi-blade rotor. The pitch angle blocking device comprises first and second attachment means that are configured to be non-rotatably and releasably attached to the first and second rotor blades spaced apart from the rotor hub, and a connecting device that non-rotatably connects the first attachment means with the second attachment means.

Abstract: The present application relates to a method and an apparatus for determining a wavefront of a massive particle beam, including the steps of: (a) recording two or more images of a reference structure using the massive particle beam under different recording conditions; (b) generating point spread functions for the two or more recorded images with a modified reference image of the reference structure; and (c) performing a phase reconstruction of the massive particle beam on the basis of the generated point spread functions and the different recording conditions, for the purposes of determining the wavefront.

Abstract: The present invention relates to a method for examining a measuring tip of a scanning probe microscope, wherein the method includes the following steps: (a) generating at least one test structure before a sample is analyzed, or after said sample has been analyzed, by the measuring tip; and (b) examining the measuring tip with the aid of the at least one generated test structure.

Abstract: A lighting device for a motor vehicle including a processing module which is configured to receive and process signals of a data bus of the motor vehicle and send a data signal. The lighting device also includes an LED unit configured to emit light, when operational, with an adjustable brightness and a predefined color location. The LED unit has a microcontroller and a plurality of LEDs, and the microcontroller and the plurality of LEDs are surrounded by a housing of the LED unit. Furthermore, the processing module is configured to convert the data signal, which contains control information for the LED unit, into a pulse width-modulated signal of the current supplied to the individual LEDs and to verify whether the pulse width-modulated signal contains information corresponding to the control information for the LED unit.