Patents by Inventor Markus Brotsack
Markus Brotsack has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Patent number: 8792082Abstract: An illumination system for a microlithography projection exposure apparatus for illuminating an illumination field with the light from an assigned light source includes a pupil shaping unit for receiving light from the assigned light source and for generating a predeterminable basic light distribution in a pupil plane of the illumination system, and a transmission filter assigned to the pupil shaping unit and having at least one array of individually drivable individual elements for the spatially resolving transmission filtering of the light impinging on the transmission filter in or in proximity to a pupil plane of the illumination system. The transmission filter generates a predetermined correction of the basic light distribution. An illumination system of this type can generate a multiplicity of location-dependent intensity distributions in a pupil plane of the illumination system, and ensure a high transmittance.Type: GrantFiled: January 4, 2011Date of Patent: July 29, 2014Assignee: Carl Zeiss SMT GmbHInventor: Markus Brotsack
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Patent number: 8767181Abstract: In an exposure method for exposing a substrate which is arranged in the area of an image plane of a projection objective as well as in a projection exposure system for performing that method, output radiation directed at the substrate and having an output polarization state is produced. Through variable adjustment of the output polarization state with the aid of at least one polarization manipulation device, the output polarization state can be formed to approach a nominal output polarization state. The polarization manipulation can be performed in a control loop on the basis of polarization-optical measuring data.Type: GrantFiled: November 15, 2010Date of Patent: July 1, 2014Assignee: Carl Zeiss SMT GmbHInventors: Toralf Gruner, Daniel Kraehmer, Michael Totzeck, Johannes Wangler, Markus Brotsack, Nils Dieckmann, Aksel Goehnermeier, Markus Schwab, Damian Fiolka, Markus Zenzinger
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Publication number: 20110096316Abstract: An illumination system for a microlithography projection exposure apparatus for illuminating an illumination field with the light from an assigned light source includes a pupil shaping unit for receiving light from the assigned light source and for generating a predeterminable basic light distribution in a pupil plane of the illumination system, and a transmission filter assigned to the pupil shaping unit and having at least one array of individually drivable individual elements for the spatially resolving transmission filtering of the light impinging on the transmission filter in or in proximity to a pupil plane of the illumination system. The transmission filter generates a predetermined correction of the basic light distribution. An illumination system of this type can generate a multiplicity of location-dependent intensity distributions in a pupil plane of the illumination system, and ensure a high transmittance.Type: ApplicationFiled: January 4, 2011Publication date: April 28, 2011Applicant: CARL ZEISS SMT AGInventor: Markus BROTSACK
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Publication number: 20110069296Abstract: In an exposure method for exposing a substrate which is arranged in the area of an image plane of a projection objective as well as in a projection exposure system for performing that method, output radiation directed at the substrate and having an output polarization state is produced. Through variable adjustment of the output polarization state with the aid of at least one polarization manipulation device, the output polarization state can be formed to approach a nominal output polarization state. The polarization manipulation can be performed in a control loop on the basis of polarization-optical measuring data.Type: ApplicationFiled: November 15, 2010Publication date: March 24, 2011Applicant: CARL ZEISS SMT AGInventors: Toralf GRUNER, Daniel KRAEHMER, Michael TOTZECK, Johannes WANGLER, Markus BROTSACK, Nils DIECKMANN, Aksel GOEHNERMEIER, Markus SCHWAB, Damian FIOLKA, Markus ZENZINGER
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Patent number: 7884922Abstract: An illumination system for a microlithography projection exposure apparatus for illuminating an illumination field with the light from an assigned light source includes a pupil shaping unit for receiving light from the assigned light source and for generating a predeterminable basic light distribution in a pupil plane of the illumination system, and a transmission filter assigned to the pupil shaping unit and having at least one array of individually drivable individual elements for the spatially resolving transmission filtering of the light impinging on the transmission filter in or in proximity to a pupil plane of the illumination system. The transmission filter generates a predetermined correction of the basic light distribution. An illumination system of this type can generate a multiplicity of location-dependent intensity distributions in a pupil plane of the illumination system, and ensure a high transmittance.Type: GrantFiled: September 24, 2007Date of Patent: February 8, 2011Assignee: Carl Zeiss SMT AGInventor: Markus Brotsack
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Patent number: 7847921Abstract: In an exposure method for exposing a substrate which is arranged in the area of an image plane of a projection objective as well as in a projection exposure system for performing that method, output radiation directed at the substrate and having an output polarization state is produced. Through variable adjustment of the output polarization state with the aid of at least one polarization manipulation device, the output polarization state can be formed to approach a nominal output polarization state. The polarization manipulation can be performed in a control loop on the basis of polarization-optical measuring data.Type: GrantFiled: July 22, 2008Date of Patent: December 7, 2010Assignee: Carl Zeiss SMT AGInventors: Toralf Gruner, Daniel Kraehmer, Michael Totzeck, Johannes Wangler, Markus Brotsack, Nils Dieckmann, Aksel Goehnermeier, Markus Schwab, Damian Fiolka, Markus Zenzinger
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Publication number: 20100195077Abstract: An illumination system for a microlithography projection exposure installation is used to illuminate an illumination field with the light from a primary light source (11). The illumination system has a light distribution device (25) which receives light from the primary light source and, from this light, produces a two-dimensional intensity distribution which can be set variably in a pupil-shaping surface (31) of the illumination system. The light distribution device has at least one optical modulation device (20) having a two-dimensional array of individual elements (21) that can be controlled individually in order to change the angular distribution of the light incident on the optical modulation device. The device permits the variable setting of extremely different illuminating modes without replacing optical components.Type: ApplicationFiled: April 12, 2010Publication date: August 5, 2010Applicant: Carl Zeiss SMT AGInventors: Jess KOEHLER, Johannes Wangler, Markus Brotsack, Wolfgang Singer, Damian Fiolka, Manfred Maul
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Patent number: 7714983Abstract: An illumination system for a microlithography projection exposure installation is used to illuminate an illumination field with the light from a primary light source (11). The illumination system has a light distribution device (25) which receives light from the primary light source and, from this light, produces a two-dimensional intensity distribution which can be set variably in a pupil-shaping surface (31) of the illumination system. The light distribution device has at least one optical modulation device (20) having a two-dimensional array of individual elements (21) that can be controlled individually in order to change the angular distribution of the light incident on the optical modulation device. The device permits the variable setting of extremely different illuminating modes without replacing optical components.Type: GrantFiled: September 13, 2004Date of Patent: May 11, 2010Assignee: Carl Zeiss SMT AGInventors: Jess Koehler, Johannes Wangler, Markus Brotsack, Wolfgang Singer, Damian Fiolka, Manfred Maul
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Patent number: 7511886Abstract: An optical beam transformation system has a sequence of optical elements arranged along an optical axis of the optical beam transformation system and designed for transforming an entrance light distribution striking an entrance surface of the optical beam transformation system into an exit light distribution emerging from an exit surface of the optical beam transformation system by radial redistribution of light intensity. The optical elements include a transformation element causing a radial redistribution of light intensity and having a transformation surface inclined to the optical axis and causing a polarization-selective reflection of a light distribution incident on the transformation surface according to an efficiency symmetry characteristic for the transformation surface.Type: GrantFiled: November 14, 2005Date of Patent: March 31, 2009Assignee: Carl Zeiss SMT AGInventors: Joerg Schultz, Markus Deguenther, Markus Brotsack, Gerhard Fuerter, Wolfgang Singer, Manfred Maul, Alexander Kohl, Damian Fiolka
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Publication number: 20090040496Abstract: In an exposure method for exposing a substrate which is arranged in the area of an image plane of a projection objective as well as in a projection exposure system for performing that method, output radiation directed at the substrate and having an output polarization state is produced. Through variable adjustment of the output polarization state with the aid of at least one polarization manipulation device, the output polarization state can be formed to approach a nominal output polarization state. The polarization manipulation can be performed in a control loop on the basis of polarization-optical measuring data.Type: ApplicationFiled: July 22, 2008Publication date: February 12, 2009Applicant: Carl ZeissInventors: Toralf GRUNER, Daniel Kraehmer, Michael Totzeck, Johannes Wangler, Markus Brotsack, Nils Dieckmann, Aksel Goehnermeier, Markus Schwab, Damian Fiolka, Markus Zenzinger
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Publication number: 20080297745Abstract: In a projection objective provided for imaging a pattern arranged in an object plane of the projection objective into an image plane of the projection objective with the aid of an immersion medium arranged between a last optical element of the projection objective in the light path and the image plane, the last optical element has a transparent substrate and a protective layer system that is fitted to the substrate, is provided for contact with the immersion medium and serves for increasing the resistance of the last optical element to degradation caused by the immersion medium.Type: ApplicationFiled: August 6, 2008Publication date: December 4, 2008Inventors: Karl-Stefan WEISSENRIEDER, Alexander HIRNET, Alexander PAZIDIS, Karl-Heinz SCHUSTER, Christoph ZACZEK, Michael LILL, Patrick SCHEIBLE, Guenter SCHEIBLE, Sigrid SCHEIBLE, Harald SCHINK, Markus BROTSACK, Ulrich LOERING, Toralf GRUNER
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Patent number: 7460206Abstract: In a projection objective provided for imaging a pattern arranged in an object plane of the projection objective into an image plane of the projection objective with the aid of an immersion medium arranged between a last optical element of the projection objective in the light path and the image plane, the last optical element has a transparent substrate and a protective layer system that is fitted to the substrate, is provided for contact with the immersion medium and serves for increasing the resistance of the last optical element to degradation caused by the immersion medium.Type: GrantFiled: December 20, 2004Date of Patent: December 2, 2008Assignee: Carl Zeiss SMT AGInventors: Karl-Stefan Weissenrieder, Alexander Hirnet, Alexandra Pazidis, Karl-Heinz Schuster, Christoph Zaczek, Michael Lill, Guenter Scheible, legal representative, Harald Schink, Markus Brotsack, Ulrich Loering, Toralf Gruner, Patrick Scheible
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Publication number: 20080291419Abstract: In a projection objective provided for imaging a pattern arranged in an object plane of the projection objective into an image plane of the projection objective with the aid of an immersion medium arranged between a last optical element of the projection objective in the light path and the image plane, the last optical element has a transparent substrate and a protective layer system that is fitted to the substrate, is provided for contact with the immersion medium and serves for increasing the resistance of the last optical element to degradation caused by the immersion medium.Type: ApplicationFiled: August 6, 2008Publication date: November 27, 2008Inventors: Karl-Stefan Weissenrieder, Alexander Hirnet, Alexandra Pazidis, Karl-Heinz Schuster, Christoph Zaczek, Michael Lill, Patrick Scheible, Guenter Scheible, Harald Schink, Markus Brotsack, Ulrich Loering, Toralf Gruner, Sigrid Scheible
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Publication number: 20080273186Abstract: An illumination system is provided with a light produced by a light source, with an optical axis and with optical elements, in particular for a projection exposure machine in semiconductor lithography, having at least one optical element for producing a pupil distribution of the light beam, and having a homogenizing element for homogenizing the intensity of the light. For an asymmetric pupil distribution at least the optical elements that produce non-rotationally symmetrical light distributions, and/or the homogenizing element are supported rotatably about the optical axis that forms a z-axis of an x-/y-coordinate system, it being possible to set at least one rotational angle a in such a way that the pupil distribution is located on an axis or symmetrically in relation to an axis of an x?-/y?-coordinate system newly formed by the rotational angle a by means of rotating the x-/y-coordinate system by the angle a.Type: ApplicationFiled: January 21, 2006Publication date: November 6, 2008Inventor: Markus Brotsack
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Patent number: 7408616Abstract: In an exposure method for exposing a substrate which is arranged in the area of an image plane of a projection objective as well as in a projection exposure system for performing that method, output radiation directed at the substrate and having an output polarization state is produced. Through variable adjustment of the output polarization state with the aid of at least one polarization manipulation device, the output polarization state can be formed to approach a nominal output polarization state. The polarization manipulation can be performed in a control loop on the basis of polarization-optical measuring data.Type: GrantFiled: September 27, 2004Date of Patent: August 5, 2008Assignee: Carl Zeiss SMT AGInventors: Toralf Gruner, Daniel Kraehmer, Michael Totzeck, Johannes Wangler, Markus Brotsack, Nils Dieckmann, Aksel Goehnermeier, Markus Schwab, Damian Fiolka, Markus Zenzinger
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Publication number: 20080013066Abstract: An illumination system for a microlithography projection exposure apparatus for illuminating an illumination field with the light from an assigned light source includes a pupil shaping unit for receiving light from the assigned light source and for generating a predeterminable basic light distribution in a pupil plane of the illumination system, and a transmission filter assigned to the pupil shaping unit and having at least one array of individually drivable individual elements for the spatially resolving transmission filtering of the light impinging on the transmission filter in or in proximity to a pupil plane of the illumination system. The transmission filter generates a predetermined correction of the basic light distribution. An illumination system of this type can generate a multiplicity of location-dependent intensity distributions in a pupil plane of the illumination system, and ensure a high transmittance.Type: ApplicationFiled: September 24, 2007Publication date: January 17, 2008Applicant: Carl Zeiss SMT AGInventor: Markus BROTSACK
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Publication number: 20070285644Abstract: An illumination system for a microlithographic projection exposure apparatus comprises a masking device and a masking objective which projects the masking device onto an image plane. The illumination system further includes an optical correction element having a surface that is either aspherically shaped or supports diffractive structures that have at least substantially the effect of an aspherical surface. This surface is arranged at least approximately in a field plane which precedes the image plane of the masking objective The aspherically acting surface is designed such that a principal ray distribution generated by the illumination system in the image plane matches a principal ray distribution required by a projection objective.Type: ApplicationFiled: September 13, 2005Publication date: December 13, 2007Applicant: CARL ZEISS SMT AGInventors: Markus Brotsack, Markus Deguenther, Wilhelm Ulrich, Joachim Wietzorrek, Johannes Wangler, Heiko Feldmann, Andreas Zeiler
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Patent number: 7283209Abstract: An illumination system for a microlithography projection exposure apparatus for illuminating an illumination field (65) with the light from an assigned light source (11) comprises a pupil shaping unit (15, 30) for receiving light from the assigned light source (11) and for generating a predeterminable basic light distribution in a pupil plane (31) of the illumination system and a transmission filter (36) assigned to the pupil shaping unit (15, 30) and having at least one array of individually drivable individual elements for the spatially resolving transmission filtering of the light impinging on the transmission filter in or in proximity to a pupil plane (31, 35) of the illumination system, the transmission filter (36) being designed for generating a predeterminable correction of the basic light distribution. An illumination system of this type can generate a multiplicity of location-dependent intensity distributions in a pupil plane of the illumination system, a high transmittance being ensured.Type: GrantFiled: July 7, 2005Date of Patent: October 16, 2007Assignee: Carl Zeiss SMT AGInventor: Markus Brotsack
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Publication number: 20070165202Abstract: An illumination system for a microlithography projection exposure installation is used to illuminate an illumination field with the light from a primary light source (11). The illumination system has a light distribution device (25) which receives light from the primary light source and, from this light, produces a two-dimensional intensity distribution which can be set variably in a pupil-shaping surface (31) of the illumination system. The light distribution device has at least one optical modulation device (20) having a two-dimensional array of individual elements (21) that can be controlled individually in order to change the angular distribution of the light incident on the optical modulation device. The device permits the variable setting of extremely different illuminating modes without replacing optical components.Type: ApplicationFiled: September 13, 2004Publication date: July 19, 2007Inventors: Jess Koehler, Johannes Wangler, Markus Brotsack, Wolfgang Singer, Damian Fiolka, Manfred Maul
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Publication number: 20060146384Abstract: An optical beam transformation system, which can be designed to be utilized in an illuminating system of a microlithograpic projection exposure apparatus, has a sequence of optical elements arranged along an optical axis of the optical beam transformation system and designed for transforming an entrance light distribution striking an entrance surface of the optical beam transformation system into an exit light distribution emerging from an exit surface of the optical beam transformation system by radial redistribution of light intensity. The optical elements include at least one transformation element causing a radial redistribution of light intensity and having at least one transformation surface inclined to the optical axis and causing a polarization-selective reflection of a light distribution incident on the transformation surface according to an efficiency symmetry characteristic for the transformation surface.Type: ApplicationFiled: November 14, 2005Publication date: July 6, 2006Inventors: Joerg Schultz, Markus Deguenther, Markus Brotsack, Gerhard Fuerter, Wolfgang Singer, Manfred Maul, Alexander Kohl, Damian Fiolka