Abstract: An ophthalmosurgical appliance includes an irrigation fluid line through which irrigation fluid can flow from an irrigation fluid container to an ophthalmosurgical handpiece for phacoemulsification, a first fluid pump configured to convey the irrigation fluid to the handpiece, a first volumetric flow determination device configured to determine a first volumetric flow, an aspiration fluid line, a second fluid pump configured to convey aspiration fluid to the collecting container, a second volumetric flow determination device configured to determine a second volumetric flow, a difference element configured to form a difference from the first volumetric flow and the second volumetric flow to form a differential volumetric flow signal, and a control device configured to determine, from the differential volumetric flow signal and the irrigation fluid setpoint pressure signal, a signal for an irrigation fluid control pressure to supply this signal at an output of the control device to the first fluid pump.

Abstract: An ophthalmosurgical control module device includes a first convolution function device configured to output a quantity, convolved with a first convolution function, of a time derivative of the first measurement signal, a first comparison device configured to compare the output quantity of the time derivative of the first measurement signal and the first threshold value with each other and output a first comparison result, a second convolution function device, a second threshold value device, a second comparison device configured to output a second comparison result, a first evaluation device configured to receive and evaluate the first comparison result and the second comparison result and output a first evaluation signal, and an activation device configured to receive the first evaluation signal and, in accordance with the first evaluation signal, to make available a control signal for controlling a parameter of an ophthalmosurgical appliance.

Abstract: An imaging device in a projection exposure machine for microlithography has at least one optical element and at least one manipulator, having a linear drive, for manipulating the position of the optical element. The linear drive has a driven subregion and a nondriven subregion, which are movable relative to one another in the direction of a movement axis. The subregions are interconnected at least temporarily via functional elements with an active axis and via functional elements with an active direction at least approximately parallel to the movement axis.

Abstract: An imaging device in a projection exposure machine for microlithography has at least one optical element and at least one manipulator, having a linear drive, for manipulating the position of the optical element. The linear drive has a driven subregion and a nondriven subregion, which are movable relative to one another in the direction of a movement axis. The subregions are interconnected at least temporarily via functional elements with an active axis and via functional elements with an active direction at least approximately parallel to the movement axis.

Abstract: An imaging device in a projection exposure machine for microlithography has at least one optical element and at least one manipulator, having a linear drive, for manipulating the position of the optical element. The linear drive has a driven subregion and a nondriven subregion, which are movable relative to one another in the direction of a movement axis. The subregions are interconnected at least temporarily via functional elements with an active axis and via functional elements with an active direction at least approximately parallel to the movement axis.

Abstract: An imaging device in a projection exposure machine for microlithography has at least one optical element and at least one manipulator, having a linear drive, for manipulating the position of the optical element. The linear drive has a driven subregion and a nondriven subregion, which are movable relative to one another in the direction of a movement axis. The subregions are interconnected at least temporarily via functional elements with an active axis and via functional elements with an active direction at least approximately parallel to the movement axis.

Abstract: An imaging device in a projection exposure machine for microlithography includes at least one optical element and at least one manipulator, a linear drive for manipulating the position of the optical element. The linear drive has at least one moving element, the moving element having a shearing part and a lifting part. The shearing part is arranged to move the optical element and the lifting part is arranged to move the shearing part. The linear drive has a supporting element which is in contact with and prevents movement of the optical element while the shearing part is moved by the lifting part.

Abstract: An imaging device in a projection exposure machine for microlithography has at least one optical element and at least one manipulator, having a linear drive, for manipulating the position of the optical element. The linear drive has a driven subregion and a nondriven subregion, which are movable relative to one another in the direction of a movement axis. The subregions are interconnected at least temporarily via functional elements with an active axis and via functional elements with an active direction at least approximately parallel to the movement axis.

Abstract: An imaging device in a projection exposure machine for microlithography includes at least one optical element and at least one manipulator, a linear drive for manipulating the position of the optical element. The linear drive has at least one moving element, the moving element having a shearing part and a lifting part. The shearing part is arranged to move the optical element and the lifting part is arranged to move the shearing part. The linear drive has a supporting element which is in contact with and prevents movement of the optical element while the shearing part is moved by the lifting part.

Abstract: An imaging device in a projection exposure machine for microlithography has at least one optical element and at least one manipulator, having a linear drive, for manipulating the position of the optical element. The linear drive has a driven subregion and a nondriven subregion, which are movable relative to one another in the direction of a movement axis. The subregions are interconnected at least temporarily via functional elements with an active axis and via functional elements with an active direction at least approximately parallel to the movement axis.

Abstract: An imaging device in a projection exposure machine for microlithography has at least one optical element and at least one manipulator, having a linear drive, for manipulating the position of the optical element. The linear drive has a driven subregion and a nondriven subregion, which are movable relative to one another in the direction of a movement axis. The subregions are interconnected at least temporarily via functional elements with an active axis and via functional elements with an active direction at least approximately parallel to the movement axis.

Abstract: An imaging device in a projection exposure machine for microlithography comprises at least one optical element and at least one manipulator, a linear drive for manipulating the position of the optical element. Said linear drive has at least one moving element, said moving element having a shearing part and a lifting part. Said shearing part is arranged to move the optical element and said lifting part is arranged to move said shearing part. Said linear drive has a supporting element which is in contact with and prevents movement of the optical element while the shearing part is moved by the lifting part.

Abstract: An imaging device (7) in a projection exposure machine (1) for microlithography has at least one optical element (10, 33, 34) and at least one manipulator (9, 36, 41), having a linear drive (11), for manipulating the position of the optical element (10, 33, 34). The linear drive (11) has a driven subregion (14) and a nondriven subregion (15), which are movable relative to one another in the direction of a movement axis (17). The subregions (14, 15) are interconnected at least temporarily via functional elements (18) with an active axis (17) [sic] and via functional elements (19) with an active direction at least approximately parallel to the movement axis (17).