Patents by Inventor Markus Mengel
Markus Mengel has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Patent number: 11609506Abstract: A method for in-situ wave front detection within an inspection system is disclosed. The method includes generating light with a light source and directing the light to a stage-level reflective mask grating structure disposed on a mask stage. The method includes directing light reflected from the stage-level reflective structure to a detector-level mask structure disposed in a plane of a detector and then collecting, with an optical element, light reflected from the detector-level mask structure. The method includes forming a pupil image on the detector and laterally shifting the stage-level reflective mask, with the mask stage, across a grating period of the stage-level reflective mask grating structure to provide phase reconstruction for lateral shearing interferometry. The method includes selectively impinging light reflected from the optical element on the one or more sensors of the detector.Type: GrantFiled: April 18, 2022Date of Patent: March 21, 2023Assignee: KLA CorporationInventor: Markus Mengel
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Publication number: 20220342325Abstract: A method for in-situ wave front detection within an inspection system is disclosed. The method includes generating light with a light source and directing the light to a stage-level reflective mask grating structure disposed on a mask stage. The method includes directing light reflected from the stage-level reflective structure to a detector-level mask structure disposed in a plane of a detector and then collecting, with an optical element, light reflected from the detector-level mask structure. The method includes forming a pupil image on the detector and laterally shifting the stage-level reflective mask, with the mask stage, across a grating period of the stage-level reflective mask grating structure to provide phase reconstruction for lateral shearing interferometry. The method includes selectively impinging light reflected from the optical element on the one or more sensors of the detector.Type: ApplicationFiled: April 18, 2022Publication date: October 27, 2022Inventor: Markus Mengel
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Patent number: 9798249Abstract: The invention relates to a method for compensating at least one defect of an optical system which includes introducing an arrangement of local persistent modifications in at least one optical element of the optical system, which does not have pattern elements on one of its optical surfaces, so that the at least one defect is at least partially compensated.Type: GrantFiled: August 12, 2014Date of Patent: October 24, 2017Assignees: Carl Zeiss SMT GmbH, Carl Zeiss SMS Ltd.Inventors: Vladimir Dmitriev, Ingo Saenger, Frank Schlesener, Markus Mengel, Johannes Ruoff
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Patent number: 9429495Abstract: Methods for measuring the image quality of a projection objective include providing a measuring structure on an image-side of the projection objective, providing an immersion fluid between the projection objective and the measuring structure, directing light through the projection objective and the immersion fluid to the measuring structure while shielding the measuring structure from the immersion fluid, detecting light transmitted by the measuring structure, and determining an image quality of the projection objective based on the detected light.Type: GrantFiled: August 11, 2014Date of Patent: August 30, 2016Assignee: Carl Zeiss SMT GmbHInventors: Markus Mengel, Ulrich Wegmann, Albrecht Ehrmann, Wolfgang Emer, Reiner Clement, Ludo Mathijssen
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Patent number: 9274440Abstract: An arrangement for and a method of characterizing the polarization properties of an optical system, in particular an optical system of a microlithographic projection exposure apparatus. The arrangement includes at least one polarization state generator (130, 230, 330) which sets a defined polarization state of radiation incident on the optical system, and a polarization state detector (140, 240, 340) adapted to measure the exit polarization state of radiation issuing from the optical system, wherein the optical system is designed for a working wavelength of less than 15 nm, and wherein the polarization state generator and/or the polarization state detector are so designed that their polarization-optical action on an incident light beam is substantially constant over an angle spectrum of the light beam of at least 10°.Type: GrantFiled: July 27, 2012Date of Patent: March 1, 2016Assignee: Carl Zeiss SMT GmbHInventors: Uwe Hempelmann, Markus Mengel, Peter Huber
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Patent number: 9034539Abstract: A system for processing a substrate includes a light source to provide light pulses, a stage to support a substrate, optics to focus the light pulses onto the substrate, a scanner to scan the light pulses across the substrate, a computer to control properties of the light pulses and the scanning of the light pulses such that color centers are generated in various regions of the substrate, and at least one of (i) an ultraviolet light source to irradiate the substrate with ultraviolet light or (ii) a heater to heat the substrate after formation of the color centers to stabilize a transmittance spectrum of the substrate.Type: GrantFiled: June 21, 2011Date of Patent: May 19, 2015Assignees: Carl Zeiss SMS GmbH, Carl Zeiss SMT GmbH, Carl Zeiss SMS Ltd.Inventors: Sergey Oshemkov, Ralph Klaesges, Markus Mengel, Vladimir Kruglyakov, Eitan Zait, Vladimir Dmitriev, Guy Ben-Zvi, Steven Labovitz
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Publication number: 20140347646Abstract: The invention relates to a method for compensating at least one defect of an optical system which comprises introducing an arrangement of local persistent modifications in at least one optical element of the optical system, which does not have pattern elements on one of its optical surfaces, so that the at least one defect is at least partially compensated.Type: ApplicationFiled: August 12, 2014Publication date: November 27, 2014Inventors: Vladimir Dmitriev, Ingo Saenger, Frank Schlesener, Markus Mengel, Johannes Ruoff
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Publication number: 20140347654Abstract: Methods for measuring the image quality of a projection objective include providing a measuring structure on an image-side of the projection objective, providing an immersion fluid between the projection objective and the measuring structure, directing light through the projection objective and the immersion fluid to the measuring structure while shielding the measuring structure from the immersion fluid, detecting light transmitted by the measuring structure, and determining an image quality of the projection objective based on the detected light.Type: ApplicationFiled: August 11, 2014Publication date: November 27, 2014Inventors: Markus Mengel, Ulrich Wegmann, Albrecht Ehrmann, Wolfgang Emer, Reiner Clement, Ludo Mathijssen
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Patent number: 8823948Abstract: Methods for measuring the image quality of a projection objective include providing a measuring structure on an image-side of the projection objective, providing an immersion fluid between the projection objective and the measuring structure, directing light through the projection objective and the immersion fluid to the measuring structure while shielding the measuring structure from the immersion fluid, detecting light transmitted by the measuring structure, and determining an image quality of the projection objective based on the detected light.Type: GrantFiled: June 14, 2013Date of Patent: September 2, 2014Assignee: Carl Zeiss SMT GmbHInventors: Markus Mengel, Ulrich Wegmann, Albrecht Ehrmann, Wolfgang Emer, Reiner Clement, Ludo Mathijssen
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Patent number: 8735030Abstract: Disclosed is a method of modifying of a surface of a substrate of a photolithographic mask for extreme ultraviolet radiation comprising the step of focusing femtosecond light pulses of a laser system onto the substrate so that a plurality of color centers is generated inside the substrate, wherein the color centers are distributed to cause a modification of the substrate surface.Type: GrantFiled: April 12, 2011Date of Patent: May 27, 2014Assignees: Carl Zeiss SMT GmbH, Carl Zeiss SMS GmbH., Carl Zeiss SMS LtdInventors: Sergey Oshemkov, Ralph Klaesges, Markus Mengel
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Patent number: 8675178Abstract: A microlithographic projection exposure apparatus and method are provided. In some embodiments, a microlithographic projection exposure apparatus includes a light source to generate pulsed light, an illumination device, a projection objective, and at least one photoelastic modulator between the pulsed light source and the illumination device. The illumination device is configured to illuminate an object plane of the projection objective. The projection object projects an image of an object in the object plane of the projection objective to the image plane of the projection objective.Type: GrantFiled: August 25, 2008Date of Patent: March 18, 2014Assignee: Carl Zeiss SMT GmbHInventor: Markus Mengel
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Publication number: 20130293869Abstract: Methods for measuring the image quality of a projection objective include providing a measuring structure on an image-side of the projection objective, providing an immersion fluid between the projection objective and the measuring structure, directing light through the projection objective and the immersion fluid to the measuring structure while shielding the measuring structure from the immersion fluid, detecting light transmitted by the measuring structure, and determining an image quality of the projection objective based on the detected light.Type: ApplicationFiled: June 14, 2013Publication date: November 7, 2013Inventors: Markus Mengel, Ulrich Wegmann, Albrecht Ehrmann, Wolfgang Emer, Reiner Clement, Ludo Mathijssen
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Publication number: 20130209926Abstract: A system for processing a substrate includes a light source to provide light pulses, a stage to support a substrate, optics to focus the light pulses onto the substrate, a scanner to scan the light pulses across the substrate, a computer to control properties of the light pulses and the scanning of the light pulses such that color centers are generated in various regions of the substrate, and at least one of (i) an ultraviolet light source to irradiate the substrate with ultraviolet light or (ii) a heater to heat the substrate after formation of the color centers to stabilize a transmittance spectrum of the substrate.Type: ApplicationFiled: June 21, 2011Publication date: August 15, 2013Inventors: Sergey Oshemkov, Ralph Klaesges, Markus Mengel, Vladimir Kruglyakov, Eitan Zait, Vladimir Dmitriev, Guy Ben-Zvi, Steven Labovitz
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Patent number: 8488127Abstract: A measuring system for the optical measurement of an optical imaging system, which is provided to image a pattern arranged in an object surface of the imaging system in an image surface of the imaging system, comprises an object-side structure carrier having an object-side measuring structure, to be arranged on the object side of the imaging system; an image-side structure carrier having an image-side measuring structure, to be arranged on the image side of the imaging system; the object-side measuring structure and the image-side measuring structure being matched to each other in such a way that, when the object-side measuring structure is imaged onto the image-side measuring structure with the aid of the imaging system, a superposition pattern is produced; and a detector for the locally resolving acquisition of the superposition pattern. The imaging system is designed as an immersion system for imaging with the aid of an immersion liquid.Type: GrantFiled: August 5, 2010Date of Patent: July 16, 2013Assignee: Carl Zeiss SMT GmbHInventors: Markus Mengel, Ulrich Wegmann, Albrecht Ehrmann, Wolfgang Emer, Reiner Clement, Ludo Mathijssen
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Publication number: 20130021592Abstract: An arrangement for and a method of characterising the polarisation properties of an optical system, in particular an optical system of a microlithographic projection exposure apparatus. The arrangement includes at least one polarisation state generator (130, 230, 330) which sets a defined polarisation state of radiation incident on the optical system, and a polarisation state detector (140, 240, 340) adapted to measure the exit polarisation state of radiation issuing from the optical system, wherein the optical system is designed for a working wavelength of less than 15 nm, and wherein the polarisation state generator and/or the polarisation state detector are so designed that their polarisation-optical action on an incident light beam is substantially constant over an angle spectrum of the light beam of at least 10°.Type: ApplicationFiled: July 27, 2012Publication date: January 24, 2013Applicant: CARL ZEISS SMT GMBHInventors: Uwe HEMPELMANN, Markus MENGEL, Peter HUBER
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Publication number: 20110255065Abstract: Disclosed is a method of modifying of a surface of a substrate of a photolithographic mask for extreme ultraviolet radiation comprising the step of focusing femtosecond light pulses of a laser system onto the substrate so that a plurality of color centers is generated inside the substrate, wherein the color centers are distributed to cause a modification of the substrate surface.Type: ApplicationFiled: April 12, 2011Publication date: October 20, 2011Inventors: Sergey Oshemkov, Ralph Klaesges, Markus Mengel
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Patent number: 7924436Abstract: A method for approximating an influence of an optical system on the state of polarization of optical radiation comprises the steps of providing incoming optical radiation for the optical system in several incoming states of polarization, including at least one incoming state having circularly polarized radiation components; directing the incoming optical radiation onto the optical system; measuring at least one characteristic, including a phase distribution, of a resulting outgoing optical radiation emerging from the optical system with respect to each of the incoming states of polarization; and approximating the influence of the optical system on the state of polarization of optical radiation by evaluating the measured characteristics of the outgoing optical radiation.Type: GrantFiled: February 7, 2007Date of Patent: April 12, 2011Assignee: Carl Zeiss SMT GmbHInventors: Markus Mengel, Michael Totzeck
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Publication number: 20110063597Abstract: An optical system for a microlithographic projection exposure apparatus, and a microlithographic exposure method are disclosed. An optical system for a microlithographic projection exposure apparatus includes an illumination device, which has a mirror arrangement having a plurality of mirror elements which are adjustable independently of one another for altering an angular distribution of the light reflected by the mirror arrangement, and at least one polarization state altering device like, e.g., a photoelastic modulator.Type: ApplicationFiled: August 5, 2010Publication date: March 17, 2011Applicant: CARL ZEISS SMT AGInventor: Markus Mengel
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Publication number: 20100315651Abstract: A measuring system for the optical measurement of an optical imaging system, which is provided to image a pattern arranged in an object surface of the imaging system in an image surface of the imaging system, comprises an object-side structure carrier having an object-side measuring structure, to be arranged on the object side of the imaging system; an image-side structure carrier having an image-side measuring structure, to be arranged on the image side of the imaging system; the object-side measuring structure and the image-side measuring structure being matched to each other in such a way that, when the object-side measuring structure is imaged onto the image-side measuring structure with the aid of the imaging system, a superposition pattern is produced; and a detector for the locally resolving acquisition of the superposition pattern. The imaging system is designed as an immersion system for imaging with the aid of an immersion liquid.Type: ApplicationFiled: August 5, 2010Publication date: December 16, 2010Applicant: CARL ZEISS SMT AGInventors: Markus Mengel, Ulrich Wegmann, Albrecht Ehrmann, Wolfgang Emer, Reiner Clement, Ludo Mathijssen
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Patent number: 7796274Abstract: A measuring system (100) for the optical measurement of an optical imaging system (150), which is provided to image a pattern arranged in an object surface (155) of the imaging system in an image surface (156) of the imaging system, comprises an object-side structure carrier (110) having an object-side measuring structure (111), to be arranged on the object side of the imaging system; an image-side structure carrier (120) having an image-side measuring structure (121), to be arranged on the image side of the imaging system; the object-side measuring structure and the image-side measuring structure being matched to each other in such a way that, when the object-side measuring structure is imaged onto the image-side measuring structure with the aid of the imaging system, a superposition pattern is produced; and a detector (130) for the locally resolving acquisition of the superposition pattern. The imaging system is designed as an immersion system for imaging with the aid of an immersion liquid (171).Type: GrantFiled: June 2, 2005Date of Patent: September 14, 2010Assignee: Carl Zeiss SMT AGInventors: Markus Mengel, Ulrich Wegmann, Albrecht Ehrmann, Wolfgang Emer, Reiner Clement, Ludo Mathussen