Abstract: A MEMS mirror array module can be used in photolithographic projection exposure apparatuses.

Abstract: An optical system comprises a plurality of actuable optical elements and a plurality of actuator/sensor devices for actuating and/or sensing the optical elements. The optical system has a supply device for providing a supply voltage for a number of electrical loads of the optical system. The supply device has a parallel connection of a plurality N, where N?3, of supply rails with a respective power supply unit. The respective power supply unit of the N supply rails is configured to provide a predetermined power supply unit output power on the output side at a supply node in fault-free operation of the supply device and to provide N N - 1 times the predetermined power supply unit output power at the supply node in faulty operation.

Abstract: A MEMS mirror for a lithography system, comprising: a mirror plate which can be displaced about a tilt angle; a carrier plate for carrying the mirror plate; a base plate; a solid-body joint, coupling the base plate and the carrier plate, for tilting the mirror plate; and a capacitive sensor having a number of electrodes for detecting the tilt angle of the mirror plate. An electrically conductive shield plate for reducing a capacitive coupling between the mirror plate and the electrodes of the capacitive sensor is arranged under the mirror plate.

Abstract: A lithography system comprises: a radiation source for generating radiation having a specific repetition frequency; a mirror which is movable through a tilt angle for guiding the radiation in the lithography system; a measuring device which is designed to measure the tilt angle of the mirror based on a measurement signal having a measurement-signal frequency that is greater than the repetition frequency, in order to provide a time-discrete tilt-angle signal; and an analysis unit which is designed to discard specific signal values of the provided tilt-angle signal on the basis of a signal indicating the points in time at which the radiation impinged on the mirror surface of the mirror in order to provide a corrected time-discrete tilt-angle signal, and in order to determine the position of the mirror based on the corrected time-discrete tilt-angle signal.

Abstract: A lithography apparatus comprises: a radiation source for creating radiation with a specific repetition frequency; and a MEMS mirror which is displaceable through a tilt angle in at least two tilt axes and serves to guide the radiation in the lithography apparatus. The mirror comprises a capacitive sensor comprising electrodes that capture the tilt angle. Four sensor units are provided per tilt axis for capturing a respective measurement signal from the capacitive sensor. A first pair of the sensor units excites the capacitive sensor with a first excitation signal and receives as a response a respective measurement signal. A second pair of the sensor units excites the capacitive sensor with a second excitation signal and receives as a response a respective measurement signal. The first and second excitation signals have opposite polarities. An evaluation unit determines the position of the MEMS mirror using the measurement signals.

Abstract: A system includes a lithography apparatus with a number N of electronics modules for a number of actuator/sensor devices of the lithography apparatus, where N?1. The electronics module comprises a software component with a plurality of software functionalities. The software component is operable in a plurality of different modes of operation, which comprise a default mode and a service mode. A first set of the software functionalities, which is formed as a subset, can be executed in the default mode. A second set of the software functionalities, which is larger than the first set, can be executed in the service mode.

Abstract: An optical system for a lithography system comprises: a number of optical elements for guiding radiation; a support device supporting the optical elements; and a plurality of active and/or passive components. The active and/or passive components are arranged on the support device in at least two different planes. The active and/or passive components are arranged on one side of the support device.

Abstract: A mirror arrangement, for example for a lithography system, comprises: a plurality of mirror elements, for example in the form of MEMS mirror modules, for reflecting radiation; a plurality of carrier elements, each having a head region for accommodating one of the mirror elements; and a mount arrangement comprising insert openings, which are designed to accommodate a respective seat portion of the carrier elements. The plurality of carrier elements are accommodated with the seat portions in the insert openings in the mount arrangement. Each carrier element comprises a channel device for guiding a coolant, which comprises an inlet for the coolant and an outlet for the coolant.

Abstract: An assembly for an optical system having a mirror array having a plurality of mirror elements arranged on a first carrier. The first carrier contains control leads to the mirror elements. A first heat transport path can dissipate heat from the mirror array to a cooling mechanism during the operation of the optical system. At least one second heat transport path dissipates heat from the mirror array to a cooling mechanism during the operation of the optical system. The first heat transport path and the at least one second heat transport path are spatially separated from one another at least in regions. The first heat transport path extends via an interface component. The first heat transport path extends via the first carrier and the interface component from the mirror array to a cooling mechanism surrounding the interface component.

Abstract: An EUV multi-mirror arrangement comprises a multiplicity of mirror units arranged one next to the other in a grid arrangement on a carrier structure. Each mirror unit has a base element and, opposite the base element, an individually tiltable mirror element which has a mirror substrate that carries on a front face facing away from the base element a reflection coating for forming a mirror surface that reflects EUV radiation. Arranged between its base element and the mirror element, each mirror unit includes components of a suspension system for movably mounting the mirror element on the base element, actuators of an actuator system for producing movements of the mirror element in relation to the base element as a reaction to the reception of control signals, and sensors of a sensor system for capturing the position of the mirror elements. The actuator system has piezoelectric actuators. The sensor system has capacitive sensors.

Abstract: A method for generating a mathematical model (MM) for positioning individual mirrors (204, 204?) of a facet mirror (200) in an optical system (500), e.g. in a lithography apparatus (100A, 100B). The method includes: a) providing (S701) target positions (SP) of the individual mirrors (204, 204?) with an adjustment unit (502), b) capturing (S702) actual measurement positions (MI) of the individual mirrors (204, 204?) with a measuring device (508), which is embodied as an interferometer, deflectometer and/or camera, and c) generating (S705) a mathematical model (MM) for positioning the individual mirrors (204, 204?) based on the captured actual measurement positions (MI) and the target positions (SP). In step c), a difference (EA) is formed (S703) between a respective actual measurement position (MI) and a respective target position (SP) and the mathematical model (MM) is generated (S705) based on the difference (EA) formed.

Abstract: A facet mirror for an illumination optical unit of a projection exposure apparatus has a large number of displaceable individual facets with a facet main body and a reflection surface arranged on it. At least some of the individual facets have a displacement range such that they come into contact with a stop surface in one or more displacement positions.

Abstract: A facet mirror for an illumination optical unit of a projection exposure apparatus has a large number of displaceable individual facets with a facet main body and a reflection surface arranged on it. At least some of the individual facets have a displacement range such that they come into contact with a stop surface in one or more displacement positions.

Abstract: The invention relates to a method for producing casting bodies in a levitation melting method in which a batch of an electrically conductive material is brought into the sphere of influence of at least one alternating electromagnetic field by means of a starting material having a plurality of pre-separated batches separated by regions of reduced cross-section so that the batch is kept in a state of levitation. The regions are designed in such a way that separation of the pre-separated batches takes place only during melting in an alternating electromagnetic field. The melt is then cast into casting moulds.

Abstract: A method for generating a mathematical model (MM) for positioning individual mirrors (204, 204?) of a facet mirror (200) in an optical system (500), e.g. in a lithography apparatus (100A, 100B). The method includes: a) providing (S701) target positions (SP) of the individual mirrors (204, 204?) with an adjustment unit (502), b) capturing (S702) actual measurement positions (MI) of the individual mirrors (204, 204?) with a measuring device (508), which is embodied as an interferometer, deflectometer and/or camera, and c) generating (S705) a mathematical model (MM) for positioning the individual mirrors (204, 204?) based on the captured actual measurement positions (MI) and the target positions (SP). In step c ), a difference (EA) is formed (S703) between a respective actual measurement position (MI) and a respective target position (SP) and the mathematical model (MM) is generated (S705) based on the difference (EA) formed.

Abstract: The invention relates to a levitation melting method and an apparatus for producing casting bodies with tilted induction units. During this method, induction units are employed in which the opposing ferrite poles with the induction coils are not arranged lying in one plane, but tilted at a determined angle to the levitation plane. In this way, an increase in efficiency of the induced magnetic field for melting the batches can be achieved with the induction units. The tilted arrangement increases the portion of the induced magnetic field that effectively contributes to the holding force of the field for levitation of the melt.

Abstract: The invention relates to a levitation melting method and an apparatus for producing casting bodies with tilted induction units. During this method, induction units are employed in which the opposing ferrite poles with the induction coils are not arranged lying in one plane, but tilted at a determined angle to the levitation plane. In this way, an increase in efficiency of the induced magnetic field for melting the batches can be achieved with the induction units. The tilted arrangement increases the portion of the induced magnetic field that effectively contributes to the holding force of the field for levitation of the melt.

Abstract: The disclosure relates to a method for producing an illumination system for an EUV apparatus in and to an illumination system for an EUV apparatus.

Abstract: The invention relates to a method for producing casting bodies in a levitation melting method in which a batch of an electrically conductive material is brought into the sphere of influence of at least one alternating electromagnetic field by means of a starting material having a plurality of pre-separated batches separated by regions of reduced cross-section so that the batch is kept in a state of levitation. The regions are designed in such a way that separation of the pre-separated batches takes place only during melting in an alternating electromagnetic field. The melt is then cast into casting moulds.

Abstract: A method for producing cast items in a casting method, wherein a charge of a conductive material is introduced into the sphere of influence of at least one alternating electromagnetic field, so that the charge is kept in a levitating state. The melt is poured into moulds in order to produce turbine blades, prostheses or turbocharger impellers.