Patents by Inventor Markus Haiml

Markus Haiml has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20260160594
    Abstract: A method for calibrating a detector device under test includes emitting laser pulses by a first set of laser sources of laser sources in a first time slot and laser pulses by a second set of laser sources of the laser sources in a second time slot different from the first time slot. The first laser pulses and the second laser pulses combine for a first combined laser pulse in the first time slot and a second combined laser pulse in the second time slot. The first and second combined laser pulses are detected by a detector for corresponding first and second electric signals. The laser sources are regrouped into different first and second sets of laser sources through all permutations of the laser sources by keeping the predetermined pulse ratio n/m. Averaged first and second electric signals indicate the response of the device for the predetermined pulse ratio n/m.
    Type: Application
    Filed: November 13, 2025
    Publication date: June 11, 2026
    Applicant: Airbus Defence and Space GmbH
    Inventors: Markus Haiml, André Boeddeker, Michael Kritzler
  • Patent number: 7545494
    Abstract: A method for the ultrasensitive simultaneous measurement of nonlinear optical emission signals in one or two local dimensions wherein excitation light is irradiated in modulated form from at least one light source into an interactive space in which one or several emissions that are nonlinearly correlated with the excitement light can be excited. The light emanating from the interactive spaces is measured using a one or two-dimensional detector array. Measured data is then transmitted to a computer and formatted in a one or two-dimensional data matrix. Further, non-correlated portions of the light emanating from the interactive spaces that are linearly proportionate to the intensity of the excitement light available in the interactive spaces are separated from portions of the light emanating from the interactive spaces which are not linearly proportionate. The invention also relates to an analytical system for carrying out this method.
    Type: Grant
    Filed: July 1, 2003
    Date of Patent: June 9, 2009
    Assignee: Bayer Technology Services GmbH
    Inventors: Markus Haiml, Laurent P. Balet, Gert L. Duveneck, Gerd Marowsky
  • Publication number: 20060291772
    Abstract: The invention relates to a method for the ultrasensitive simultaneous measurement of nonlinear optical emission signals in one or two local dimensions. Said method comprises the following steps: the excitation light is irradiated in a power-modulated or pulse-modulated form from at least one light source into an interactive volume or onto an interactive area or layer (hereafter called interactive spaces) in which one or several emissions that are nonlinearly correlated with the excitement light can be excited; the light emanating from said interactive spaces is measured by means of a one-dimensional or two-dimensional detector array; the measured data is transmitted from said detector array to a computer, and said data is formatted in a one-dimensional or two-dimensional data matrix.
    Type: Application
    Filed: July 1, 2003
    Publication date: December 28, 2006
    Inventors: Markus Haiml, Laurent Balet, Gert Duveneck, Gerd Marowsky
  • Patent number: 6551850
    Abstract: Essentially non-linear optical material characteristics of a semiconductor material grown at low temperatures can be significantly improved by the following measures: Doping with foreign atoms and/or additional thermal annealing. If, for example GaAs grown at 300° C. is doped with Be to a concentration of 3·1019 cm−3, then the response time is reduced from 480 fs (curve 1.1) to 110 fs (curve 3.1), without the absorption modulation being reduced by this or the non-saturable absorption losses being increased. Semiconductor materials, during the production of which at least one of the above measures was implemented, manifest influenceable, in particular short response times as well as simultaneously high absorption modulations and low non-saturable absorption losses. For this reason, they are eminently suitable for non-linear optical applications, such as optical information processing, optical communication or ultrashort laser pulse physics.
    Type: Grant
    Filed: October 27, 2000
    Date of Patent: April 22, 2003
    Assignee: Gigatera AG
    Inventors: Ursula Keller, Uwe Siegner, Markus Haiml