Abstract: A photomask mask assembly includes a reflective photomask and a protection structure. The reflective photomask includes a substrate and a reflective multilayer on a first substrate surface of the substrate at a front side of the reflective photomask. The protection structure is on a second substrate surface of the substrate at a backside of the reflective photomask, and is detachable from the reflective photomask at a temperature below 150 degree Celsius.

Abstract: A photomask mask assembly includes a reflective photomask and a protection structure. The reflective photomask includes a substrate and a reflective multilayer on a first substrate surface of the substrate at a front side of the reflective photomask. The protection structure is on a second substrate surface of the substrate at a backside of the reflective photomask, and is detachable from the reflective photomask at a temperature below 150 degree Celsius.

Abstract: A method and sensor array for identification of an analyte is disclosed. The method comprises preparing a plurality of solutions at a plurality of pH values of at least one fluorescent poly(para-phenyleneethynylene) and its complex(es), exposing the complex analyte to the plurality of the solutions and measuring the fluorescence intensity of the exposed complex analyte. The fluorescence intensity is compared with a library and the complex analyte identified from the comparison.

Abstract: A reflective photomask includes a substrate with a substrate layer of a low thermal expansion material. The substrate layer includes a main portion of a first structural configuration and an auxiliary portion of a second structural configuration of the low thermal expansion material. The auxiliary portion is formed in a frame section surrounding a pattern section of the substrate. A multilayer mirror is formed on a first surface of the substrate. A reflectivity of the multilayer mirror is at least 50% at an exposure wavelength below 15 nm. A frame trench extending through the multilayer mirror exposes the substrate in the frame section. The auxiliary portion may include scatter centers for out-of-band radiation.

Abstract: A reflective photomask includes a substrate with a substrate layer of a low thermal expansion material. The substrate layer includes a main portion of a first structural configuration and an auxiliary portion of a second structural configuration of the low thermal expansion material. The auxiliary portion is formed in a frame section surrounding a pattern section of the substrate. A multilayer mirror is formed on a first surface of the substrate. A reflectivity of the multilayer mirror is at least 50% at an exposure wavelength below 15 nm. A frame trench extending through the multilayer mirror exposes the substrate in the frame section. The auxiliary portion may include scatter centres for out-of-band radiation.

Abstract: A method of manufacturing a photomask includes forming a mask pattern with a critical mask feature on a photomask. Shape information which is descriptive for an outline of the critical mask feature is obtained from the photomask. The shape information contains position information identifying the positions of landmarks on the outline relative to each other. The landmarks may indicate local curvature extrema, points of inflexion, sharp bends in the curvature and/or local curvature-change maxima in the outline of the mask feature, respectively. The shape information may enable a shape metrology which is not completely based on rectangular approximations of mask features.

Abstract: A method of manufacturing a photomask includes forming a mask pattern with a critical mask feature on a photomask. Shape information which is descriptive for an outline of the critical mask feature is obtained from the photomask. The shape information contains position information identifying the positions of landmarks on the outline relative to each other. The landmarks may indicate local curvature extrema, points of inflexion, sharp bends in the curvature and/or local curvature-change maxima in the outline of the mask feature, respectively. The shape information may enable a shape metrology which is not completely based on rectangular approximations of mask features.

Abstract: A method of manufacturing an integrated circuit provides a metrology mark (e.g., alignment mark or overlay mark). The method includes forming a first plurality of first structures arranged in a matrix in a substrate. Portions of the matrix are covered with a mask such that first portions of the matrix are left exposed and second portions of the matrix are covered. Signal response properties of exposed ones of the first structures in the matrix are altered to form a metrology mark. The metrology mark includes first and second mark portions with different signal response properties and which are aligned to a virtual grid. The evaluation of precisely positioned metrology marks may be improved with low impact on process complexity.

Abstract: Methods and compositions for prophylaxis and/or treatment of diseases of the eye of a patient resulting angiogenesis in the eye using antagonists of the integrin receptors ?v ?3 and/or ?v ?5. The compositions can be nanoparticles and are administered to the eye by injection into the sclera of the eye.

Abstract: Methods for the treatment of a disease of the eye of a patient comprising injecting into the vitreous body of the eye a composition comprising a therapeutically effective amount of an ?v?3 and/or ?v?5 inhibitor sufficient to inhibit angiogenesis and inhibit neovascularization in the treated eye. The ?v?3 and/or ?v?5 inhibitor being a compound of formula II: as defined herein or a physiologically acceptable salt thereof.

Abstract: A lithography apparatus includes a condenser system and a projection system. The condenser system is configured to irradiate a mask with non-telecentric incident radiation. The projection system is configured to collect and focus a radiation diffracted at an absorber pattern on the mask to a sample. The projection system is further configured to compensate, in the diffracted radiation, a phase and/or intensity variation resulting from the diffraction of the non-telecentric incident radiation, wherein the diffraction results from an absorber pattern provided on the mask.

Abstract: Methods and compositions for prophylaxis and/or treatment of diseases of the eye using antagonists of the integin receptors ?v?3 and/or ?v?5. The compositions can be nanoparticles and are administered to the eye by injection into the vitreous body of the eye.

Abstract: Methods and compositions for prophylaxis and/or treatment of diseases of the eye of a patient resulting angiogenesis in the eye using antagonists of the integrin receptors ?v?3 and/or ?v?5. The compositions can be nanoparticles and are administered to the eye by injection into the sclera of the eye.

Abstract: Methods and compositions for prophylaxis and/or treatment of diseases of the eye using antagonists of the integin receptors &agr;v&bgr;3 and/or &agr;v62 5. The compositions can be nanoparticles and are administered to the eye by injection into the vitreous body of the eye.

Abstract: Methods and compositions for prophylaxis and/or treatment of diseases of the eye of a patient resulting angiogenesis in the eye using antagonists of the integrin receptors &agr;v&bgr;3 and/or &agr;v&bgr;5. The compositions can be nanoparticles and are administered to the eye by injection into the sclera of the eye.

Abstract: The present invention relates to an NHE-1 selective Na+/H+ antiporter inhibitor N-(4,5-bismethanesulfonyl-2-methylbenzoyl)guanidine, hydrochloride, to its hydrochloride hydrate, and to a process for the preparation.