Patents by Inventor Markus HOLZ

Markus HOLZ has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 12164102
    Abstract: A method for generating a mathematical model (MM) for positioning individual mirrors (204, 204?) of a facet mirror (200) in an optical system (500), e.g. in a lithography apparatus (100A, 100B). The method includes: a) providing (S701) target positions (SP) of the individual mirrors (204, 204?) with an adjustment unit (502), b) capturing (S702) actual measurement positions (MI) of the individual mirrors (204, 204?) with a measuring device (508), which is embodied as an interferometer, deflectometer and/or camera, and c) generating (S705) a mathematical model (MM) for positioning the individual mirrors (204, 204?) based on the captured actual measurement positions (MI) and the target positions (SP). In step c), a difference (EA) is formed (S703) between a respective actual measurement position (MI) and a respective target position (SP) and the mathematical model (MM) is generated (S705) based on the difference (EA) formed.
    Type: Grant
    Filed: November 11, 2021
    Date of Patent: December 10, 2024
    Assignee: CARL ZEISS SMT GMBH
    Inventors: Norman Kretzschmar, Ulrich Mueller, Markus Holz
  • Patent number: 11789367
    Abstract: A facet mirror for an illumination optical unit of a projection exposure apparatus has a large number of displaceable individual facets with a facet main body and a reflection surface arranged on it. At least some of the individual facets have a displacement range such that they come into contact with a stop surface in one or more displacement positions.
    Type: Grant
    Filed: March 15, 2022
    Date of Patent: October 17, 2023
    Assignee: Carl Zeiss SMT GmbH
    Inventors: Willi Anderl, Christian Körner, Hubert Holderer, Markus Holz, Manuel Stompe, Stefan Seitz
  • Publication number: 20220206398
    Abstract: A facet mirror for an illumination optical unit of a projection exposure apparatus has a large number of displaceable individual facets with a facet main body and a reflection surface arranged on it. At least some of the individual facets have a displacement range such that they come into contact with a stop surface in one or more displacement positions.
    Type: Application
    Filed: March 15, 2022
    Publication date: June 30, 2022
    Inventors: Willi Anderl, Christian Körner, Hubert Holderer, Markus Holz, Manuel Stompe, Stefan Seitz
  • Patent number: 11370020
    Abstract: The invention relates to a method for producing casting bodies in a levitation melting method in which a batch of an electrically conductive material is brought into the sphere of influence of at least one alternating electromagnetic field by means of a starting material having a plurality of pre-separated batches separated by regions of reduced cross-section so that the batch is kept in a state of levitation. The regions are designed in such a way that separation of the pre-separated batches takes place only during melting in an alternating electromagnetic field. The melt is then cast into casting moulds.
    Type: Grant
    Filed: April 18, 2019
    Date of Patent: June 28, 2022
    Assignee: ALD Vacuum Technologies GMBH
    Inventors: Sergejs Spitans, Henrik Franz, Bjoern Sehring, Markus Holz
  • Publication number: 20220066196
    Abstract: A method for generating a mathematical model (MM) for positioning individual mirrors (204, 204?) of a facet mirror (200) in an optical system (500), e.g. in a lithography apparatus (100A, 100B). The method includes: a) providing (S701) target positions (SP) of the individual mirrors (204, 204?) with an adjustment unit (502), b) capturing (S702) actual measurement positions (MI) of the individual mirrors (204, 204?) with a measuring device (508), which is embodied as an interferometer, deflectometer and/or camera, and c) generating (S705) a mathematical model (MM) for positioning the individual mirrors (204, 204?) based on the captured actual measurement positions (MI) and the target positions (SP). In step c ), a difference (EA) is formed (S703) between a respective actual measurement position (MI) and a respective target position (SP) and the mathematical model (MM) is generated (S705) based on the difference (EA) formed.
    Type: Application
    Filed: November 11, 2021
    Publication date: March 3, 2022
    Inventors: Norman KRETZSCHMAR, Ulrich MUELLER, Markus HOLZ
  • Patent number: 11102850
    Abstract: The invention relates to a levitation melting method and an apparatus for producing casting bodies with tilted induction units. During this method, induction units are employed in which the opposing ferrite poles with the induction coils are not arranged lying in one plane, but tilted at a determined angle to the levitation plane. In this way, an increase in efficiency of the induced magnetic field for melting the batches can be achieved with the induction units. The tilted arrangement increases the portion of the induced magnetic field that effectively contributes to the holding force of the field for levitation of the melt.
    Type: Grant
    Filed: July 9, 2019
    Date of Patent: August 24, 2021
    Assignee: ALD Vacuum Technologies GmbH
    Inventors: Sergejs Spitans, Henrik Franz, Bjoern Sehring, Markus Holz, Andreas Krieger
  • Publication number: 20210251055
    Abstract: The invention relates to a levitation melting method and an apparatus for producing casting bodies with tilted induction units. During this method, induction units are employed in which the opposing ferrite poles with the induction coils are not arranged lying in one plane, but tilted at a determined angle to the levitation plane. In this way, an increase in efficiency of the induced magnetic field for melting the batches can be achieved with the induction units. The tilted arrangement increases the portion of the induced magnetic field that effectively contributes to the holding force of the field for levitation of the melt.
    Type: Application
    Filed: July 9, 2019
    Publication date: August 12, 2021
    Inventors: Sergejs SPITANS, Henrik FRANZ, Bjoern SEHRING, Markus HOLZ, Andreas KRIEGER
  • Patent number: 11048172
    Abstract: The disclosure relates to a method for producing an illumination system for an EUV apparatus in and to an illumination system for an EUV apparatus.
    Type: Grant
    Filed: December 5, 2019
    Date of Patent: June 29, 2021
    Assignee: Carl Zeiss SMT GmbH
    Inventors: Juergen Baier, Daniel Runde, Matthias Manger, Ulrich Mueller, Joerg Lichtenthaeler, André Orthen, Joachim Welker, Markus Holz, Hubert Holderer
  • Publication number: 20210146431
    Abstract: The invention relates to a method for producing casting bodies in a levitation melting method in which a batch of an electrically conductive material is brought into the sphere of influence of at least one alternating electromagnetic field by means of a starting material having a plurality of pre-separated batches separated by regions of reduced cross-section so that the batch is kept in a state of levitation. The regions are designed in such a way that separation of the pre-separated batches takes place only during melting in an alternating electromagnetic field. The melt is then cast into casting moulds.
    Type: Application
    Filed: April 18, 2019
    Publication date: May 20, 2021
    Inventors: Sergejs SPITANS, Henrik FRANZ, Bjoern SEHRING, Markus HOLZ
  • Patent number: 10843259
    Abstract: A method for producing cast items in a casting method, wherein a charge of a conductive material is introduced into the sphere of influence of at least one alternating electromagnetic field, so that the charge is kept in a levitating state. The melt is poured into moulds in order to produce turbine blades, prostheses or turbocharger impellers.
    Type: Grant
    Filed: January 17, 2018
    Date of Patent: November 24, 2020
    Assignee: ALD VACUUM TECHNOLOGIES GMBH
    Inventors: Henrik Franz, Sergejs Spitans, Ulrich Betz, Egon Bauer, Markus Holz
  • Patent number: 10838307
    Abstract: An apparatus, for example a lithography apparatus or a multi-mirror system, includes comprises a radiation source for generating radiation, a plurality of optical components for guiding the radiation in the apparatus, a plurality of actuator/sensor devices for the optical components, and a drive device for driving the actuator/sensor devices.
    Type: Grant
    Filed: July 23, 2019
    Date of Patent: November 17, 2020
    Assignee: Carl Zeiss SMT GmbH
    Inventors: Markus Holz, Ulrich Bihr
  • Patent number: 10678151
    Abstract: A control device for an assembly having a plurality of sensors and/or actuators includes at least one first control unit which is designed to be vacuum-suitable, has a distributor for splitting and/or combining signals and has a converter for converting digital signals into analog signals and/or analog signals into digital signals.
    Type: Grant
    Filed: February 25, 2019
    Date of Patent: June 9, 2020
    Assignee: Carl Zeiss SMT GmbH
    Inventors: Markus Holz, Jan Horn, Klaus Syrowatka
  • Publication number: 20200110340
    Abstract: The disclosure relates to a method for producing an illumination system for an EUV apparatus in and to an illumination system for an EUV apparatus
    Type: Application
    Filed: December 5, 2019
    Publication date: April 9, 2020
    Inventors: Juergen Baier, Daniel Runde, Matthias Manger, Ulrich Mueller, Joerg Lichtenthaeler, André Orthen, Joachim Welker, Markus Holz, Hubert Holderer
  • Patent number: 10514619
    Abstract: The disclosure provides a sensor arrangement for sensing a position of an optical element in a lithography system. The sensor arrangement includes: a first capacitive sensor device having a position-dependent variable first sensor capacitance that can be sensed using a first excitation signal; a second capacitive sensor device having a position-dependent variable second sensor capacitance that can be sensed using a second excitation signal; and a control device configured to produce the first and second excitation signals so that charges present on a parasitic capacitance associable with the first sensor device are at least partially compensated for by charges that are present on a parasitic capacitance associable with the second sensor device via a signal path outside the first and/or the second excitation signal path.
    Type: Grant
    Filed: January 23, 2018
    Date of Patent: December 24, 2019
    Assignee: Carl Zeiss SMT GmbH
    Inventors: Ulrich Bihr, Markus Holz, Jan Horn
  • Patent number: 10514608
    Abstract: The disclosure relates to a method for producing an illumination system for an EUV apparatus in and to an illumination system for an EUV apparatus.
    Type: Grant
    Filed: August 28, 2018
    Date of Patent: December 24, 2019
    Assignee: Carl Zeiss SMT GmbH
    Inventors: Juergen Baier, Daniel Runde, Matthias Manger, Ulrich Mueller, Joerg Lichtenthaeler, André Orthen, Joachim Welker, Markus Holz, Hubert Holderer
  • Publication number: 20190366427
    Abstract: A method for producing cast items in a casting method, wherein a charge of a conductive material is introduced into the sphere of influence of at least one alternating electromagnetic field, so that the charge is kept in a levitating state. The melt is poured into moulds in order to produce turbine blades, prostheses or turbocharger impellers.
    Type: Application
    Filed: January 17, 2018
    Publication date: December 5, 2019
    Inventors: Henrik FRANZ, Sergejs SPITANS, Ulrich BETZ, Egon BAUER, Markus HOLZ
  • Publication number: 20190346772
    Abstract: An apparatus, for example a lithography apparatus or a multi-mirror system, includes comprises a radiation source for generating radiation, a plurality of optical components for guiding the radiation in the apparatus, a plurality of actuator/sensor devices for the optical components, and a drive device for driving the actuator/sensor devices.
    Type: Application
    Filed: July 23, 2019
    Publication date: November 14, 2019
    Inventors: Markus Holz, Ulrich Bihr
  • Publication number: 20190187574
    Abstract: A control device for an assembly having a plurality of sensors and/or actuators includes at least one first control unit which is designed to be vacuum-suitable, has a distributor for splitting and/or combining signals and has a converter for converting digital signals into analog signals and/or analog signals into digital signals.
    Type: Application
    Filed: February 25, 2019
    Publication date: June 20, 2019
    Inventors: Markus Holz, Jan Horn, Klaus Syrowatka
  • Patent number: 10261424
    Abstract: A lithography apparatus includes a radiation source configured to produce radiation having a repetition frequency. The lithography apparatus also includes an optical component configured to guide the radiation within the lithography apparatus. The lithography apparatus further includes an actuator device configured to displace the optical component. In addition, the lithography apparatus includes a measurement device configured to determine a position of the optical component via a measurement signal having a measurement signal frequency. The measurement signal frequency is unequal to the repetition frequency, and the measurement signal frequency is unequal to integer multiples of the repetition frequency.
    Type: Grant
    Filed: December 18, 2017
    Date of Patent: April 16, 2019
    Assignee: Carl Zeiss SMT GmbH
    Inventors: Udo Dinger, Markus Holz, Ulrich Bihr
  • Publication number: 20180373158
    Abstract: The disclosure relates to a method for producing an illumination system for an EUV apparatus in and to an illumination system for an EUV apparatus
    Type: Application
    Filed: August 28, 2018
    Publication date: December 27, 2018
    Inventors: Juergen Baier, Daniel Runde, Matthias Manger, Ulrich Mueller, Joerg Lichtenthaeler, André Orthen, Joachim Welker, Markus Holz, Hubert Holderer