Abstract: A filling station for pressurized fluids has a storage container and a dispenser supplied thereby, comprising a high-pressure path and a low-pressure path. The storage container is partitioned into separate sections, which are each connected to the input of a high-pressure pump via a first switching valve and to the output of said high-pressure pump via a second switching valve. The first or second switching valves are connected on their pump sides to the low-pressure path of the dispenser via a third switching valve. The output of the high-pressure pump supplies a high-pressure reservoir via a fourth switching valve, which high-pressure reservoir is connected to the high-pressure path of the dispenser via a fifth switching valve.

Abstract: Coating method for arc coating or arc ion plating coating of substrates in a vacuum chamber in which using an arc evaporator solid material that functions as cathode is evaporated, during arc evaporation the motion of the cathode spot on the solid material surface is accelerated using a magnetic field for avoiding ejection of a large amount of macro-particles or droplets from the solid material surface, negative charged particles resulted from the arc evaporation flow from the cathode to an anode, characterized by the motion of the negative charged particles from the cathode to the anode fundamentally doesn't cause an additional increase of the absolute value of the potential difference between cathode and anode allowing a lower increment of the substrate temperature during coating.

Abstract: The present invention relates to a method for providing power pulses for PVD sputter cathodes which comprise a power consumption component and a cathode element, wherein during a power increase interval for a generator the power on the power consumption component is decreased and then the power on the cathode element is decreased, with changeover being effected such that the power draw from the generator providing the power does not have to be interrupted.

Abstract: The present invention relates to a coating system comprising at least one multi-layered film formed of alternated A- and B-nanolayers deposited one on each other characterized in that the A-nanolayers contain essentially aluminum chromium boron nitride and the B-nanolayers contain essentially aluminum chromium nitride.

Abstract: The present invention relates to a method for the vapor deposition of PVD layer systems by means of sputtering on at least one substrate, wherein the layer system comprises at least a first layer, characterized in that, at least in one step of the method, a HiPIMS method is used with a power density of at least 250 W/Cm2, wherein a pulse length with a duration of at least 5ms is used while a substrate bias is applied to the substrate.

Abstract: The invention relates to a method for supplying power impulses for PVD sputtering cathodes subdivided into partial cathodes. In said method, the power impulse intervals acting on the partial cathodes are selected in such a way as to overlap, thereby dispensing with the need to interrupt the drawing of power supplied by the generator.

Abstract: The present invention relates to a coating system comprising at least one multi-layered film formed of alternated A- and B-nanolayers deposited one on each other characterized in that the A-nanolayers contain essentially aluminium chromium boron nitride and the B-nanolayers contain essentially aluminium chromium nitride.

Abstract: The present invention relates to a multilayer coating system deposited on at least a portion of a solid body surface and containing in the multilayer architecture Al—Cr—B—N individual layers deposited by means of a physical vapor deposition method characterized in that in at least a portion of the overall thickness of the multilayer coating system the Al—Cr—B—N individual layers are combined with Ti—Al—N individual layers, wherein the Al—Cr—B—N and Ti—Al—N individual layers are deposited alternately one on each other, and wherein the thickness of the Al—Cr—B—N individual layers is thicker than the thickness of the Ti—Al—N individual layers, and thereby the residual stress of the multilayer coating system is considerably lower in comparison to the residual stress of the corresponding analogical Al—Cr—B—N monolayer coating.

Abstract: Coating method for arc coating or arc ion plating coating of substrates in a vacuum chamber in which using an arc evaporator solid material that functions as cathode is evaporated, during arc evaporation the motion of the cathode spot on the solid material surface is accelerated using a magnetic field for avoiding ejection of a large amount of macro-particles or droplets from the solid material surface, negative charged particles resulted from the arc evaporation flow from the cathode to an anode, characterized by the motion of the negative charged particles from the cathode to the anode fundamentally doesn't cause an additional increase of the absolute value of the potential difference between cathode and anode allowing a lower increment of the substrate temperature during coating.

Abstract: The present invention relates to a method for providing power pulses for PVD sputter cathodes which comprise a power consumption component and a cathode element, wherein during a power increase interval for a generator the power on the power consumption component is decreased and then the power on the cathode element is decreased, with changeover being effected such that the power draw from the generator providing the power does not have to be interrupted.

Abstract: The present invention relates to a method for the vapor deposition of PVD layer systems by means of sputtering on at least one substrate, wherein the layer system comprises at least a first layer, characterized in that, at least in one step of the method, a HiPIMS method is used with a power density of at least 250 W/Cm2, wherein a pulse length with a duration of at least 5 ms is used while a substrate has is applied to the substrate.

Abstract: The invention relates to a method for using a target for a coating process of metal oxide and/or metal nitride coatings by means of spark evaporation, wherein the target can be operated at a temperature that is higher than the melting point of the metal used in the target, and wherein the target is comprised of a metal whose oxides and/or nitrides are not electrically conducting. The invention further relates to the use of a target for producing metal oxide coatings and/or metal nitride coatings by means of spark evaporation, wherein the target has a matrix comprised of a metal, in which matrix non electrically conducting oxides and/or nitrides of the metal are embedded.

Abstract: The invention relates to a method for supplying power impulses for PVD sputtering cathodes subdivided into partial cathodes. In said method, the power impulse intervals acting on the partial cathodes are selected in such a way as to overlap, thereby dispensing with the need to interrupt the drawing of power supplied by the generator.

Abstract: Method for performing a HIPIMS coating process, whereby a minimal distance 5 between target and substrate is reduced till achieving an essentially maximal bias current at substrate during coating process, and thereby improving considerably coating quality and increasing deposition rate in comparison with conventional HIPIMS coating processes.

Abstract: The present invention relates to an arc deposition source, comprising an electrically conductive ceramic target plate (1), on the back of which a cooling plate (10) is provided, wherein a shield (3) is provided in the central area on the surface to be coated so that the cathode spot of the arc does not reach the central area (6) of the surface during operation of the deposition source.

Abstract: The coating system comprises: at least one layer of type A, a layer of type A substantially consisting of (AlyCr1-y)X, wherein X depicts one of the group consisting of N, CN, BN, NO, CNO, CBN, BNO and CNBO, y describing the stoichiometric composition of the metallic phase fraction; and at least one layer of type B, a layer of type B substantially consisting of (AluCr1-u-v-wSivMew)X, wherein X depicts one of the group consisting of N, CN, BN, NO, CNO, CBN, BNO or CNBO, and wherein Me depicts one of the group consisting of W, Nb, Mo and Ta or a mixture of two or more of the constituents of that group, u, v and w describing the stoichiometric composition of the metallic phase fraction. A thickness ratio of said layer of type A to said layer of type B is higher than 1. The workpiece comprises such a coating system. Through this, an excellent wear-protection is provided, and the coating system and workpieces can be used for a broad range of different applications.

Abstract: The present invention relates to a multilayer coating system deposited on at least a portion of a solid body surface and containing in the multilayer architecture Al—Cr—B—N individual layers deposited by means of a physical vapour deposition method characterized in that in at least a portion of the overall thickness of the multilayer coating system the Al—Cr—B—N individual layers are combined with Ti—Al—N individual layers, wherein the Al—Cr—B—N and Ti—Al—N individual layers are deposited alternately one on each other, and wherein the thickness of the Al—Cr—B—N individual layers is thicker than the thickness of the Ti—Al—N individual layers, and thereby the residual stress of the multilayer coating system is considerably lower in comparison to the residual stress of the corresponding analogical Al—Cr—B—N monolayer coating.

Abstract: A workpiece has a body (3) and a wear-resistant hard coating system (HLo), which system comprises a layer of the following composition: (Al1-a-b-cCraBbZc)X where X is at least one of: N, C, CN, NO, CO, CNO; Z is at least one of: W, Mo, Ta, Cb (Nb). For a, b and c specific ranges of values are valid.

Abstract: A workpiece has a body (3) and a wear-resistant hard coating system (HLo), which system comprises a layer of the following composition: (Al1-a-b-cCraBbZc)X where X is at least one of: N, C, CN, NO, CO, CNO; Z is at least one of: W, Mo, Ta, Cb (Nb). For a, b and c specific ranges of values are valid.

Abstract: A workpiece has a body (3) and a wear-resistant hard coating system (HLo), which system comprises a layer of the following composition: (Al1-a-b-cCraBbZc)X where X is at least one of: N, C, CN, NO, CO, CNO; Z is at least one of: W, Mo, Ta, Cb (Nb). For a, b and c specific ranges of values are valid.