Abstract: In order to test wafers, microchips and the like, electrical and/or electrochemical properties thereof are periodically measured using electrochemical processes and are stored. The test values are compared with each other in order to determine changes in the properties. The method is carried out using an apparatus designed as a measuring cell and including a test chamber which is located between an upper half-cell and a lower half-cell and through which electrolyte is conducted. The test chamber is closed by a cell cover which simultaneously presses a wafer against an O-seal in the direction of the upper half-cell. The opening forming the test chamber in the lower half-cell is closed by an O-seal, an anode disk and an anode cover.

Abstract: A device for metalizing wafers, in particular microchip wafers, in an electrolyte, contains a plurality of holder arrangements. Each holder arrangement has a chamber for the electrolyte which is separate from the electrolyte-receiving chambers in other holder devices, a ring acting as cathode, and an anode system as the anode being associated with each wafer.

Abstract: A device for metalizing wafers, in particular microchip wafers, in an electrolyte, contains a plurality of holder arrangements. Each holder arrangement has a chamber for the electrolyte which is separate from the electrolyte-receiving chambers in other holder devices, a ring acting as cathode, and an anode system as the anode being associated with each wafer.