Abstract: An apparatus for stress-reduced mounting of MEMS-based micromirrors on a metallic support structure comprises a plate extending in a main plane of extent and a plurality of compensation elements which are connected to the plate and have connecting elements which extend across the main plane of extent and a plurality of base elements. A respective group with a plurality of connecting elements is connected to a common base element. The apparatus is produced using MEMS technology.

Abstract: An individual mirror of a pupil facet mirror of an illumination optical unit of a projection exposure apparatus is mounted so as to be pivotable about two pivot axes. A ratio of the pivotability of the individual mirror about the two pivot axes is at least 2:1.

Abstract: An actuator for semiconductor lithography comprises an actuator element, a compensation element and a connection element. The actuator element has a first coefficient of thermal expansion and a connection site at its first end for the active adjustment of an optical element along at least one adjustment axis. The compensation element has a second coefficient of thermal expansion. The sign of the second coefficient of thermal expansion corresponds to the sign of the first coefficient of thermal expansion. The compensation element is oriented coaxially in relation to the adjustment axis. The compensation element has a coupling site held stationary in space or stationary in relation to the optical element. The connection element connects the actuator element and the compensation element at positions located remote from the connection site and from the coupling site. A deformation mirror includes a mirror substrate and an actuator.

Abstract: An arrangement (100), a method and a computer program product for system-integrated calibration of facet mirrors (18, 19) of a microlithographic illumination system (20). Beam paths (103) between a radiation source (101) and a radiation detector (102) are created by the facet mirrors (18, 19), with respectively only one pivotable micromirror (18?, 19?) of each facet mirror (18, 19) affecting said beam path. By methodically pivoting one of the micromirrors (18?, 19?) affecting the beam path (10), it is possible, based on the radiation detector (102), to find a specific optimal pivot position, the underlying orientation of the micromirror (18?, 19?) of which can also be calculated geometrically. By comparing the calculated orientation with the orientation ascertained by a tilt sensor on the micromirror (18?, 19?), it is possible to calibrate the tilt sensor or micromirror (18?, 19?) of the facet mirror (18, 19).

Abstract: A method and an apparatus for determining the heating state of an optical element in a microlithographic optical system involves at least one contactless sensor which is based on the reception of electromagnetic radiation from the optical element. The radiation range captured by the sensor is varied for the purposes of ascertaining a temperature distribution in the optical element.

Abstract: A multiple-component composition that can be used for producing a corrosion inhibiting (meth)acrylic hydrogel. The multiple-component composition including at least one water soluble (meth)acrylic compound, at least one free radical initiator, at least one benzoate, and optionally at least one catalyst for free radical formation. A method for producing a hydrogel, to a hydrogel obtainable by the method, to a (meth)acrylic injection material, and to a method for sealing cracks, voids, flaws and cavities in building structures.

Abstract: The disclosure provides a method for determining at least one property of an EUV source in a projection exposure apparatus for semiconductor lithography, wherein the property is determined on the basis of the electromagnetic radiation emanating from the EUV source, and wherein a thermal load for a component of the projection exposure apparatus is determined and the property is deduced on the basis of the thermal load determined.

Abstract: A method and an apparatus for determining the heating state of an optical element in a microlithographic optical system involves at least one contactless sensor which is based on the reception of electromagnetic radiation from the optical element. The radiation range captured by the sensor is varied for the purposes of ascertaining a temperature distribution in the optical element.

Abstract: A single- or multiple-component composition, which forms upon mixing with water a (meth)acrylic hydrogel and which composition including at least one water soluble at room temperature liquid (meth)acrylic compound supported on a solid carrier and/or an aqueous solution of at least one at room temperature solid or liquid (meth)acrylic compound, a free-radical initiator, and optionally a catalyst for the initiator. A method produces a hydrogel. An acrylic injection material. A method seals cracks, voids, flaws and cavities in building structures.

Abstract: A method for producing a tire filled with a (meth)acrylic hydrogel, the method comprises a) providing a mixture comprising at least one water-soluble (meth)acrylic compound, water and an initiator, and b) filling the mixture in a tire in which the mixture polymerizes to form the (meth)acrylic hydrogel. The tire filling material is suitable for producing flat proof tires, enables fast and controlled cure and is insensitive towards dosage errors. Moreover, the tire filling material is environmental friendly and cost effective.

Abstract: A composition for sealing joints, penetrations and other leaks in particular in the construction field, including at least one ethylenically unsaturated, radically polymerizable water-soluble compound, at least one radical initiator, water and at least one corrosion inhibitor including at least one phosphate. The corresponding composition has a corrosion-inhibiting effect with respect to metal.

Abstract: A displacement device for pivoting a mirror element with two degrees of freedom of pivoting includes an electrode structure including actuator electrodes. The actuator electrodes are comb electrodes. All actuator electrodes are arranged in a single plane. The actuator electrodes form a direct drive for pivoting the mirror element.

Abstract: The disclosure provides a method for determining at least one property of an EUV source in a projection exposure apparatus for semiconductor lithography, wherein the property is determined on the basis of the electromagnetic radiation emanating from the EUV source, and wherein a thermal load for a component of the projection exposure apparatus is determined and the property is deduced on the basis of the thermal load determined.

Abstract: A polyether having a functional group that is reactive to isocyanate with at least one polyisocyanate, which has an average isocyanate functionality in the range of 2.4 to 3.5, and at least one vinyl compound, which has a functional group that is reactive to isocyanate, wherein the molar ratio of polyether to vinyl compound lies in the range of 3:1 to 1:3 and the ratio of the sum of the molar quantities of polyether and vinyl compounds to isocyanate groups lies in the range of 1.5:1 to U.5. Corresponding vinylterminated prepolymers have the advantage of low visocity together with good water solubility and therefore can be used advantageously for applications as injection agents.

Abstract: A projection lens of an EUV-lithographic projection exposure system with at least two reflective optical elements each comprising a body and a reflective surface for projecting an object field on a reticle onto an image field on a substrate if the projection lens is exposed with an exposure power of EUV light, wherein the bodies of at least two reflective optical elements comprise a material with a temperature dependent coefficient of thermal expansion which is zero at respective zero cross temperatures, and wherein the absolute value of the difference between the zero cross temperatures is more than 6K.

Abstract: A sensor device for capturing the displacement position of an optical component includes a plurality of stator electrodes and a mechanism or restricting the electric field that is relevant to the measurement of the displacement position to the region of the stator electrodes.

Abstract: The disclosure relates to a device for transmitting electrical signals between a first interface element, arranged at a first structure of a lithography system, and a second interface element, arranged at a second structure of the lithography system. An electrical conductor connects the first interface element and the second interface element. The device has a hollow body which surrounds at least sections of the electrical conductor and which is designed to electromagnetically shield the electrical conductor. A gap is provided in the hollow body or between the hollow body and one of the structures and allows a relative movement of the first structure and the second structure to mechanically decouple the first structure from the second structure.

Abstract: A projection lens of an EUV-lithographic projection exposure system with at least two reflective optical elements each comprising a body and a reflective surface for projecting an object field on a reticle onto an image field on a substrate if the projection lens is exposed with an exposure power of EUV light, wherein the bodies of at least two reflective optical elements comprise a material with a temperature dependent coefficient of thermal expansion which is zero at respective zero cross temperatures, and wherein the absolute value of the difference between the zero cross temperatures is more than 6K.

Abstract: A method for illuminating an object field of a projection exposure apparatus includes providing a subset of first facets to be positioned in park positions, which are each spaced apart from an associated target position, but at most by a maximum distance.

Abstract: The invention is directed to an adhesive composition including at least one rubber component, a solvent, and at least one powdered superabsorber polymer. The invention also relates to a method for bonding a roofing membrane to a substrate using the adhesive composition as a contact adhesive, to fully adhered membrane roofing system, and to the use of adhesive composition for adhering roofing membranes to substrates by contact bonding.